Optimal edge termination for high oxide reliability aiming 10kV SiC n-IGBTs

The edge termination design strongly affects the ability of a power device to support the desired voltage and its reliable operation. In this paper we present three appropriate termination designs for 10kV n-IGBTs which achieve the desired blocking requirement without the need for deep and expensive implantations. Thus, they improve the ability to fabricate, minimise the cost and reduce the lattice damage due to the high implantation energy. The edge terminations presented are optimised both for achieving the widest immunity to dopant activation and to minimise the electric field at the oxide. Thus, they ensure the long-term reliability of the device. This work has shown that the optimum design for blocking voltage and widest dose window does not necessarily give the best design for reliability. Further, it has been shown that Hybrid Junction Termination Extension structure with Space Modulated Floating Field Rings can give the best result of very high termination efficiency, as high as 99%, the widest doping variation immunity and the lowest electric field in the oxide

Physical parameterisation of 3C-Silicon Carbide (SiC) with scope to evaluate the suitability of the material for power diodes as an alternative to 4H-SiC

Major recent developments in growth expertise related to the cubic polytype of Silicon Carbide, the 3C-SiC, coupled with its remarkable physical properties and the low fabrication cost, suggest that within the next five years, 3C-SiC devices can become a commercial reality. It is therefore important to develop Finite Element Method (FEM) techniques and models for accurate device simulation. Furthermore, it is also needed to perform an exhaustive simulation investigation with scope to identify which family of devices, which voltage class and for which applications this polytype is suited. In this paper, we present a complete set of physical models and material parameters for bulk 3C-SiC aiming Technology Computer Aided Design (TCAD) tools. These are compared with those of 4H-SiC, the most well developed polytype of SiC. Thereafter, the newly developed material parameters are used to assess 3C- and 4H-SiC vertical power diodes, P-i-N and Schottky Barrier Diodes (SBDs), to create trade-off maps relating the on-state voltage drop and the blocking capability. Depending on the operation requirements imposed by the application, the developed trade-off maps set the boundary of the realm for those two polytypes. It also allows us to predict which applications will benefit from an electrically graded 3C-SiC power diodes

Validated physical models and parameters of bulk 3C-SiC aiming for credible technology computer aided design (TCAD) simulation

The cubic form of SiC (β- or 3C-) compared to the hexagonal α-SiC polytypes, primarily 4H- and 6H–SiC, has lower growth cost and can be grown heteroepitaxially in large area silicon (Si) wafers which makes it of special interest. This in conjunction with the recently reported growth of improved quality 3C–SiC, make the development of devices an imminent objective. However, the readiness of models that accurately predict the material characteristics, properties and performance is an imperative requirement for attaining the design and optimization of functional devices. The purpose of this study is to provide and validate a comprehensive set of models alongside with their parameters for bulk 3C–SiC. The validation process revealed that the proposed models are in a very good agreement to experimental data and confidence ranges were identified. This is the first piece of work achieving that for 3C–SiC. Considerably, it constitutes the necessary step for finite element method simulations and technology computer aided design