27 research outputs found
Change in Microstructure and Magnetic Properties of Transition Metal Nitride Thin Films by Substrate Temperature
Access full text - https://doi.org/10.1007/978-3-030-31866-6_8The magnetic and mechanical properties of transition metal nitrides can be altered in many ways by their composition and microstructure, thus giving them excellent usability for spintronics and corrosion resistant coatings. The production of binary and ternary nitride thin films by reactive sputter deposition provides a wide variety of unique material combinations. This study shows the considerable influence of the substrate temperature on microstructure and magnetic properties for different nitride compounds (Fe-N, Ni-N, Fe-Ni-N, and Fe-Al-N). The substrate temperature is found to be a significant parameter which allows adjusting the phase formation and magnetic properties from soft ferromagnetic to superparamagnetic. Furthermore, the extent and incidence of texturing as well as the transition from poly- to monocrystalline thin films can be controlled
Probing radical kinetics in the afterglow of pulsed discharges by absorption spectroscopy with LED: application to BCl radical
International audienc
Gas convection caused by electron pressure drop in the afterglow of a pulsed inductively coupled plasma discharge
International audienceNeutral depletion is an important phenomenon in high-density plasmas. We show that in pulsed discharges, the neutral depletion caused by the electron pressure Pe plays an important role on radical transport. In the afterglow, Pe drops rapidly by electron cooling. So, a neutral pressure gradient built up between the plasma bulk and the reactor walls, which forces the cold surrounding gas to move rapidly toward the reactor center. Measured drift velocity of Al atoms in the early afterglow of Cl2/Ar discharge by time-resolved laser induced fluorescence is as high as 250 ms-1. This is accompanied by a rapid gas cooling
Time-resolved absorption spectroscopy with LED: application to etching plasma monitoring
International audienc
Physical and chemical reactions in Cl2 based etching plasmas: influence of plasma-surface interactions
International audienc
Laser and LED based optical diagnostic techniques applied in industrial plasma etch reactors
International audienc
Physical and chemical reactions in Cl2 based etching plasmas: influence of plasma-surface interactions
International audienc
