3 research outputs found
Effect of α‑Heteroatoms on the Formation of Alkene-Derived Monolayers on H–Si(111): A Combined Experimental and Theoretical Study
We investigate herein whether the
reactivity and surface coverage
of 1-alkenes toward hydrogen-terminated Si(111) surfaces [H-Si(111)]
can be improved by introducing heteroatoms such as oxygen and sulfur
at the α-position next to the alkene functional group. To this
end, the reactivity of 1-pentene, 1-pentyne, vinyl ethyl ether, and
vinyl ethyl sulfide toward H–Si(111) and the surface coverage
of the resulting monolayers were studied and compared. All modified
surfaces were characterized by static water contact angle measurements,
ellipsometry, X-ray photoelectron spectroscopy (XPS), and infrared
absorption reflection spectroscopy (IRRAS). Quantum chemical calculations
were performed to calculate the activation barriers and driving forces
for monolayer formation at the M11-L/6-311GÂ(d,p) level of theory.
Both experiments and theory indicate that the presence of α-heteroatoms
next to the alkene function improved both the reactivity and surface
coverage on H-terminated Si(111) surfaces
Odd–Even Effect in Molecular Electronic Transport via an Aromatic Ring
A distinct odd–even effect
on the electrical properties,
induced by monolayers of alkyl-phenyl molecules directly bound to
Si(111), is reported. Monomers of H<sub>2</sub>CCH–(CH<sub>2</sub>)<sub><i>n</i></sub>–phenyl, with <i>n</i> = 2–5, were adsorbed onto Si–H and formed
high-quality monolayers with a binding density of 50–60% Si(111)
surface atoms. Molecular dynamics simulations suggest that the binding
proximity is close enough to allow efficient π–π
interactions and therefore distinctly different packing and ring orientations
for monomers with odd or even numbers of methylenes in their alkyl
spacers. The odd−even alternation in molecular tilt was experimentally
confirmed by contact angle, ellipsometry, FT-IR, and XPS with a close
quantitative match to the simulation results. The orientations of
both the ring plane and the long axis of the alkyl spacer are more
perpendicular to the substrate plane for molecules with an even number
of methylenes than for those with an odd number of methylenes. Interestingly,
those with an even number conduct better than the effectively thinner
monolayers of the molecules with the odd number of methylenes. We
attribute this to a change in the orientation of the electron density
on the aromatic rings with respect to the shortest tunneling path,
which increases the barrier for electron transport through the odd
monolayers. The high sensitivity of molecular charge transport to
the orientation of an aromatic moiety might be relevant to better
control over the electronic properties of interfaces in organic electronics
Effect of Internal Heteroatoms on Level Alignment at Metal/Molecular Monolayer/Si Interfaces
Molecular
monolayers at metal/semiconductor heterointerfaces affect
electronic energy level alignment at the interface by modifying the
interface’s electrical dipole. On a free surface, the molecular
dipole is usually manipulated by means of substitution at its external
end. However, at an interface such outer substituents are in close
proximity to the top contact, making the distinction between molecular
and interfacial effects difficult. To examine how the interface dipole
would be influenced by a single atom, internal to the molecule, we
used a series of three molecules of identical binding and tail groups,
differing only in the inner atom: aryl vinyl ether (<b>PhO</b>), aryl vinyl sulfide (<b>PhS</b>), and the corresponding molecule
with a CH<sub>2</sub> groupî—¸allyl benzene (<b>PhC</b>). Molecular monolayers based on all three molecules have been adsorbed
on a flat, oxide-free Si surface. Extensive surface characterization,
supported by density functional theory calculations, revealed high-quality,
well-aligned monolayers exhibiting excellent chemical and electrical
passivation of the silicon substrate, in all three cases. Current–voltage
and capacitance–voltage analysis of Hg/PhX (X = C, O, S)/Si
interfaces established that the type of internal atom has a significant
effect on the Schottky barrier height at the interface, i.e., on the
energy level alignment. Surprisingly, despite the formal chemical
separation of the internal atom and the metallic electrode, Schottky
barrier heights were not correlated to changes in the semiconductor’s
effective work function, deduced from Kelvin probe and ultraviolet
photoemission spectroscopy on the monolayer-adsorbed Si surface. Rather,
these changes correlated well with the ionization potential of the
surface-adsorbed molecules. This is interpreted in terms of additional
polarization at the molecule/metal interface, driven by potential
equilibration considerations even in the absence of a formal chemical
bond to the top Hg contact