Fabrication of Large-Area Metal Oxide Infrared Metasurfaces

We present recent developments for the fabrication of functional metasurfaces in the mid- and long-wave infrared using 200mm wafer scale nanofabrication techniques. Our results include deep-UV scanner lithography of multi-band metasurfaces with tailored reflectivities in the two atmospheric windows. Also we will show recent results on smart radiative cooling metasurfaces based on atomic layer deposition of W:VO2

Wafer‐Scale 200 mm Metal Oxide Infrared Metasurface with Tailored Differential Emissivity Response in the Atmospheric Windows

International audienceMetasurfaces with sub-wavelength nanoscale features have emerged as a platform to achieve desirable electromagnetic responses. However, it remains technically challenging to fabricate metasurfaces in large size and at low cost for mass production. This work demonstrates a 200 mm wafer-scale Al:ZnO metasurface coating based on deep-UV lithography. The metasurfaces are targeted to achieve infrared (IR) reflectivity and emissivity characteristics at bandwidths across the two atmospheric windows in the IR spectrum. The wafers demonstrate a high uniformity of optical response with tailored reflectivity of around 50% at the 3–5 µm mid-wave IR band and less than 10% at the 8–13 µm long-wave IR band. This article furthermore shows that the design principle allows achieving a wide range of dual-band reflectivity values using a single underlying materials stack, offering a versatile platform. The proposed approach is compatible with CMOS-compatible mass-production manufacturing and brings IR metasurface coatings closer to commercially relevant and scalable technology

Wafer-Scale 200 mm Metal Oxide Infrared Metasurface with Tailored Differential Emissivity Response in the Atmospheric Windows

Metasurfaces with sub-wavelength nanoscale features have emerged as a platform to achieve desirable electromagnetic responses. However, it remains technically challenging to fabricate metasurfaces in large size and at low cost for mass production. This work demonstrates a 200 mm wafer-scale Al:ZnO metasurface coating based on deep-UV lithography. The metasurfaces are targeted to achieve infrared (IR) reflectivity and emissivity characteristics at bandwidths across the two atmospheric windows in the IR spectrum. The wafers demonstrate a high uniformity of optical response with tailored reflectivity of around 50% at the 3–5 µm mid-wave IR band and less than 10% at the 8–13 µm long-wave IR band. This article furthermore shows that the design principle allows achieving a wide range of dual-band reflectivity values using a single underlying materials stack, offering a versatile platform. The proposed approach is compatible with CMOS-compatible mass-production manufacturing and brings IR metasurface coatings closer to commercially relevant and scalable technology.</p

Dataset for: Wafer-scale 200 mm Metal Oxide Infrared Metasurface with Tailored Differential Emissivity Response in the Atmospheric Windows

Dataset for K. Sun et al., Wafer-scale 200 mm Metal Oxide Infrared Metasurface with Tailored Differential Emissivity Response in the Atmospheric Windows Advanced Optical Materials 2022, DOI: 10.1002/adom.202200452 </span