259 research outputs found

    Electrodeposition in capillaries: bottom-up micro- and nanopatterning of functional materials on conductive substrates

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    A cost-effective and versatile methodology for bottom-up patterned growth of inorganic and metallic materials on the micro- and nanoscale is presented. Pulsed electrodeposition was employed to deposit arbitrary patterns of Ni, ZnO, and FeO(OH) of high quality, with lateral feature sizes down to 200–290 nm. The pattern was defined by an oxygen plasma-treated patterned PDMS mold in conformal contact with a conducting substrate and immersed in an electrolyte solution, so that the solid phases were deposited from the solution in the channels of the patterned mold. It is important that the distance between the entrance of the channels, and the location where deposition is needed, is kept limited. The as-formed patterns were characterized by high resolution scanning electron microscope, energy-dispersive X-ray analysis, atomic force microscopy, and X-ray diffraction

    Doped microporous hybrid silica membranes for gas separation

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    Hybrid silica (i.e., bis-triethoxysilylethane: BTESE) membranes doped with B, Ta or Nb were made through a sol–gel process. Triethyl borate, tantalum (V) ethoxide (TPE) and niobium (V) ethoxide (NPE) were selected as doping precursors. The doping concentration was optimized to produce sols, suitable for membrane fabrication. Thermal stability, structural analysis, cross-sectional micrographs and single gas permeation experiments were performed on these membranes, and results are compared with an undoped BTESE membrane. It was observed that the synthesized doped BTESE materials and membranes resulted into a more open (and, in one occurrence, SF6 permeable) pore microstructure, showing high permeances of larger gas molecules, while having a cross-sectional thickness comparable to undoped BTESE membrane

    Patterning functional materials using channel diffused plasma-etched self-assembled monolayer templates

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    A simple and cost-effective methodology for large-area micrometer-scale patterning of a wide range of metallic and oxidic functional materials is presented. Self-assembled monolayers (SAM) of alkyl thiols on Au were micropatterned by channel-diffused oxygen plasma etching, a method in which selected areas of SAM were protected from plasma oxidation via a soft lithographic stamp. The patterned SAMs were used as templates for site-selective electrodeposition, electroless deposition and solution-phase deposition of functional materials such as ZnO, Ni, Ag thin films, and ZnO nanowires. The patterned SAMs and functional materials were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), atomic force microscopy (AFM), and tunneling AFM (TUNA).\u

    Metal Oxide Nanosheets as 2D Building Blocks for the Design of Novel Materials

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    Research into 2-dimensional materials has soared during the last couple of years. Next to van der Waals type 2D materials such as graphene and h-BN, less well-known oxidic 2D equivalents also exist. Most 2D oxide nanosheets are derived from layered metal oxide phases, although few 2D oxide phases can be also made by bottom-up solution syntheses. Owing to the strong electrostatic interactions within layered metal oxide crystals, a chemical process is usually needed to delaminate them into their 2D constituents. This Review article provides an overview of the synthesis of oxide nanosheets, and methods to assemble them into nanocomposites, mono- or multilayer films. In particular, the use of Langmuir–Blodgett methods to form monolayer films over large surface areas, and the emerging use of ink jet printing to form patterned functional films is emphasized. The utilization of nanosheets in various areas of technology, for example, electronics, energy storage and tribology, is illustrated, with special focus on their use as seed layers for epitaxial growth of thin films, and as electrochemically active electrodes for supercapacitors and Li ion batteries.</p

    Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films

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    Atomically defined substrate surfaces are prerequisite for the epitaxial growth of complex oxide thin films. In this protocol, two approaches to obtain such surfaces are described. The first approach is the preparation of single terminated perovskite SrTiO(3 )(001) and DyScO(3) (110) substrates. Wet etching was used to selectively remove one of the two possible surface terminations, while an annealing step was used to increase the smoothness of the surface. The resulting single terminated surfaces allow for the heteroepitaxial growth of perovskite oxide thin films with high crystalline quality and well-defined interfaces between substrate and film. In the second approach, seed layers for epitaxial film growth on arbitrary substrates were created by Langmuir-Blodgett (LB) deposition of nanosheets. As model system Ca(2)Nb(3)O(10)(-) nanosheets were used, prepared by delamination of their layered parent compound HCa(2)Nb(3)O(10). A key advantage of creating seed layers with nanosheets is that relatively expensive and size-limited single crystalline substrates can be replaced by virtually any substrate material

    Nanopatterning of functional materials by gas phase pattern deposition of self assembled molecular thin films in combination with electrodeposition

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    We present a general methodology to pattern functional materials on the nanometer scale using self-assembled molecular templates on conducting substrates. A soft lithographic gas phase edge patterning process using poly(dimethylsiloxane) molds was employed to form electrically isolating organosilane patterns of a few nanometer thickness and a line width that could be tuned by varying the time of deposition. Electrodeposition was employed to deposit patterns of Ni and ZnO on these prepatterned substrates. Deposition occurred only on patches of the substrate where no organosilane monolayer was present. The process is simple, inexpensive, and scalable to large areas. We achieved formation of metallic and oxide material patterns with a lateral resolution of 80 n
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