DLC Films Deposited by the DC PACVD Method

DLC (Diamond-Like Carbon) coatings have been suggested as protective surface layers against wear. However hard DLC coatings, especially those of greater thickness, have poor adhesion to substrates. We have used several ways to increase the adhesion of DLC coatings prepared by the PACVD (Plasma Assisted Chemical Vapour Deposition) method on steel substrates. One of these is the DC PACVD method for preparing DLC films

Properties of Erbium Doped Hydrogenated Amorphous Carbon Layers Fabricated by Sputtering and Plasma Assisted Chemical Vapor Deposition

We report about properties of carbon layers doped with Er3+ ions fabricated by Plasma Assisted Chemical Vapor Deposition (PACVD) and by sputtering on silicon or glass substrates. The structure of the samples was characterized by X-ray diffraction and their composition was determined by Rutherford Backscattering Spectroscopy and Elastic Recoil Detection Analysis. The Absorbance spectrum was taken in the spectral range from 400 nm to 600 nm. Photoluminescence spectra were obtained using two types of Ar laser (λex=514.5 nm, lex=488 nm) and also using a semiconductor laser (λex=980 nm). Samples fabricated by magnetron sputtering exhibited typical emission at 1530 nm when pumped at 514.5 nm.&nbsp

Modifing the Surface Layers of Mechanical Components

This paper deals with the creation of thin surface layers prepared by the Plasma Assisted Chemical Vapour Deposition Method (PACVD). Polished sample surfaces made of tool steel were used. An investigation of the dependence of layer thickness on process duration was carried out. The structure of the original surface and the structure of the coated surface were evaluated and compared. The microhardness of the surface areas was also measured

Properties of Erbium Doped Hydrogenated Amorphous Carbon Layers Fabricated by Sputtering and Plasma Assisted Chemical Vapor Deposition

We report about properties of carbon layers doped with Er3+ ions fabricated by Plasma Assisted Chemical Vapor Deposition (PACVD) and by sputtering on silicon or glass substrates. The structure of the samples was characterized by X-ray diffraction and their composition was determined by Rutherford Backscattering Spectroscopy and Elastic Recoil Detection Analysis. The Absorbance spectrum was taken in the spectral range from 400 nm to 600 nm. Photoluminescence spectra were obtained using two types of Ar laser (λex=514.5 nm, lex=488 nm) and also using a semiconductor laser (λex=980 nm). Samples fabricated by magnetron sputtering exhibited typical emission at 1530 nm when pumped at 514.5 nm.&nbsp