Effect of thermal annealing on SHI irradiated indium implanted glassy carbon

Please read abstract in the article.The National Research Foundation (NRF) of South Africa and the University of Pretoria.http://www.elsevier.com/locate/nimb2022-06-22hj2022Materials Science and Metallurgical EngineeringPhysic

Migration behaviour of Europium implanted into single crystalline 6H-SiC

Migration behaviour of Europium (Eu) implanted into 6H-SiC was investigated using Rutherford backscattering spectroscopy (RBS), RBS in a channelling mode (RBS-C) and scanning electron microscopy (SEM). Eu ions of 360 keV were implanted into 6H-SiC at 600 °C to a fluence of 1 × 1016 cm−2. The implanted samples were sequentially annealed at temperatures ranging from 1000 to 1400 °C, in steps of 100 °C for 5 h. RBS-C showed that implantation of Eu into 6H-SiC at 600 °C retained crystallinity with some radiation damage. Annealing of radiation damage retained after implantation already took place after annealing at 1000 °C. This annealing of radiation damage progressed with increasing annealing temperature up to 1400 °C. A shift of Eu towards the surface took place after annealing at 1000 °C. This shift became more pronounced and was accompanied by loss of Eu from the surface at annealing temperatures >1000 °C. This shift was accompanied by broadening of Eu peak/Fickian diffusion after annealing at temperatures >1100 °C. The migration of Eu occurring concurrently with the annealing of radiation damage was explained by trapping and de-trapping of Eu by radiation damage.The National Research Foundation (NRF) (grant no: 94104) of South Africahttp://www.journals.elsevier.com/vacuum2018-07-30hj2017Physic

Kinetics of solid-state reactions between zirconium thin film and silicon carbide at elevated temperatures

Solid state reactions between a thin film (133 nm) of Zr and bulk single crystalline 6H-SiC substrates have been studied at temperatures between 600 °C and 850 °C for durations of 30, 60 and 120 min under high vacuum conditions. The deposited film and reaction zones were investigated by Rutherford backscattering spectrometry (RBS) and X-ray diffraction. The RBS spectra were simulated in order to obtain the deposited layer thickness, reaction zone compositions and reaction zone thickness. The as-deposited spectra fit well with those annealed at 600 °C, thus showing there were no reactions taking place. At temperatures of 700 °C and above, Zr reacted with the SiC substrate and formed a mixed layer of Zr carbide (ZrCx) and Zr silicides (ZrSi, Zr2Si and Zr5Si3). Annealing at 850 °C for 240 min revealed that all the deposited Zr had completely reacted. The interface reaction follows the parabolic growth law thereby indicating diffusion controlled reaction kinetics. The activation energy for the diffusion process obtained was 1.6 eV in the relatively narrow temperature range 700–850 °C.http://www.elsevier.com/locate/nimbhb201

In-situ RBS studies of strontium implanted glassy carbon

The diffusion behaviour of strontium in glassy carbon was investigated using in-situ real time Rutherford backscattering spectrometry. The sample was annealed in vacuum from room temperature to 650 oC. Diffusion of the implanted strontium towards the bulk was observed after annealing at temperatures ranging from 450 oC – 560 oC. The diffusion depth was limited to the end-of-ion-range region where there were still some radiation damage present.No diffusion into the pristine glassy carbon was observed suggestion that diffusion of Sr in glassy carbon can only occur in regions with radiation damage. Annealing the sample at higher temperatures higher than 560 oC resulted in migration of the implanted strontium towards the surface of the glassy carbon substrate. The amount of the accumulated strontium at the surface increased as the annealing temperature is increased. The RBS spectra obtained after annealing the sample isothermally at 650 oC for 2 hours show that there was no further diffusion and accumulation of the strontium during this period.http://www.journals.elsevier.com/vacuum2017-04-30hb2017Physic