E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System

Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, recently the traditional EBL system is extended into MCC system. %to further improve the throughput. In this paper, we present E-BLOW, a tool to solve the overlapping aware stencil planning (OSP) problems in MCC system. E-BLOW is integrated with several novel speedup techniques, i.e., successive relaxation, dynamic programming and KD-Tree based clustering, to achieve a good performance in terms of runtime and solution quality. Experimental results show that, compared with previous works, E-BLOW demonstrates better performance for both conventional EBL system and MCC system

Average distance in a hierarchical scale-free network: an exact solution

Various real systems simultaneously exhibit scale-free and hierarchical structure. In this paper, we study analytically average distance in a deterministic scale-free network with hierarchical organization. Using a recursive method based on the network construction, we determine explicitly the average distance, obtaining an exact expression for it, which is confirmed by extensive numerical calculations. The obtained rigorous solution shows that the average distance grows logarithmically with the network order (number of nodes in the network). We exhibit the similarity and dissimilarity in average distance between the network under consideration and some previously studied networks, including random networks and other deterministic networks. On the basis of the comparison, we argue that the logarithmic scaling of average distance with network order could be a generic feature of deterministic scale-free networks.Comment: Definitive version published in Journal of Statistical Mechanic