2 research outputs found
Enhanced Electron Field Emission Properties of Conducting Ultrananocrystalline Diamond Films after Cu and Au Ion Implantation
The
effects of Cu and Au ion implantation on the structural and
electron field emission (EFE) properties of ultrananocrystalline diamond
(UNCD) films were investigated. High electrical conductivity of 186
(Ω•cm)<sup>‑1</sup> and enhanced EFE properties with
low turn-on field of 4.5 V/μm and high EFE current density of
6.70 mA/cm<sup>2</sup> have been detected for Au-ion implanted UNCD
(Au-UNCD) films that are superior to those of Cu-ion implanted UNCD
(Cu-UNCD) ones. Transmission electron microscopic investigations revealed
that Au-ion implantation induced a larger proportion of nanographitic
phases at the grain boundaries for the Au-UNCD films in addition to
the formation of uniformly distributed spherically shaped Au nanoparticles.
In contrast, for Cu-UNCD films, plate-like Cu nanoparticles arranged
in the row-like pattern were formed, and only a smaller proportion
of nanographite phases along the grain boundaries was induced. From
current imaging tunneling spectroscopy and local current–voltage
curves of scanning tunneling spectroscopic measurements, it is observed
that the electrons are dominantly emitted from the grain boundaries.
Consequently, the presence of nanosized Au particles and the induction
of abundant nanographitic phases in the grain boundaries of Au-UNCD
films are believed to be the authentic factors, ensuing in high electrical
conductivity and outstanding EFE properties of the films
Preferentially Grown Ultranano c‑Diamond and n‑Diamond Grains on Silicon Nanoneedles from Energetic Species with Enhanced Field-Emission Properties
The design and fabrication of well-defined nanostructures have
great importance in nanoelectronics. Here we report the precise growth
of sub-2 nm (c-diamond) and above 5 nm (n-diamond) size diamond grains
from energetic species (chemical vapor deposition process) at low
growth temperature of about 460 °C. We demonstrate that a pre-nucleation
induced interface can be accounted for the growth of c-diamond or
n-diamond grains on Si-nanoneedles (Si-NN). These preferentially grown
allotropic forms of diamond on Si-NN have shown high electron field-emission
properties and signify their high potential towards diamond-based
electronic applications