2 research outputs found
Plasma-Induced Decomposition of Copper Complex Ink for the Formation of Highly Conductive Copper Tracks on Heat-Sensitive Substrates
The use of Cu-formate–2-amino-2-methyl-1-propanol
ink and
low-pressure plasma for the formation of highly conductive patterns
on heat sensitive plastic substrates was studied. It was found that
plasma results in decomposition of copper complex to form metallic
copper without heating at high temperatures. Ink composition and plasma
parameters (predrying conditions, plasma treatment duration, gas type,
and flow rate) were optimized to obtain uniform conductive metallic
films. The morphology and electrical characteristics of these films
were evaluated. Exposing the printed copper metallo-organic decomposition
(MOD) ink to 160 W plasma for 8 min yielded resistivity as low as
7.3 ± 0.2 μΩ cm, which corresponds to 23% bulk copper
conductivity. These results demonstrate the applicability of MOD inks
and plasma treatment to obtain highly conductive printed patterns
on low-cost plastic substrates and 3D printed polymers
Room Temperature Relaxometry of Single Nitrogen Vacancy Centers in Proximity to α‑RuCl<sub>3</sub> Nanoflakes
Nitrogen vacancy
(NV) center-based magnetometry has been proven
to be a versatile sensor for various classes of magnetic materials
in broad temperature and frequency ranges. Here, we use the longitudinal
relaxation time T1 of single NV centers
to investigate the spin dynamics of nanometer-thin flakes of α-RuCl3 at room temperature. We observe a significant reduction in
the T1 in the presence of α-RuCl3 in the proximity of NVs, which we attribute to paramagnetic
spin noise confined in the 2D hexagonal planes. Furthermore, the T1 time exhibits a monotonic increase with an
applied magnetic field. We associate this trend with the alteration
of the spin and charge noise in α-RuCl3 under an
external magnetic field. These findings suggest that the influence
of the spin dynamics of α-RuCl3 on the T1 of the NV center can be used to gain information about
the material itself and the technique to be used on other 2D materials