2 research outputs found

    Adsorption and Reactions of ICH<sub>2</sub>CN on Cu(100) and O/Cu(100)

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    Monitoring surface species and their bonding structures in link to specific chemical processes has long been an active, important subject in heterogeneous catalysis. In this article, with employment of temperature-programmed reaction/desorption, reflection–absorption infrared spectroscopy, Auger electron spectroscopy, and X-ray photoelectron spectroscopy in combination with density functional theory computation, we present three CH<sub>3</sub>CN formation channels from reaction of CH<sub>2</sub>CN generated by ICH<sub>2</sub>CN dissociative adsorption on Cu(100) and first spectroscopic evidence for CHCN on single crystal surfaces. The CH<sub>3</sub>CN formation mechanisms are dependent on CH<sub>2</sub>CN adsorption geometries. At lower coverages, CH<sub>2</sub>CN is adsorbed with the C–C–N approximately parallel to the surface. Reaction of these adsorbates produces CH<sub>3</sub>CN via first- and second-order kinetics, with the largest desorption rates occurring at 213 K and ∼400 K, respectively. At or near a saturated first-layer coverage, decomposition of ICH<sub>2</sub>CN forms C-bonded CH<sub>2</sub>CN (−CH<sub>2</sub>CN), which then transforms to N-bonded −NCCH<sub>2</sub> with tilted orientation. Disproportionation of the −NCCH<sub>2</sub> generates CH<sub>3</sub>CN at ∼324 K. Thermal products of H<sub>2</sub>, HCN and (CN)<sub>2</sub> evolving at higher temperatures are originated from the CHCN dissociation. On oxygen-precovered Cu(100), reaction of CH<sub>2</sub>CN forms new surface intermediates of vertical −NCO and −CCO, in addition to perturbed CH<sub>3</sub>CN desorption. In the conditions studied, formation of H<sub>2</sub>, HCN, and (CN)<sub>2</sub> is terminated due to the presence of preadsorbed O. −NCO and −CCO on O/Cu dissociate at ∼525 and 610 K, respectively, into CO and CO<sub>2</sub>

    Adsorption and Reactions of ICH<sub>2</sub>CN on Cu(100) and O/Cu(100)

    No full text
    Monitoring surface species and their bonding structures in link to specific chemical processes has long been an active, important subject in heterogeneous catalysis. In this article, with employment of temperature-programmed reaction/desorption, reflection–absorption infrared spectroscopy, Auger electron spectroscopy, and X-ray photoelectron spectroscopy in combination with density functional theory computation, we present three CH<sub>3</sub>CN formation channels from reaction of CH<sub>2</sub>CN generated by ICH<sub>2</sub>CN dissociative adsorption on Cu(100) and first spectroscopic evidence for CHCN on single crystal surfaces. The CH<sub>3</sub>CN formation mechanisms are dependent on CH<sub>2</sub>CN adsorption geometries. At lower coverages, CH<sub>2</sub>CN is adsorbed with the C–C–N approximately parallel to the surface. Reaction of these adsorbates produces CH<sub>3</sub>CN via first- and second-order kinetics, with the largest desorption rates occurring at 213 K and ∼400 K, respectively. At or near a saturated first-layer coverage, decomposition of ICH<sub>2</sub>CN forms C-bonded CH<sub>2</sub>CN (−CH<sub>2</sub>CN), which then transforms to N-bonded −NCCH<sub>2</sub> with tilted orientation. Disproportionation of the −NCCH<sub>2</sub> generates CH<sub>3</sub>CN at ∼324 K. Thermal products of H<sub>2</sub>, HCN and (CN)<sub>2</sub> evolving at higher temperatures are originated from the CHCN dissociation. On oxygen-precovered Cu(100), reaction of CH<sub>2</sub>CN forms new surface intermediates of vertical −NCO and −CCO, in addition to perturbed CH<sub>3</sub>CN desorption. In the conditions studied, formation of H<sub>2</sub>, HCN, and (CN)<sub>2</sub> is terminated due to the presence of preadsorbed O. −NCO and −CCO on O/Cu dissociate at ∼525 and 610 K, respectively, into CO and CO<sub>2</sub>
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