Additional file 2: of Training needs assessment of health care professionals in a developing country: the example of Saint Lucia

The dataset supporting the conclusions of this article. (XLS 441kb

Additional file 1: of Training needs assessment of health care professionals in a developing country: the example of Saint Lucia

Training Needs Assessment Questionnaire. (DOCX 40kb

Adsorption and Reactions of ICH₂CN on Cu(100) and O/Cu(100)

Monitoring surface species and their bonding structures in link to specific chemical processes has long been an active, important subject in heterogeneous catalysis. In this article, with employment of temperature-programmed reaction/desorption, reflection–absorption infrared spectroscopy, Auger electron spectroscopy, and X-ray photoelectron spectroscopy in combination with density functional theory computation, we present three CH₃CN formation channels from reaction of CH₂CN generated by ICH₂CN dissociative adsorption on Cu(100) and first spectroscopic evidence for CHCN on single crystal surfaces. The CH₃CN formation mechanisms are dependent on CH₂CN adsorption geometries. At lower coverages, CH₂CN is adsorbed with the C–C–N approximately parallel to the surface. Reaction of these adsorbates produces CH₃CN via first- and second-order kinetics, with the largest desorption rates occurring at 213 K and ∼400 K, respectively. At or near a saturated first-layer coverage, decomposition of ICH₂CN forms C-bonded CH₂CN (−CH₂CN), which then transforms to N-bonded −NCCH₂ with tilted orientation. Disproportionation of the −NCCH₂ generates CH₃CN at ∼324 K. Thermal products of H₂, HCN and (CN)₂ evolving at higher temperatures are originated from the CHCN dissociation. On oxygen-precovered Cu(100), reaction of CH₂CN forms new surface intermediates of vertical −NCO and −CCO, in addition to perturbed CH₃CN desorption. In the conditions studied, formation of H₂, HCN, and (CN)₂ is terminated due to the presence of preadsorbed O. −NCO and −CCO on O/Cu dissociate at ∼525 and 610 K, respectively, into CO and CO₂

Adsorption and Reactions of ICH₂CN on Cu(100) and O/Cu(100)

Monitoring surface species and their bonding structures in link to specific chemical processes has long been an active, important subject in heterogeneous catalysis. In this article, with employment of temperature-programmed reaction/desorption, reflection–absorption infrared spectroscopy, Auger electron spectroscopy, and X-ray photoelectron spectroscopy in combination with density functional theory computation, we present three CH₃CN formation channels from reaction of CH₂CN generated by ICH₂CN dissociative adsorption on Cu(100) and first spectroscopic evidence for CHCN on single crystal surfaces. The CH₃CN formation mechanisms are dependent on CH₂CN adsorption geometries. At lower coverages, CH₂CN is adsorbed with the C–C–N approximately parallel to the surface. Reaction of these adsorbates produces CH₃CN via first- and second-order kinetics, with the largest desorption rates occurring at 213 K and ∼400 K, respectively. At or near a saturated first-layer coverage, decomposition of ICH₂CN forms C-bonded CH₂CN (−CH₂CN), which then transforms to N-bonded −NCCH₂ with tilted orientation. Disproportionation of the −NCCH₂ generates CH₃CN at ∼324 K. Thermal products of H₂, HCN and (CN)₂ evolving at higher temperatures are originated from the CHCN dissociation. On oxygen-precovered Cu(100), reaction of CH₂CN forms new surface intermediates of vertical −NCO and −CCO, in addition to perturbed CH₃CN desorption. In the conditions studied, formation of H₂, HCN, and (CN)₂ is terminated due to the presence of preadsorbed O. −NCO and −CCO on O/Cu dissociate at ∼525 and 610 K, respectively, into CO and CO₂

Reactions of CH₂CHBr and CH₃CHBr₂ on Cu(100) and O/Cu(100)

Temperature-programmed reaction/desorption (TPR/D) and reflection–absorption infrared spectroscopy (RAIRS) have been employed to study the reactions of CH₂CHBr and CH₃CHBr₂ on Cu(100) and O/Cu(100). In the TPR/D study, CH₂CHCHCH₂ is the sole product detected from the reaction of CH₂CHBr adsorbed on Cu(100) and featured by complex, coverage-dependent thermal desorption profiles (∼220–380 K). The preadsorbed oxygen can modify the evolution behavior of 1,3-butadiene from the CH₂CHBr reaction but has no influence on the main 1,3-butadiene formation at 265 K. Moreover, the surface oxygen participates in the CH₂CHBr reaction, forming an intermediate of >CCO, as well as additional products of H₂O, C₂H₂, CO, and CO₂, presumably via H-abstraction. New reaction pathways, which are otherwise not observed in the TPR/D study, are opened when CH₂CHBr impinges on Cu(100) at high temperatures. At 500 K, H₂, C₂H₂, and C₂H₄ are generated from the incident CH₂CHBr molecules upon Cu(100). The reaction of adsorbed CH₃CHBr₂ on Cu(100) only forms CH₃CHCHCH₃ in TPR/D experiments. This product can be generated at the surface temperature as low as 120 K. Preadsorbed oxygen on Cu(100) can increase the 2-butene formation to 190 K, the peak temperature. An additional product of CH₃CHO is also formed, but its amount is small. Apparently, preadsorbed oxygen on Cu(100) has different effects on the reaction pathways for the adsorbed CH₂CHBr and CH₃CHBr₂