17 research outputs found

    Valley filtering and spatial maps of coupling between silicon donors and quantum dots

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    Exchange coupling is a key ingredient for spin-based quantum technologies since it can be used to entangle spin qubits and create logical spin qubits. However, the influence of the electronic valley degree of freedom in silicon on exchange interactions is presently the subject of important open questions. Here we investigate the influence of valleys on exchange in a coupled donor/quantum dot system, a basic building block of recently proposed schemes for robust quantum information processing. Using a scanning tunneling microscope tip to position the quantum dot with sub-nm precision, we find a near monotonic exchange characteristic where lattice-aperiodic modulations associated with valley degrees of freedom comprise less than 2~\% of exchange. From this we conclude that intravalley tunneling processes that preserve the donor's ±x\pm x and ±y\pm y valley index are filtered out of the interaction with the ±z\pm z valley quantum dot, and that the ±x\pm x and ±y\pm y intervalley processes where the electron valley index changes are weak. Complemented by tight-binding calculations of exchange versus donor depth, the demonstrated electrostatic tunability of donor/QD exchange can be used to compensate the remaining intravalley ±z\pm z oscillations to realise uniform interactions in an array of highly coherent donor spins.Comment: 6 pages, 4 figures, 6 pages Supplemental Materia

    2013 Koiter Medal Paper: Crack-Tip Fields and Toughness of Two-Dimensional Elastoplastic Lattices

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    The dependence of the fracture toughness of two-dimensional (2D) elastoplastic lattices upon relative density and ductility of cell wall material is obtained for four topologies: the triangular lattice, kagome lattice, diamond lattice, and the hexagonal lattice. Crack-tip fields are explored, including the plastic zone size and crack opening displacement. The cell walls are treated as beams, with a material response given by the Ramberg-Osgood law. There is choice in the criterion for crack advance, and two extremes are considered: (i) the maximum local tensile strain (LTS) anywhere in the lattice attains the failure strain or (ii) the average tensile strain (ATS) across the cell wall attains the failure strain (which can be identified with the necking strain). The dependence of macroscopic fracture toughness upon failure strain, strain hardening exponent, and relative density is obtained for each lattice, and scaling laws are derived. The role of imperfections in degrading the fracture toughness is assessed by random movement of the nodes. The paper provides a strategy for obtaining lattices of high toughness at low density, thereby filling gaps in material property space

    Crack kinking at the tip of a mode I crack in an orthotropic solid

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    The competition between crack penetration and crack kinking is addressed for a mode I macroscopic crack in an orthotropic elastic solid. Cohesive zones of finite peak strength and finite toughness are placed directly ahead of and orthogonal to the plane of the parent crack. The cohesive zone ahead of the crack tip is tensile in nature and leads to crack penetration, whereas the inclined zones slide without opening under a combined shear and normal traction, and give crack kinking. Thereby, the competition between continued crack growth by penetration ahead of the crack tip versus kinking is determined as a function of the relative strength and relative toughness of the cohesive zones. This competition is plotted in the form of a failure mechanism map, with the role of material orthotropy emphasized. Synergistic toughening is observed, whereby the parent crack tip is shielded by the activation of both the tensile and shear (kinking) cohesive zones, and the macroscopic toughness is elevated. The study is used to assess the degree to which various classes of composite have the tendency to undergo kinking

    Valley interference and spin exchange at the atomic scale in silicon

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    Tunneling is a fundamental quantum process with no classical equivalent, which can compete with Coulomb interactions to give rise to complex phenomena. Phosphorus dopants in silicon can be placed with atomic precision to address the different regimes arising from this competition. However, they exploit wavefunctions relying on crystal band symmetries, which tunneling interactions are inherently sensitive to. Here we directly image lattice-aperiodic valley interference between coupled atoms in silicon using scanning tunneling microscopy. Our atomistic analysis unveils the role of envelope anisotropy, valley interference and dopant placement on the Heisenberg spin exchange interaction. We find that the exchange can become immune to valley interference by engineering in-plane dopant placement along specific crystallographic directions. A vacuum-like behaviour is recovered, where the exchange is maximised to the overlap between the donor orbitals, and pair-to-pair variations limited to a factor of less than 10 considering the accuracy in dopant positioning. This robustness remains over a large range of distances, from the strongly Coulomb interacting regime relevant for high-fidelity quantum computation to strongly coupled donor arrays of interest for quantum simulation in silicon

    Spatial metrology of dopants in silicon with exact lattice site precision

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    Scaling of Si-based nanoelectronics has reached the regime where device function is affected not only by the presence of individual dopants, but also by their positions in the crystal. Determination of the precise dopant location is an unsolved problem in applications from channel doping in ultrascaled transistors to quantum information processing. Here, we establish a metrology combining low-temperature scanning tunnelling microscopy (STM) imaging and a comprehensive quantum treatment of the dopant-STM system to pinpoint the exact coordinates of the dopant in the Si crystal. The technique is underpinned by the observation that STM images contain atomic-sized features in ordered patterns that are highly sensitive to the STM tip orbital and the absolute dopant lattice site. The demonstrated ability to determine the locations of P and As dopants to 5 nm depths will provide critical information for the design and optimization of nanoscale devices for classical and quantum computing applications

    Two-electron states of a group-V donor in silicon from atomistic full configuration interactions

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    Two-electron states bound to donors in silicon are important for both two-qubit gates and spin readout. We present a full configuration interaction technique in the atomistic tight-binding basis to capture multielectron exchange and correlation effects taking into account the full band structure of silicon and the atomic-scale granularity of a nanoscale device. Excited s-like states of A1 symmetry are found to strongly influence the charging energy of a negative donor center. We apply the technique on subsurface dopants subjected to gate electric fields and show that bound triplet states appear in the spectrum as a result of decreased charging energy. The exchange energy, obtained for the two-electron states in various confinement regimes, may enable engineering electrical control of spins in donor-dot hybrid qubits
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