63 research outputs found

    Diazonaphthoquinone-based resists

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    Study of PAG Material Design for ArF Immersion Photoresist

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    GAS-PHASE REACTIONS .61. NITRILE IMINES RC=+N--N-SI(CH3)3 - OPTIMIZATION OF GAS-PHASE SYNTHESIS AND ASSIGNMENT OF THEIR PHOTOELECTRON-SPECTRA

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    The flash vacuum pyrolysis of 5-R-2-trimethylsilyl-tetrazoles to nitrile imines RC N ⊕ N {circled dash}Si(CH) with R = CH, CH has been optimized by real-time photoelectron spectroscopic gas analysis and the assignment of their ionization patterns confirms the proposed frontier orbital sequence, which allows a rationalization of their regioselectivity in 1,3-dipolar additions

    Percolation theory and resist development in X-ray lithography

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    A two parameter model for the percolational development process of high speed X-ray photoresists is presented with corresponding computer simulation in two and three space dimensions. The number of the parameters for the description of the resist response are the size of the resist volume affected by a single photoabsorption event and the ratio of the development rates of irradiated and non-irradiated areas. The roughness of resist development fronts is characterized in terms of their fractal dimension

    DUV Photolithography and Materials

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