Structure determination of three-dimensional hafnium silicide nano structures on Si(1 0 0) by means of X-ray photoelectron diffraction

DAAD - DEUTSCHER AKADEMISCHER AUSTAUSCHDIENSTCAPES - COORDENAÇÃO DE APERFEIÇOAMENTO DE PESSOAL E NÍVEL SUPERIORDFG - DEUTSCHE FORSCHUNGSGEMEINSCHAFTWe propose a modified zirconium silicide model for the structure of HfSi2 islands on Si(1 0 0). We studied this system in a combined investigation by means of photoelectron diffraction (XPD), photoelectron spectroscopy and atomic force microscopy. Synchrotron radiation was used for enhanced energy resolution and surface sensitivity. Calculated XPD patterns of model clusters reflecting the structure as well as the morphology of the islands exhibit an excellent agreement with the experimental results. From LEED and AFM measurements a preferential nano structure growth along the [0 1 1] and [0 1 1] direction was observed. Complementary XPD results clearly show that the HfSi2 structures are silicon terminated.6022436473653DAAD - DEUTSCHER AKADEMISCHER AUSTAUSCHDIENSTCAPES - COORDENAÇÃO DE APERFEIÇOAMENTO DE PESSOAL E NÍVEL SUPERIORDFG - DEUTSCHE FORSCHUNGSGEMEINSCHAFTDAAD - DEUTSCHER AKADEMISCHER AUSTAUSCHDIENSTCAPES - COORDENAÇÃO DE APERFEIÇOAMENTO DE PESSOAL E NÍVEL SUPERIORDFG - DEUTSCHE FORSCHUNGSGEMEINSCHAFTDAAD [415-BR-PROBRAL-D-03-23553]CAPES [PROBRAL 170/04]DFG [1649/7-1]415-BR-PROBRAL-D-03-23553PROBRAL 170/041649/7-