DIE ENTWICKLUNG DER HOCHEFFEKTIVEN SCHWEIß PROZEDUR FÜR DICKE STÄHL MIT STABILISIERTEN VERGRABENEN HOCHSTROMBOGEN

Zakopani električni luk ( engl.Buried Arc ) je općenito poznat kao jedan od fenomena ponašanja električnog luka pri kojem je električni luk zajedno s vrhom rastaljene žice posstavljen ispod razine površine rastaljenog metala zavara. S obzirom na to da je izvor topline postavljen dublje u odnosu na konvencionalan električni luk,može se postići veća penetracija,što ovaj modalitet električnog luka čini prikladnim za zavarivanje debljih materijala. U ovom radu je predstavljen sustav za zavarivanje " D-Arc " koji koristi zakopani luk te su dani primjeri primjene na rzličitim oblicima spojeva.The buried arc phenomenom is conventionally known as one of arc phenomena in gas shielded arc welding in which an arc is generated with the wire tip position being deeper than the molten metal surface.Since heat input by the arc is applied to a deeper portion of the base material than the usual arc phenomenom,very deep penetration can be obtained. In this article welding system based on buried arc called " D-arc " is presented with results of application on different weld joint types.Der vergrabene Lichtbogen ( engl.Buried Arc ) ist generell bekannt als ein Phänomen wobei der Lichtbogen beim Schweissen,zusammen mit der Elektrodenspitze,sich unterhalb der Ebene des Schmelzmetalls befindet. Dabei kann man eine besser Penetration erschaffen und deshalb ist so ein Prinzip für dickere Stahlbleche besser geeignet. In dieser Arbeit ist das Schweißsystem " D-Arc ",der den vergrabenen Lichtbogen benutz,beschrieben und an mehreren als Beispiel gezeigt

DIE ENTWICKLUNG DER HOCHEFFEKTIVEN SCHWEIß PROZEDUR FÜR DICKE STÄHL MIT STABILISIERTEN VERGRABENEN HOCHSTROMBOGEN

Zakopani električni luk ( engl.Buried Arc ) je općenito poznat kao jedan od fenomena ponašanja električnog luka pri kojem je električni luk zajedno s vrhom rastaljene žice posstavljen ispod razine površine rastaljenog metala zavara. S obzirom na to da je izvor topline postavljen dublje u odnosu na konvencionalan električni luk,može se postići veća penetracija,što ovaj modalitet električnog luka čini prikladnim za zavarivanje debljih materijala. U ovom radu je predstavljen sustav za zavarivanje " D-Arc " koji koristi zakopani luk te su dani primjeri primjene na rzličitim oblicima spojeva.The buried arc phenomenom is conventionally known as one of arc phenomena in gas shielded arc welding in which an arc is generated with the wire tip position being deeper than the molten metal surface.Since heat input by the arc is applied to a deeper portion of the base material than the usual arc phenomenom,very deep penetration can be obtained. In this article welding system based on buried arc called " D-arc " is presented with results of application on different weld joint types.Der vergrabene Lichtbogen ( engl.Buried Arc ) ist generell bekannt als ein Phänomen wobei der Lichtbogen beim Schweissen,zusammen mit der Elektrodenspitze,sich unterhalb der Ebene des Schmelzmetalls befindet. Dabei kann man eine besser Penetration erschaffen und deshalb ist so ein Prinzip für dickere Stahlbleche besser geeignet. In dieser Arbeit ist das Schweißsystem " D-Arc ",der den vergrabenen Lichtbogen benutz,beschrieben und an mehreren als Beispiel gezeigt

Application of the Stark Effect to Evaluation of Asymmetric Orientation Structure in Second-Order nonlinear Optical Materials

Stark effect was applied to the evaluation of asymmetrical molecular orientation in second-order non1inear optical materials: an asymmetrical Langmuir-Blodgett (LB) film and a poled polymer film. In the case of the asymmetrical LB film, molecular orientation in three types of LB films, which were fabricated with hetero Y-type, Z-type and Y-type deposition, was determined from the analysis of the Stark effect spectra. Molecules in the hetero Y-type film was proved to align asymmetrically. However, molecular orientation in the Z-type film possessed very small asymmetry; the order parameter of the Z-the film was almost equal to that of the symmetric Y-type film. In the poled polymer film, we have succeeded in the in situ evaluation of molecular orientation behavior under poling field and relaxation behavior of the molecular orientation after the poling field was removed. Above Tg, polar molecules doped in a polymer film behaved as a noninteracting solution under the influence of poling field. The relaxation of the polar orientation in the absence of the poling field was observed even below Tg