Exposure to environmental tobacco smoke (ETS) and determinants of support for complete smoking bans in psychiatric settings

Objective: To measure environmental tobacco smoke (ETS) exposure in psychiatric settings and to assess determinants of support for complete smoking bans. Design: Cross sectional study Setting: Dutch psychiatric hospitals, outpatient care institutions, and sheltered home facilities. Subjects: A random sample of 540 treatment staff, 306 attendants/nurses, and 93 patients. Main outcome measures: Self reported ETS exposure, current smoking policy, compliance with smoking policy, beliefs about smoking bans. Results: 87% of respondents were exposed to tobacco smoke in psychiatric institutions; 29% said that on an average day they were exposed to "a lot of smoke". Although ETS originates mainly from smoking patients, both non-compliance from patients and employees with existing bans resulted in non-smokers being exposed to ETS. Due to non-compliance, ETS exposure was quite high when there is a general smoking ban (designated areas option). Only with a complete ban was compliance good and employees sufficiently protected from ETS exposure. Psychiatrists, psychologists, physicians, attendants, and nurses were most concerned about resistance from patients, partly because of the fear of infringing on patients' freedom to smoke. Conclusions: Complete smoking bans are the only way to fully protect those working in psychiatry from ETS exposure, mainly because general smoking bans are not sufficiently complied with. Communication strategies to improve compliance with complete bans are crucial to protect those working in psychiatry from ETS. Compliance could be improved by addressing the belief that the ban will effectively result in less ETS exposure and the issue of patients' freedom to smoke versus employees' right to work in a smoke-free environment

Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography

Reported is the optimization of the fabrication of Mo/Si multilayer systems produced by e-beam evaporation and ion-beam smoothening. The impact of a number of coating parameters is verified such as variation of the mirror\u27s center wavelength and the metal fraction of the bilayer (Gamma ratio), resulting in reflectivities up to 68.6% at normal incidence. Parallel to this experimental work, a numerical optimization based on experimentally determined multilayer properties is carried out on the throughput of multimirror lithographic systems for the 11-15 nm wavelength region using Mo/Si and Mo/Be coatings. The center wavelength, Gamma ratio and layer stack have been optimized. The calculations show an optimum throughput for a 10-mirror Mo/Si system at 14.4 nm, assuming a light source with a wavelength independent spectrum. (C) 1999 American Vacuum Society. [S0734-211X(99)12106-1]