Deuterium Retention and Release Behavior from Beryllium Co-Deposited Layers at Distinct Ar/D Ratio

Beryllium-deuterium co-deposited layers were obtained using DC magnetron sputtering technique by varying the Ar/D2 gas mixture composition (10/1; 5/1; 2/1 and 1:1) at a constant deposition rate of 0.06 nm/s, 343 K substrate temperature and 2 Pa gas pressure. The surface morphology of the layers was analyzed using Scanning Electron Microscopy and the layer crystalline structure was analyzed by X-ray diffraction. Rutherford backscattering spectrometry was employed to determine the chemical composition of the layers. D trapping states and inventory quantification were performed using thermal desorption spectroscopy. The morphology of the layers is not influenced by the Ar/D2 gas mixture composition but by the substrate type and roughness. The increase of the D2 content during the deposition leads to the deposition of Be-D amorphous layers and also reduces the layer thickness by decreasing the sputtering yield due to the poisoning of the Be target. The D retention in the layers is dominated by the D trapping in low activation binding states and the increase of D2 flow during deposition leads to a significant build-up of deuterium in these states. Increase of deuterium flow during deposition consequently leads to an increase of D retention in the beryllium layers up to 300%. The resulted Be-D layers release the majority of their D (above 99.99%) at temperatures lower than 700 K

Kaolinite Thin Films Grown by Pulsed Laser Deposition and Matrix Assisted Pulsed Laser Evaporation

In this work, thin films of lamellar clays were deposited by laser techniques (matrix assisted pulsed laser evaporation (MAPLE) and pulsed laser deposition (PLD)). The focus of this paper is the optimization of deposition parameters for the production of highly oriented crystalline films. The films were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM). Contact angle measurements were employed to identify the wetting properties of the deposited thin films. Hydrophobic to superhydrophilic films can be prepared by using different deposition techniques and deposition parameters. MAPLE led to superhydrophilic films with contact angles in the range 4°–8°, depending on the microstructure and surface roughness at micro and nano scale. The 1064 nm PLD had a high deposition rate and produced a textured film while at λ = 193 nm an extremely thin and amorphous layer was depicted. Oriented kaolinite films were obtained by MAPLE even at 5 wt.% kaolinite in the target