12,973 research outputs found
E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System
Electron beam lithography (EBL) is a promising maskless solution for the
technology beyond 14nm logic node. To overcome its throughput limitation,
recently the traditional EBL system is extended into MCC system. %to further
improve the throughput. In this paper, we present E-BLOW, a tool to solve the
overlapping aware stencil planning (OSP) problems in MCC system. E-BLOW is
integrated with several novel speedup techniques, i.e., successive relaxation,
dynamic programming and KD-Tree based clustering, to achieve a good performance
in terms of runtime and solution quality. Experimental results show that,
compared with previous works, E-BLOW demonstrates better performance for both
conventional EBL system and MCC system
Average distance in a hierarchical scale-free network: an exact solution
Various real systems simultaneously exhibit scale-free and hierarchical
structure. In this paper, we study analytically average distance in a
deterministic scale-free network with hierarchical organization. Using a
recursive method based on the network construction, we determine explicitly the
average distance, obtaining an exact expression for it, which is confirmed by
extensive numerical calculations. The obtained rigorous solution shows that the
average distance grows logarithmically with the network order (number of nodes
in the network). We exhibit the similarity and dissimilarity in average
distance between the network under consideration and some previously studied
networks, including random networks and other deterministic networks. On the
basis of the comparison, we argue that the logarithmic scaling of average
distance with network order could be a generic feature of deterministic
scale-free networks.Comment: Definitive version published in Journal of Statistical Mechanic
- …