Focused ion beam milling strategy for sub-micrometre holes in silicon

Focused ion beam (FIB) milling can be used as a tool to fabricate structures with sub-micrometer details. The slab material can be silicon, for example, which can then be used as a mould for nano-imprint lithography, or in silicon on insulator (SOI) layer configuration suitable for photonic applications. In the latter, additional effort has to be taken to prevent high FIB induced losses, due to ion implantation and material crystal damage. Perfectly vertical sidewalls are, in principle, required for photonic crystal applications to guarantee low-loss propagation; sidewall angles of 5 degrees can already induce a 8 dB/mm propagation loss. We report on optimization of the sidewall angle (FIB) fabricated submicron diameter holes. Our best case results show that sidewall angles as small as 1.5 degree are possible in Si membranes and 5 degree for (bulk) Si and SOI by applying larger doses and using a spiral scan method

Focused-ion-beam processing for photonics

Although focused ion beam (FIB) processing is a well-developed technology for many applications in electronics and physics, it has found limited application to photonics. Due to its very high spatial resolution in the order of 10 nm, and its ability to mill almost any material, it seems to have a good potential for fabricating or modifying nanophotonic structures such as photonic crystals. The two main issues are FIB-induced optical loss, e.g., due to implantation of gallium ions, and the definition of vertical sidewalls, which is affected by redeposition effects. The severity of the loss problem was found to depend on the base material, silicon being rather sensitive to this effect. The optical loss can be significantly reduced by annealing the processed samples. Changing the scanning strategy for the ion beam can both reduce the impact of gallium implantation and the redeposition effect

Characterisation of slow light in a waveguide grating

A grating was defined in a silicon nitride waveguide, using a combination of both conventional lithography and laser interference lithography. The structure was optically characterized in the 1520 – 1560 nm wavelength range by combining transmission measurements with the analysis of local out-of-plane scattered light, using a high-resolution infrared camera. From the measured power enhancement of the first Bloch-mode resonance above the long-wavelength band edge we estimated a Q > 10^4 and a group velocity of < 0.1 c

Modeling and experimental verification of the dynamic interaction of an AFM-tip with a photonic crystal microcavity

We present a transmission model for estimating the effect of the atomic-force microscopy tapping tip height on a photonic crystal microcavity (MC). This model uses a fit of the measured tip-height-dependent transmission above a “hot spot” in the MC. The predicted transmission versus average tapping height is in good agreement with the values obtained from tapping mode experiments. Furthermore, we show that for the existing, nonoptimized structure, the transmission coefficient can be tuned between 0.32 and 0.8 by varying the average tapping height from 26 to 265 nm. A transmission larger than that of the undisturbed cavity at resonance was observed at specific tip locations just outside the cavity-terminating holes

Focused Ion Beam Milling Strategies of Photonic Crystal Structures in Silicon

We report on optimisation of the side wall angle of focused ion beam (FIB) fabricated submicron diameter holes in silicon. Two optimisation steps were performed. First, we compare two different FIB scanning procedures and show the advantages of using a spiral scanning method for the definition of holes in photonic crystal slab structures. Secondly, we investigate the effect on the geometry, of parameters for reducing the tapering effect. Furthermore, we report on the initial results regarding effects of $Ga^{+}$ ion implantation during FIB milling on optical losses, both before and after an annealing step, showing over a decade reduction of optical loss

Realization of 2-dimensional air-bridge silicon photonic crystals by focused ion beam milling and nanopolishing

We report the design and fabrication of small photonic crystal structures which are combined with conventional dielectric ridge waveguides. We describe in details the fabrication of both rough and smooth membranes, which are used as host for photonic crystals. Two Focused Ion Beam milling experiments are highlighted: the first one shows how photonic crystals can be fast and accurate milled into a Si membrane, whereas the second experiment demonstrates how focused ion beam milling can turn a rough surface into a well-patterned nano-smooth surface. The previously ultra rough surface showed no detectable roughness after milling due to the nanopolishing effect of the focused ion beam milling

Quasi One-Dimensional Photonic Crystals as Building Block for Compact Integrated Optical Refractometric Sensors

A quasi one-dimensional photonic crystal has been fabricated and the applicability of this strong grating for optical sensing has been investigated by measuring the transmission spectra as a function of the cladding refractive index. The cladding index was varied a small range. By monitoring the transmitted output power the transmission stop-band was found to shift by 1 nm wavelength for either a cladding refractive index change of 0.05 or a temperature change of 120 K