Focusing of a tabletop soft-x-ray laser beam and laser ablation

Includes bibliographical references (page 1716).We focused the beam of a high-repetition-rate capillary-discharge tabletop laser operating at a wavelength of 46.9 nm, using a spherical Si/Sc multilayer mirror. The energy densities significantly exceeded the thresholds for the ablation of metals. Single-shot laser ablation patterns were used in combination with ray-tracing computations to characterize the focused beam. The radiation intensity within the 2-μm-diameter central region of the focal spot was estimated to be ≈1011 W/cm2, with a corresponding energy density of ~100 J/cm2

Prospects of reflectometry and ellipsometry with Colorado State University tabletop XUV laser, The

Includes bibliographical references (page 457).The capillary discharge ArIX laser (wavelength 46.9nm) is a new device attractive for various applications due to its unique for XUV lasers properties: high average power and compactness. Reflectometry and ellipsometry are among them. The first is capable to provide fundamental data on optical constants of solids, which are still rather limited. Reflection coefficient in this spectral range is highly sensitive to the presence of an over layer at the surface of a sample. This hinders bulk optical constants determination, but offers the possibility to study chemical contamination by ambience. The theory of reflection from a surface with a thin overlayer is developed. It enables to rigorously include overlayer into reflectometry data processing and derive separately the parameters of bulk and overlayer. Ellipsometry in general is more powerful than reflectometry method to measure optical constants. In addition it offers the accurate methods to measure film thickness and properties of magnetic materials. Unfortunately high quality analyzers and polarizers are not available in this spectral range, which requires specific approach to ellipsometric measurements. We discuss and use for this purpose Sc/Si multilayer structures

Extremely compact soft X-ray lasers based on capillary discharges

Includes bibliographical references (page 522).Extremely compact high repetition rate soft X-ray lasers based on capillary discharge excitation have demonstrated average powers of a few milliWatt at 46.9 nm, milli-Joule-level pulse energy, peak spectral brightness several orders of magnitude larger than third-generation synchrotron beam lines, and excellent spatial coherence. Examples of the use of a capillary discharge soft X-ray laser in dense plasma diagnostics and laser ablation of materials are summarized

Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses

Includes bibliographical references (page 622).The damage threshold and damage mechanism of extreme-ultraviolet Sc/Si multilayer mirror coatings are investigated with focused nanosecond pulses at 46.9-nm radiation from a compact capillary-discharge laser. Damage threshold fluences of ~0.08 J/cm2 are measured for coatings deposited on both borosilicate glass and Si substrates. The use of scanning and transmission electron microscopy and small-angle x-ray diffraction techniques reveals the thermal nature of the damage mechanism. The results are relevant to the use of newly developed high-flux extreme-ultraviolet sources in applications

Applications of high repetition rate tabletop soft X-ray lasers become a reality in several fields

Includes bibliographical references (page 468).For many years researchers have envisioned the development of compact high repetition rate tabletop soft x-ray laser, that could be routinely used in application in numerous disciplines. With demonstrated average powers of several mW and millijoule-level pulse energy at 46.9nm, the Ne-like Ar capillary discharge-pumped laser is the first compact laser to reach this goal. In this paper we summarize the development status of high repetition rate tabletop soft x-ray lasers based on capillary discharge excitation, and give examples of their successful use in several applications. Results of the use of a caprllary discharge pumped 46.9nm laser m dense plasma interferometry, soft x-ray reflectometry for the determination of optical constants, characterization of diffraction gratings, laser ablation of materials, and plasma generation are described. The observation of lasing at 52.9nm line in Ne-like Cl with output pulse energy up to 10 μJ is also reported

Nanoimaging with a compact extreme-ultraviolet laser

Includes bibliographical references (page 2097).Images with a spatial resolution of 120-150 nm were obtained with 46.9 nm light from a compact capillary-discharge laser by use of the combination of a Sc-Si multilayer-coated Schwarzschild condenser and a freestanding imaging zone plate. The results are relevant to the development of compact extreme-ultraviolet laser-based imaging tools for nanoscience and nanotechnology

Structural transformations in Sc/Si multilayers irradiated by EUVlasers

Multilayer mirrors for the extreme ultraviolet (EUV) are keyelements for numerous applications of coherent EUV sources such as newtabletop lasers and free-electron lasers. However the field ofapplications is limited by the radiation and thermal stability of themultilayers. Taking into account the growing power of EUV sources thestability of the optics becomes crucial. To overcome this problem it isnecessary to study the degradation of multilayers and try to increasetheir temporal and thermal stability. In this paper we report the resultsof detailed study of structural changes in Sc/Simultilayers when exposedto intense EUV laser pulses. Various types of surface damage such asmelting, boiling, shockwave creation and ablation were observed asirradiation fluencies increase. Cross-sectional TEM study revealed thatthe layer structure was completely destroyed in the upper part ofmultilayer, but still survived below. The layers adjacent tothe substrateremained intact even through the multilayer surface melted down, thoughthe structure of the layers beneath the molten zone was noticeablychanged. The layer structure in this thermally affected zone is similarto that of isothermally annealed samples. All stages of scandium silicideformation such as interdiffusion, solid-state amorphization, silicidecrystallization, etc., are present in the thermally affected zone. Itindicates a thermal nature of the damage mechanism. The tungstendiffusion barriers were applied to the scandium/silicon interfaces. Itwas shown that the barriers inhibited interdiffusion and increased thethermal stability of Sc/Si mirrors

Determination of XUV optical constants by reflectometry using a high-repetition rate 46.9-nm laser

Includes bibliographical references (pages 1500-1501).We report the measurement of the optical constants of Si, GaP, InP, GaAs, GaAsP, and Ir at a wavelength of 46.9nm (26.5 eV). The optical constants were obtained from the measurement of the variation of the reflectivity as a function of angle utilizing, as an illumination source, a discharge pumped 46.9-nm table-top laser operated at a repetition rate of 1 Hz. These measurements constitute the first application of an ultrashort wavelength laser to materials research

Capillary discharge tabletop soft X-ray lasers reach new wavelengths and applications

Includes bibliographical references (pages 1080-1081).For many years, researchers have envisioned the development of compact high repetition rate tabletop soft X-ray lasers that could be routinely used in application in numerous disciplines. With demonstrated average powers of several mW and mJ-level pulse energy at 46.9 nm, capillary discharge-pumped lasers are the first compact lasers to reach this goal. In this paper we summarize the development status of high repetition rate tabletop soft X-ray lasers based on capillary discharge excitation, and give examples of their successful use in several applications. Results of the use of a capillary discharge pumped 46.9 nm laser in dense plasma interferometry, soft X-ray reflectometry for the determination of optical constants, and laser ablation are described. The observation of lasing at 53 nm line in Ne-like Cl with output pulse energy up to 10 μJ is also reported