30 research outputs found
Saturation of front propagation in a reaction-diffusion process describing plasma damage in porous low-k materials
Get PDFWe propose a three-component reaction-diffusion system yielding an asymptotic
logarithmic time-dependence for a moving interface. This is naturally related
to a Stefan-problem for which both one-sided Dirichlet-type and von
Neumann-type boundary conditions are considered. We integrate the dependence of
the interface motion on diffusion and reaction parameters and we observe a
change from transport behavior and interface motion \sim t^1/2 to logarithmic
behavior \sim ln t as a function of time. We apply our theoretical findings to
the propagation of carbon depletion in porous dielectrics exposed to a low
temperature plasma. This diffusion saturation is reached after about 1 minute
in typical experimental situations of plasma damage in microelectronic
fabrication. We predict the general dependencies on porosity and reaction
rates.Comment: Accepted for publication in Phys. Rev.
High-temperature reactions of metals with gases I. Formation of chemical compound layer at a metal/gas interface. Kinetics of growth of a single-phase layer
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High-temperatures reactions of metals with gases II. Kinetics of growth of multiphase chemical compound layers at a metal/gas interface
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Electrochemical method of revealing the transition zone microstructure in bimetals and metallic composite materials
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