Empirical Correction for Spectroscopic Ellipsometric Measurements of Rough or Textured Surfaces

A method of applying spectroscopic ellipsometry to arrive at accurate values of optical and physical properties for thin films on samples having rough or textured surfaces

APPLICATIONOFSPECTROSCOPIC ELLIPSOMETRY TO IN-STU. REAL-TIME FABRICATION OF MULTIPLE LAYER ALTERNATING HIGH/LOW REFRACTIVE INDEX FILTERS

Disclosed is application of oblique angle of incidence, reflection and/or transmission mode spectroscopic ellipsometry PSI and/or DELTA, (including combinations thereof and/or mathematical equivalents), vs. wavelength data to monitor and/or control fabrication of multiple layer high/low refractive index band-pass, band-reject and varied attenuation vs. wavelength filters, either alone or in combination with transmissive non-ellipsometric electromagnetic beam turning point vs. layer data obtained at an essentially normal angle of incidence

APPLICATION OF INTERMEDIATE WAVELENGTH BAND SPECTROSCOPIC ELLIPSOMETRY TO IN-STU. REAL TIME FABRICATION OF MULTIPLE LAYER ALTERNATING HGHALOW REFRACTIVE INDEX FILTERS

Disclosed is application of oblique angle of incidence, reflection and/or transmission mode spectroscopic ellipsometry PSI and/or DELTA, (including combinations thereof and/or mathematical equivalents), vs. wavelength data over an intermediate wavelength band range around a pass or reject band, to monitor and/or control fabrication of multiple layer high/low refractive index band-pass, band-reject and varied attenuation vs. wavelength thin film interference filters, either alone or in combination with transmissive non-ellipsometric electromagnetic beam turning point vs. layer data obtained at an essentially normal angle of incidence

TERAHERTZ-INFRARED ELLIPSOMETER SYSTEM, AND METHOD OF USE

The present invention relates to ellipsometer and polarimeter systems, and more particularly is an ellipsometer or polarimeter or the like system which operates in a frequency range between 300 GHz or lower and extending to higher than at least 1 Tera-hertz (THz), and preferably through the Infra-red (IR) range up Sh and his th. 100 THz, including: a Source Such as a backward wave oscillator, a Smith-Purcell cell; a free electron laser, or an FTIR source and a solid state device; and a detector Such as a Golay cell; abolometer or a solid state detector: and preferably including a polarization state generator comprising: an odd bounce image rotating system and a polarizer, or two polarizers; and optionally including least one compensator and/or modulator, in addition to an analyzer

METHOD OFOBTAINING MICROGRAPHS OF TRANSPARENT OR SEMI-TRANSPARENT SPECIMENS USING ANISOTROPIC CONTRAST

Anisotropic contrast methodology in combination with use of sample investigating polarized electromagnetic radiation to provide Jones or Mueller Matrix imaging data corresponding to areas on samples

SYSTEM FOR REDUCING STRESS INDUCED EFFECTS DURINGDETERMINATION OF FLUID OPTICAL CONSTANTS

A system for determination of optical constants of liquids, including provision for reducing stress induced effects while obtaining data

SYSTEM AND METHOD ENABLING SIMULTANEOUS INVESTIGATION OF SAMPLE WITH TWO BEAMS OF ELECTROMAGNETIC RADATION

Disclosed are System and method for characterizing a System consisting of a fluid Sample on a two sided Stage, utilizing data obtained by applying, from both sides thereof, beams of electromagnetic radiation to a fluid coated Surface in a containing cell Volume. The beams can have the same or different wavelength content and/or polarization State, and can be applied at the same or different magnitude angles-of-incidence, and a third typically unpolarized beam can be applied at a normal angle-of-incidence

SYSTEM AND METHOD ENABLING SIMULTANEOUS INVESTIGATION OF SAMPLE WITH TWO BEAMS OF ELECTROMAGNETIC RADIATION

Disclosed are system and method for a characterizing system consisting of a fluid sample on a two-sided stage, utilizing data obtained by applying, from both sides thereof, beams of electromagnetic radiation to a fluid coated surface in a containing cell volume. The beams can have the same or different wavelength content and/or polarization state and can be applied at the same or different magnitude angles-of-incidence, and a third typically unpolarized beam can be applied at a normal angle-of-incidence

Spectroscopic Ellipsometer and Polarimeter Systems

A spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of detector elements, there being apertures before the stage for supporting a material system, and thereafter, the system being present in an environmental control chamber

Spectroscopic Ellipsometer and Polarimeter Systems

A spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of detector elements, there being apertures before the stage for supporting a material system, and thereafter, the system being present in an environmental control chamber