18 research outputs found
Excitation and nonradiative deexcitation processes of Er3+ in crystalline Si
none4A detailed investigation on the excitation and deexcitation processes of Er3+ in Si is reported. In particular, we explored Er pumping through electron-hole pair recombination and Er deexcitation through Auger processes transferring energy to either free or bound electrons and holes. Since Er donor behavior would result in a free-carrier concentration varying along its profile, experiments have been performed by embedding the whole Er profile within previously prepared n-doped or p-doped regions. Multiple P (B) implants were performed in n-type (p-type) Czochralski Si samples in order to realize uniform dopant concentrations from 4 x 10(16) to 1.2 x 10(18)/cm(3) at depths between 0.5 and 2.5 mu m below the surface. These samples have been subsequently implanted with 4 MeV 3.3 x 10(13) Er/cm(2) and annealed at 900 degrees C for 30 min. Free electrons or holes concentrations in the region where Er sits were measured by spreading resistance profiling. It has been found that the release of electrons or holes from shallow donors and accepters, occurring at temperatures between 15 and 100 K, produces a strong reduction of both time decay and luminescence intensity at 1.54 mu m. These phenomena are produced by Auger deexcitation of the Er3+ intra-4f electrons with energy transfer to free carriers. The Auger coefficient of this process has been measured to be C-A similar to 5 x 10(-13) cm(3) s(-1) for both free electrons and free holes. Moreover, at 15 K (when the free carriers are frozen and the donor and acceptor levels occupied) the Er3+ time decay has been found to depend on the P (or B) concentrations. This is attributed to an impurity Auger deexcitation to electrons (or holes) bound to shallow donors (accepters): the efficiency of this process has been determined to be two orders of magnitude smaller with respect to the Auger deexcitation with free carriers. Furthermore, at temperatures above 100 K a nonradiative back-transfer decay process, characterized by an activation energy of 0.15 eV, is seen to set in for both p-type and n-type samples. This suggests that the back-transfer process, which severely limits the high-temperature luminescence efficiency, is always completed by a thermalization of an electron trapped at an Er-related level to the conduction band. Finally, by analysis of the pump power dependence of time decay and luminescence yield at 15 K, we have found that excitation of Er through the recombination of an electron-hole pair is a very efficient process, characterized by an effective cross section of 3 x 10(-15) cm(2) and able to provide an internal quantum efficiency as high as 10% at low temperatures (15 K) and pump powers (below 1 mW). This efficiency is significantly reduced when, at higher temperatures and/or high pump powers, strong nonradiative decay processes set in. These phenomena are investigated in detail and their impact on device operation perspectives are analyzed and discussed. [S0163-1829(98)01008-X].noneF. Priolo;G. Franzo;S. Coffa;A. CarneraF., Priolo; G., Franzo; S., Coffa; Carnera, Albert
Improved Synthesis of ZnO Nanowalls: Effects of Chemical Bath Deposition Time and Annealing Temperature
Zinc Oxide (ZnO) nanowalls (NWLs) are interesting nanostructures for sensing application. In order to push towards the realization of room-temperature operating sensors, a detailed investigation of the synthesis effect on the electrical and optical properties is needed. This work focuses on the low-cost synthesis of ZnO NWLs by means of chemical bath deposition (growth time of 5, 60, and 120 min) followed by annealing in inert ambient (temperature of 100, 200, and 300 °C). The as-grown NWLs show a typical intertwined network of vertical sheets whose features (thickness and height) stabilize after 60 min growth. During thermal annealing, NWLs are converted into ZnO. The electric transport across the ZnO NWL network radically changes after annealing. A higher resistivity was observed for longer deposition times and for higher annealing temperatures, at which the photoluminescence spectra resemble those obtained for ZnO material. A longer deposition time allows for a better transformation to ZnO during the annealing, thanks to the presence of ZnO seeds just after the growth. These findings can have a significant role in promoting the realization of room-temperature operating sensors based on ZnO NWLs
Structural characterization of silicon nanostructures by energy filtered transmission electron microscopy
Localized Energy Band Bending in ZnO Nanorods Decorated with Au Nanoparticles
Surface decoration by means of metal nanostructures is an effective way to locally modify the electronic properties of materials. The decoration of ZnO nanorods by means of Au nanoparticles was experimentally investigated and modelled in terms of energy band bending. ZnO nanorods were synthesized by chemical bath deposition. Decoration with Au nanoparticles was achieved by immersion in a colloidal solution obtained through the modified Turkevich method. The surface of ZnO nanorods was quantitatively investigated by Scanning Electron Microscopy, Transmission Electron Microscopy and Rutherford Backscattering Spectrometry. The Photoluminescence and Cathodoluminescence of bare and decorated ZnO nanorods were investigated, as well as the band bending through MottâSchottky electrochemical analyses. Decoration with Au nanoparticles induced a 10 times reduction in free electrons below the surface of ZnO, together with a decrease in UV luminescence and an increase in visible-UV intensity ratio. The effect of decoration was modelled with a nano-Schottky junction at ZnO surface below the Au nanoparticle with a Multiphysics approach. An extensive electric field with a specific halo effect formed beneath the metalâsemiconductor interface. ZnO nanorod decoration with Au nanoparticles was shown to be a versatile method to tailor the electronic properties at the semiconductor surface
Low-Cost, High-Yield ZnO Nanostars Synthesis for Pseudocapacitor Applications
Energy storage devices based on earth-abundant materials are key steps towards portable and sustainable technologies used in daily life. Pseudocapacitive devices, combining high power and high energy density features, are widely required, and transition metal oxides represent promising building materials owing to their excellent stability, abundance, and ease of synthesis. Here, we report an original ZnO-based nanostructure, named nanostars (NSs), obtained at high yields by chemical bath deposition (CBD) and applied as pseudocapacitors. The ZnO NSs appeared as bundles of crystalline ZnO nanostrips (30 nm thin and up to 12 µm long) with a six-point star shape, self-assembled onto a plane. X-ray diffraction (XRD), scanning electron microscopy (SEM), and photoluminescence spectroscopy (PL) were used to confirm the crystal structure, shape, and defect-mediated radiation. The ZnO NSs, dispersed onto graphene paper, were tested for energy storage by cyclic voltammetry (CV) and galvanostatic charge–discharge (GCD) analyses, showing a clear pseudocapacitor behavior. The energy storage mechanism was analyzed and related to oxygen vacancy defects at the surface. A proper evaluation of the charge stored on the ZnO NSs and the substrate allowed us to investigate the storage efficiency, measuring a maximum specific capacitance of 94 F g−1 due to ZnO nanostars alone, with a marked diffusion-limited behavior. The obtained results demonstrate the promising efficacy of ZnO-based NSs as sustainable materials for pseudocapacitors
Eu^3+ reduction and efficient light emission in Eu_2O_3 films deposited on Si substrates
none7A stable Eu3+âEu2+ reduction is accomplished by thermal annealing in N2 ambient of Eu2O3 films deposited by magnetron sputtering on Si substrates. Transmission electron microscopy and x-ray diffraction measurements demonstrate the occurrence of a complex reactivity at the Eu2O3/Si interface, leading to the formation of Eu2+ silicates, characterized by a very strong (the measured external quantum efficiency is about 10%) and broad room temperature photoluminescence (PL) peak centered at 590 nm. This signal is much more efficient than the Eu3+ emission, mainly consisting of a sharp PL peak at 622 nm, observed in O2-annealed films, where the presence of a SiO2 layer at the Eu2O3/Si interface prevents Eu2+ formation.noneGabriele, Bellocchi; Giorgia, Franzò; Fabio, Iacona; Simona, Boninelli; Maria, Miritello; Cesca, Tiziana; Francesco, PrioloGabriele, Bellocchi; Giorgia, Franzò; Fabio, Iacona; Simona, Boninelli; Maria, Miritello; Cesca, Tiziana; Francesco, Priol
Flexible Organic/Inorganic Hybrid Field-Effect Transistors with High Performance and Operational Stability
International audienceThe production of high-quality semiconducting nanostructures with optimized electrical, optical, and electromechanical properties is important for the advancement of next-generation technologies. In this context, we herein report on highly obliquely aligned single-crystalline zinc oxide nanosheets (ZnO NSs) grown via the vaporâliquidâsolid approach using r-plane (01â12) sapphire as the template surface. The high structural and optical quality of as-grown ZnO NSs has been confirmed using high-resolution transmission electron microscopy and temperature-dependent photoluminescence, respectively. To assess the potential of our NSs as effective building materials in high-performance flexible electronics, we fabricate organic (parylene C)/inorganic (ZnO NS) hybrid field-effect transistor (FET) devices on flexible substrates using room-temperature assembly processes. Extraction of key FET performance parameters suggests that as-grown ZnO NSs can successfully function as excellent n-type semiconducting modules. Such devices are found to consistently show very high on-state currents (Ion) > 40 ÎźA, high field-effect mobility (Îźeff) > 200 cm2/(V s), exceptionally high on/off current modulation ratio (Ion/off) of around 10^9, steep subthreshold swing (s-s) < 200 mV/decade, very low hysteresis, and negligible threshold voltage shifts with prolonged electrical stressing (up to 340 min). The present study delivers a concept of integrating high-quality ZnO NS as active semiconducting elements in flexible electronic circuits