1.55 μm direct bandgap electroluminescence from strained n-Ge quantum wells grown on Si substrates

Electroluminescence from strained n-Ge quantum well light emitting diodes grown on a silicon substrate are demonstrated at room temperature. Electroluminescence characterisation demonstrates two peaks around 1.55 μm and 1.8 μm, which correspond to recombination between the direct and indirect transitions, respectively. The emission wavelength can be tuned by around 4% through changing the current density through the device. The devices have potential applications in the fields of optical interconnects, gas sensing, and healthcare

Application of Bryan's algorithm to the mobility spectrum analysis of semiconductor devices

A powerful method for mobility spectrum analysis is presented, based on Bryan's maximum entropy algorithm. The Bayesian analysis central to Bryan's algorithm ensures that we avoid overfitting of data, resulting in a physically reasonable solution. The algorithm is fast, and allows the analysis of large quantities of data, removing the bias of data selection inherent in all previous techniques. Existing mobility spectrum analysis systems are reviewed, and the performance of the Bryan's algorithm mobility spectrum (BAMS) approach is demonstrated using synthetic data sets. Analysis of experimental data is briefly discussed. We find that BAMS performs well compared to existing mobility spectrum methods

Thermoelectric cross-plane properties on p- and n-Ge/SixGe1-x superlattices

Silicon and germanium materials have demonstrated an increasing attraction for energy harvesting, due to their sustainability and integrability with complementary metal oxide semiconductor and micro-electro-mechanical-system technology. The thermoelectric efficiencies for these materials, however, are very poor at room temperature and so it is necessary to engineer them in order to compete with telluride based materials, which have demonstrated at room temperature the highest performances in literature [1]. Micro-fabricated devices consisting of mesa structures with integrated heaters, thermometers and Ohmic contacts were used to extract the cross-plane values of the Seebeck coefficient and the thermal conductivity from p- and n-Ge/SixGe1-x superlattices. A second device consisting in a modified circular transfer line method structure was used to extract the electrical conductivity of the materials. A range of p-Ge/Si0.5Ge0.5 superlattices with different doping levels was investigated in detail to determine the role of the doping density in dictating the thermoelectric properties. A second set of n-Ge/Si0.3Ge0.7 superlattices was fabricated to study the impact that quantum well thickness might have on the two thermoelectric figures of merit, and also to demonstrate a further reduction of the thermal conductivity by scattering phonons at different wavelengths. This technique has demonstrated to lower the thermal conductivity by a 25% by adding different barrier thicknesses per period

Si/SiGe bound-to-continuum quantum cascade emitters

Si/SiGe bound-to-continuum quantum cascade emitters designed by self-consistent 6-band k.p modeling and grown by low energy plasma enhanced chemical vapour deposition are presented demonstrating electroluminescence between 1.5 and 3 THz. The electroluminescence is Stark shifted by an electric field and demonstrates polarized emission consistent with the design. Transmission electron microscopy and x-ray diffraction are also presented to characterize the thick heterolayer structure

Ge/SiGe parabolic quantum wells

Quantum wells with parabolic confining potentials allow the realization of semiconductor heterostructures mimicking the physical properties of a quantum harmonic oscillator. Here we report the attempt of attaining such parabolic quantum wells (PQWs) within the Ge/SiGe material platform. Multiple PQWs featuring different widths and composition have been epitaxially grown and characterized by means of high-resolution x-ray diffraction and scanning transmission electron microscopy. The compositional profile is seen to deviate slightly from an ideal parabola, but the quantum confined states are almost equally spaced within the valence and conduction band as indicated by photoreflectance measurements and k . p modelling

Flat metamorphic InAlAs buffer layer on GaAs(111)A misoriented substrates by growth kinetics control

We have successfully grown, through the detailed control of the growth kinetics, flat InAlAs metamorphic buffer layers on 2 degrees -off GaAs(111)A substrates using molecular beam epitaxy. Almost full plastic relaxation is obtained for a layer thickness > 40 nm. The control of an adatom diffusion length and a step ejection probability from the bunches permits a reduction of the InAlAs epilayer root-mean-square surface roughness to 0.55 nm

Probing the in-plane electron spin polarization in Ge/Si0.15 Ge0.85 multiple quantum wells

We investigate spin transport in a set of Ge/Si0.15Ge0.85 multiple quantum wells (MQWs) as a function of the well thickness. We exploit optical orientation to photogenerate spin-polarized electrons in the discrete energy levels of the well conduction band at the Γ point of the Brillouin zone. After diffusion, we detect the optically oriented spins by means of the inverse spin-Hall effect (ISHE) taking place in a thin Pt layer grown on top of the heterostructure. The employed spin injection/detection scheme is sensitive to in-plane spin-polarized electrons, therefore, by detecting the ISHE signal as a function of the photon energy, we evaluate the spin polarization generated by optical transitions driven by the component of the light wave vector in the plane of the wells. In this way, we also gain insight into the electron spin-diffusion length in the MQWs. The sensitivity of the technique to in-plane spin-related properties is a powerful tool for the investigation of the in-plane component of the spin polarization in MQWs, which is otherwise commonly inaccessible

Extending the emission wavelength of Ge nanopillars to 2.25 μm using silicon nitride stressors

The room temperature photoluminescence from Ge nanopillars has been extended from 1.6 μm to above 2.25 μm wavelength through the application of tensile stress from silicon nitride stressors deposited by inductively-coupled-plasma plasma-enhanced chemical-vapour-deposition. Photoluminescence measurements demonstrate biaxial equivalent tensile strains of up to ~ 1.35% in square topped nanopillars with side lengths of 200 nm. Biaxial equivalent strains of 0.9% are observed in 300 nm square top pillars, confirmed by confocal Raman spectroscopy. Finite element modelling demonstrates that an all-around stressor layer is preferable to a top only stressor, as it increases the hydrostatic component of the strain, leading to an increased shift in the band-edge and improved uniformity over top-surface only stressors layers