142 research outputs found

    Superlattice ultrasonic generation

    Get PDF
    We report the first experimental evidence for the resonant excitation of coherent high-frequency acoustic phonons in semiconducting doping superstructures by far-infrared laser radiation. After a grating-coupled delta-doped silicon doping superlattice is illuminated with ~1 kW/mm2 nanosecond-pulsed 246 GHz laser radiation, a delayed nanosecond pulse is detected by a superconducting bolometer at a time corresponding to the appropriate time-of-flight for ballistic longitudinal acoustic phonons across the (100) silicon substrate. The absorbed phonon power density in the microbolometer is observed to be ~10 μW/mm2, in agreement with theory. The phonon pulse duration also matches the laser pulse duration. The absence of any delayed transverse acoustic phonon signal by the superconducting bolometer is particularly striking and implies there is little or no incoherent phonon generation occurring in the process

    Vacancy-Impurity Complexes in Highly Sb-Doped Si Grown by Molecular Beam Epitaxy

    Get PDF
    Positron annihilation measurements, supported by first-principles electron-structure calculations, identify vacancies and vacancy clusters decorated by 1–2 dopant impurities in highly Sb-doped Si. The concentration of vacancy defects increases with Sb doping and contributes significantly to the electrical compensation. Annealings at low temperatures of 400–500 K convert the defects to larger complexes where the open volume is neighbored by 2–3 Sb atoms. This behavior is attributed to the migration of vacancy-Sb pairs and demonstrates at atomic level the metastability of the material grown by epitaxy at low temperature.Peer reviewe

    Vacancy-Impurity Complexes in Highly Sb-Doped Si Grown by Molecular Beam Epitaxy

    Get PDF
    Positron annihilation measurements, supported by first-principles electron-structure calculations, identify vacancies and vacancy clusters decorated by 1-2 dopant impurities in highly Sb-doped Si. The concentration of vacancy defects increases with Sb doping and contributes significantly to the electrical compensation. Annealings at low temperatures of 400 -500 K convert the defects to larger complexes where the open volume is neighbored by 2 -3 Sb atoms. This behavior is attributed to the migration of vacancy-Sb pairs and demonstrates at atomic level the metastability of the material grown by epitaxy at low temperature. DOI: 10.1103/PhysRevLett.94.165501 PACS numbers: 61.72.-y, 61.82.Fk, 78.70.Bj The interest in highly doped Si is fundamentally related to the miniaturization of field-effect transistors, where increased doping is needed to maintain a sufficient conductance of the source and drain regions The molecular beam epitaxy (MBE) growth at low temperature ( < 600 K) can be applied to achieve metastable doping and free electron concentrations, which become compensated only at 10 21 cm ÿ3 In this work we apply positron annihilation spectroscopy to study vacancies formed in the low-temperature MBE growth of highly Sb-doped Si. Positrons get trapped at open-volume defects. The measured annihilation photons carry information on the electron momentum density, which can be utilized to identify the size of the open volume of the defect and the neighboring dopant atoms. Our results show that the MBE growth creates vacancies and vacancy clusters, which are neighbored by 1-2 Sb atoms. The vacancy concentrations are relevant for the compensation of the Sb doping. We also show that the low-temperature MBE Si is atomically metastable, and annealings at low temperatures of 400 -500 K lead to clustering of vacancies and dopant impurities. We studied Si(100) layers grown by MBE on the Si substrate at 550 K We used a low-energy positron beam to measure the Doppler broadened energy spectrum of the annihilation radiation. The shape of the spectrum was described with conventional S and W parameter

    Vacancy-impurity complexes in highly Sb-doped Si grown by molecular beam epitaxy

    Get PDF
    Positron annihilation measurements, supported by first-principles electron-structure calculations, identify vacancies and vacancy clusters decorated by 1 -2 dopant impurities in highly Sb-doped Si. The concentration of vacancy defects increases with Sb doping and contributes significantly to the electrical compensation. Annealings at low temperatures of 400 -500 K convert the defects to larger complexes where the open volume is neighbored by 2 -3 Sb atoms. This behavior is attributed to the migration of vacancy-Sb pairs and demonstrates at atomic level the metastability of the material grown by epitaxy at low temperature. PACS numbers: 61.82.Fk, 78.70.Bj The interest in highly doped Si is fundamentally related to the miniaturization of field-effect transistors, where increased doping is needed to maintain a sufficient conductance of the source and drain regions The molecular beam epitaxy (MBE) growth at low temperature (< 600 K) can be applied to achieve metastable doping and free electron concentrations, which become compensated only at 10 21 cm −3 In this work we apply positron annihilation spectroscopy to study vacancies formed in the lowtemperature MBE growth of highly Sb-doped Si. Positrons get trapped at open volume defects. The measured annihilation photons carry information on the electron momentum density, which can be utilized to identify the size of the open volume of the defect and the neighboring dopant atoms. Our results show that the MBE growth creates vacancies and vacancy clusters, which are neighbored by 1 -2 Sb atoms. The vacancy concentrations are relevant for the compensation of the Sb doping. We also show that the low-temperature MBE Si is atomically metastable, and annealings at low temperatures of 400-500 K lead to clustering of vacancies and dopant impurities. We studied Si(100) layers grown by MBE on Si substrate at 550

    Self-consistent local-equilibrium model for density profile and distribution of dissipative currents in a Hall bar under strong magnetic fields

    Full text link
    Recent spatially resolved measurements of the electrostatic-potential variation across a Hall bar in strong magnetic fields, which revealed a clear correlation between current-carrying strips and incompressible strips expected near the edges of the Hall bar, cannot be understood on the basis of existing equilibrium theories. To explain these experiments, we generalize the Thomas-Fermi--Poisson approach for the self-consistent calculation of electrostatic potential and electron density in {\em total} thermal equilibrium to a {\em local equilibrium} theory that allows to treat finite gradients of the electrochemical potential as driving forces of currents in the presence of dissipation. A conventional conductivity model with small values of the longitudinal conductivity for integer values of the (local) Landau-level filling factor shows that, in apparent agreement with experiment, the current density is localized near incompressible strips, whose location and width in turn depend on the applied current.Comment: 9 pages, 7 figure

    The role of mutation rate variation and genetic diversity in the architecture of human disease

    Get PDF
    Background We have investigated the role that the mutation rate and the structure of genetic variation at a locus play in determining whether a gene is involved in disease. We predict that the mutation rate and its genetic diversity should be higher in genes associated with disease, unless all genes that could cause disease have already been identified. Results Consistent with our predictions we find that genes associated with Mendelian and complex disease are substantially longer than non-disease genes. However, we find that both Mendelian and complex disease genes are found in regions of the genome with relatively low mutation rates, as inferred from intron divergence between humans and chimpanzees, and they are predicted to have similar rates of non-synonymous mutation as other genes. Finally, we find that disease genes are in regions of significantly elevated genetic diversity, even when variation in the rate of mutation is controlled for. The effect is small nevertheless. Conclusions Our results suggest that gene length contributes to whether a gene is associated with disease. However, the mutation rate and the genetic architecture of the locus appear to play only a minor role in determining whether a gene is associated with disease

    Molecular dynamics with phase-shift-based electronic stopping for calibration of ion implantation profiles in crystalline silicon

    Get PDF
    Abstract Prediction of the final dopant positions after ion implantation has always been strongly influenced by the choice of stopping models. A molecular dynamics (MD) method is used in this work; the nuclear stopping is treated by accurate pair potentials calculated by density functional theory (DFT). The slowing down due to collisions with electrons will be described by both a non-local semi-empirical model and a local model based on Fermi level phase shift factors. Comparisons with experimental data using both models show that a local pair-specific electronic stopping model is essential in accurately predicting range profiles for any element even at low implant energies where nuclear effects are dominant.

    2-Aminophenoxazine-3-one and 2-amino-4,4α-dihydro-4α,7-dimethyl-3H-phenoxazine-3-one cause cellular apoptosis by reducing higher intracellular pH in cancer cells

    Get PDF
    We examined intracellular pH (pHi) of ten cancer cell lines derived from different organs and two normal cell lines including human embryonic lung fibroblast cells (HEL) and human umbilical vein endothelial cells (HUVEC) in vitro, and found that pHi of most of these cancer cells was evidently higher (pH 7.5 to 7.7) than that of normal cells (7.32 and 7.44 for HEL and HUVEC, respectively) and that of primary leukemic cells and erythrocytes hitherto reported (≤7.2). Higher pHi in these cancer cells could be related to the Warburg effect in cancer cells with enhanced glycolytic metabolism. Since reversal of the Warburg effect may perturb intracellular homeostasis in cancer cells, we looked for compounds that cause extensive reduction of pHi, a major regulator of the glycolytic pathway and its associated metabolic pathway. We found that phenoxazine compounds, 2-aminophenoxazine-3-one (Phx-3) and 2-amino-4,4α-dihydro-4α,7-dimethyl-3H-phenoxazine-3-one (Phx-1) caused a rapid and drastic dose-dependent decrease of pHi in ten different cancer cells within 30 min, though the extent of the decrease of pHi was significantly larger for Phx-3 (ΔpHi = 0.6 pH units or more for 100 µM Phx-3) than for Phx-1 (ΔpHi = 0.1 pH units or more for 100 µM Phx-1). This rapid and drastic decrease of pHi in a variety of cancer cells caused by Phx-3 and Phx-1 possibly perturbed their intracellular homeostasis, and extensively affected the subsequent cell death, because these phenoxazines exerted dose-dependent proapoptotic and cytotoxic effects on these cells during 72 h incubation, confirming a causal relationship between ΔpHi and cytotoxic effects due to Phx-3 and Phx-1. Phx-3 and Phx-1 also reduced pHi of normal cells including HEL and HUVEC, although they exerted less proapoptotic and cytotoxic effects on these cells than on cancer cells. Drugs such as Phx-3 and Phx-1 that reduce pHi and thereby induce cellular apoptosis might serve as benevolent anticancer drugs

    Superconductivity in Silicon Nanostructures

    Full text link
    We present the findings of the superconductivity in the silicon nanostructures prepared by short time diffusion of boron after preliminary oxidation of the n-type Si (100) surface. These Si-based nanostructures represent the p-type high mobility silicon quantum well (Si-QW) confined by the delta - barriers heavily doped with boron. The ESR studies show that the delta - barriers appear to consist of the trigonal dipole centers, B(+)-B(-), which are caused by the negative-U reconstruction of the shallow boron acceptors, 2B(0)=>B(+)-B(-). The temperature and magnetic field dependencies of the resistance, thermo-emf, specific heat and magnetic susceptibility demonstrate that the high temperature superconductivity observed seems to result from the transfer of the small hole bipolarons through these negative-U dipole centers of boron at the Si-QW - delta - barrier interfaces. The value of the superconductor energy gap obtained is in a good agreement with the data derived from the oscillations of the conductance in normal state and of the zero-resistance supercurrent in superconductor state as a function of the bias voltage. These oscillations appear to be correlated by on- and off-resonance tuning the two-dimensional subbands of holes with the Fermi energy in the superconductor delta - barriers. Finally, the proximity effect in the S- Si-QW -S structure is revealed by the findings of the multiple Andreev reflection (MAR) processes and the quantization of the supercurrent
    corecore