34 research outputs found

    FMP study of pilot workload. Qualification of workload via instrument scan

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    Various methods of measuring a pilot's mental workload are discussed. Scanning the various flight instruments with good scan pattern and other verbal tasks during instrument landings is given special attention for measuring pilot workload

    Visual scanning behavior and pilot workload

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    Sophisticated man machine interaction often requires the human operator to perform a stereotyped scan of various instruments in order to monitor and/or control a system. For situations in which this type of stereotyped behavior exists, such as certain phases of instrument flight, scan pattern was shown to be altered by the imposition of simultaneous verbal tasks. A study designed to examine the relationship between pilot visual scan of instruments and mental workload is described. It was found that a verbal loading task of varying difficulty causes pilots to stare at the primary instrument as the difficulty increases and to shed looks at instruments of less importance. The verbal loading task also affected the rank ordering of scanning sequences. By examining the behavior of pilots with widely varying skill levels, it was suggested that these effects occur most strongly at lower skill levels and are less apparent at high skill levels. A graphical interpretation of the hypothetical relationship between skill, workload, and performance is introduced and modelling results are presented to support this interpretation

    Entropy, instrument scan and pilot workload

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    Correlation and information theory which analyze the relationships between mental loading and visual scanpath of aircraft pilots are described. The relationship between skill, performance, mental workload, and visual scanning behavior are investigated. The experimental method required pilots to maintain a general aviation flight simulator on a straight and level, constant sensitivity, Instrument Landing System (ILS) course with a low level of turbulence. An additional periodic verbal task whose difficulty increased with frequency was used to increment the subject's mental workload. The subject's looppoint on the instrument panel during each ten minute run was computed via a TV oculometer and stored. Several pilots ranging in skill from novices to test pilots took part in the experiment. Analysis of the periodicity of the subject's instrument scan was accomplished by means of correlation techniques. For skilled pilots, the autocorrelation of instrument/dwell times sequences showed the same periodicity as the verbal task. The ability to multiplex simultaneous tasks increases with skill. Thus autocorrelation provides a way of evaluating the operator's skill level

    Attention and automation: New perspectives on mental underload and performance

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    There is considerable evidence in the ergonomics literature that automation can significantly reduce operator mental workload. Furthermore, reducing mental workload is not necessarily a good thing, particularly in cases where the level is already manageable. This raises the issue of mental underload, which can be at least as detrimental to performance as overload. However, although it is widely recognized that mental underload is detrimental to performance, there are very few attempts to explain why this may be the case. It is argued in this paper that, until the need for a human operator is completely eliminated, automation has psychological implications relevant in both theoretical and applied domains. The present paper reviews theories of attention, as well as the literature on mental workload and automation, to synthesize a new explanation for the effects of mental underload on performance. Malleable attentional resources theory proposes that attentional capacity shrinks to accommodate reductions in mental workload, and that this shrinkage is responsible for the underload effect. The theory is discussed with respect to the applied implications for ergonomics research

    Dry Etching for VLSI—A Review

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    RIE Contamination of Etched Silicon Surfaces

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    Plasma vacuum ultraviolet emission in an electron cyclotron resonance etcher

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