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    Tin Disulfideî—¸An Emerging Layered Metal Dichalcogenide Semiconductor: Materials Properties and Device Characteristics

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    Layered metal dichalcogenides have attracted significant interest as a family of single- and few-layer materials that show new physics and are of interest for device applications. Here, we report a comprehensive characterization of the properties of tin disulfide (SnS<sub>2</sub>), an emerging semiconducting metal dichalcogenide, down to the monolayer limit. Using flakes exfoliated from layered bulk crystals, we establish the characteristics of single- and few-layer SnS<sub>2</sub> in optical and atomic force microscopy, Raman spectroscopy and transmission electron microscopy. Band structure measurements in conjunction with <i>ab initio</i> calculations and photoluminescence spectroscopy show that SnS<sub>2</sub> is an indirect bandgap semiconductor over the entire thickness range from bulk to single-layer. Field effect transport in SnS<sub>2</sub> supported by SiO<sub>2</sub>/Si suggests predominant scattering by centers at the support interface. Ultrathin transistors show on–off current ratios >10<sup>6</sup>, as well as carrier mobilities up to 230 cm<sup>2</sup>/(V s), minimal hysteresis, and near-ideal subthreshold swing for devices screened by a high-<i>k</i> (deionized water) top gate. SnS<sub>2</sub> transistors are efficient photodetectors but, similar to other metal dichalcogenides, show a relatively slow response to pulsed irradiation, likely due to adsorbate-induced long-lived extrinsic trap states
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