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    ์™„์ถฉ์ธต ๋‚ด GaN nano-island๋ฅผ ์ด์šฉํ•œ GaN ์—ํ”ผ์ธต์˜ ๊ฒฐ์ •ํ’ˆ์งˆ ํ–ฅ์ƒ

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    ํ•™์œ„๋…ผ๋ฌธ (์„์‚ฌ)-- ์„œ์šธ๋Œ€ํ•™๊ต ๋Œ€ํ•™์› : ์žฌ๋ฃŒ๊ณตํ•™๋ถ€(ํ•˜์ด๋ธŒ๋ฆฌ๋“œ ์žฌ๋ฃŒ), 2012. 8. ์œค์˜์ค€.์ตœ๊ทผ, GaN ์€ ๊ด‘์ „์ž ์žฌ๋ฃŒ๋กœ์„œ ๋งค์šฐ ์šฐ์ˆ˜ํ•œ ๋ฌผ์งˆ๋กœ์„œ, ๊ทธ ๊ฒฐ์ •์งˆ์˜ ํ’ˆ์งˆ์„ ๋†’์ด๊ณ ์ž ๋งŽ์€ ์—ฐ๊ตฌ๊ฐ€ ๋˜์–ด ์™”๋‹ค. ์—ฌ๊ธฐ์„œ ์„ฑ์žฅ ์ดˆ๊ธฐ ๋‹จ๊ณ„์—์„œ 3D ์„ฑ์žฅ์„ ํ•˜์—ฌ ๊ฒฐ์ • ๊ฒฐํ•จ์„ ์ค„์ด๋Š” ์—ฐ๊ตฌ๋“ค์ด ์—ฐ๊ตฌ๋˜์–ด ์™”๋‹ค[1,2].Gibart ๋“ฑ์˜ ์—ฐ๊ตฌ๊ฒฐ๊ณผ์— ๋”ฐ๋ฅด๋ฉด, ์‚ฌ์ผ๋ Œ๊ณผ ์•”๋ชจ๋‹ˆ์•„๋ฅผ ํ†ตํ•˜์—ฌ SiNx ๋งˆ์Šคํ‚น์ด๋‚˜ ์‚ฌํŒŒ์ด์–ด ๊ธฐํŒ์— Si/N ์ฒ˜๋ฆฌ๋ฅผ ํ–‰ํ•˜๋Š” ๊ฒƒ์ด nucleation site ์˜ ์ˆซ์ž๋ฅผ ์ค„์—ฌ island ์˜ ํฌ๊ธฐ๋ฅผ ํ‚ค์›Œ, ๊ฒฐ๊ณผ์ ์œผ๋กœ ๊ด€ํ†ต ์ „์œ„์˜ ์ˆ˜๋ฅผ ์ค„์ด๋Š” ๊ฒƒ์„ ํ™•์ธ ํ•  ์ˆ˜ ์žˆ์—ˆ๋‹ค. ๊ทธ ์™ธ์—๋„ ์ˆ˜๋งŽ์€ ๊ทธ๋ฃน์ด ์‚ฌ์ผ๋ Œ๊ณผ ์•”๋ชจ๋‹ˆ์•„๋ฅผ ์‚ฌํŒŒ์ด์–ด ๊ธฐํŒ์— ์ฒ˜๋ฆฌํ•˜์—ฌ grain ํฌ๊ธฐ๋ฅผ ํ‚ค์›Œ ๊ด€ํ†ต์ „์œ„๋ฅผ ํ‚ค์šฐ๋Š” ์—ฐ๊ตฌ์— ์„ฑ๊ณตํ•˜์˜€๋‹ค.[3,4,5] ๊ทธ๋Ÿฌํ•œ GaN ์˜ ํ’ˆ์งˆ์„ ํ–ฅ์ƒ์‹œํ‚ค๋Š” ๋ฐฉ๋ฒ•์€ ๊ธฐํŒ์— nano-island๋ฅผ ํ˜•์„ฑํ•˜๋Š” ๊ฒƒ ์ด๋‹ค. ์šฐ๋ฆฌ๋Š” GaN film์„ ๊ณ ์˜จ์—์„œ etching ํ•˜์—ฌ GaN nano-island๋ฅผ ์„ฑ์žฅ์‹œ์ผฐ๋‹ค. ๊ทธ๋ฆฌ๊ณ  ์ด nano-island๋ฅผ ๋ฒ„ํผ์ธต์— ์ ์šฉํ•˜์—ฌ ์ „์œ„๊ฐ€ GaN ์„ฑ์žฅ๋ฐฉํ–ฅ์œผ๋กœ ์ „ํŒŒํ•˜์—ฌ ๋‚˜๊ฐ€๋Š” ๊ฒƒ์„ ๋ง‰์•˜๋‹ค. ๊ทธ๋ฆฌ๊ณ  ์„ฑ์žฅ์‹œํ‚จ GaN ๊ฒฐ์ •์„ x-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM) ๊ทธ๋ฆฌ๊ณ  high resolution transmission electron microscopy (HR-TEM) ๋ฐฉ๋ฒ•์œผ๋กœ ์ธก์ •ํ•˜์˜€๋‹ค. ๊ทธ ๊ฒฐ๊ณผ, ์šฐ๋ฆฌ๋Š” epi layer ์˜ crystal quality ์™€ physical properties ๊ฐ€ ๊ฐœ์„ ๋œ ๊ฒƒ์„ ํ™•์ธ ํ•  ์ˆ˜ ์žˆ์—ˆ๋‹ค. ๋น„๋ก crystal quality ๊ฐ€ ํ–ฅ์ƒ๋˜๋Š” ์ด์œ ๋Š” ์•Œ์•„๋‚ด์ง€ ๋ชปํ•˜์˜€์ง€๋งŒ, ์ด ์—ฐ๊ตฌ ๊ฒฐ๊ณผ๊ฐ€ GaN ์„ฑ์žฅ์ด๋‚˜ MOCVD๋ฅผ ํ†ตํ•œ ๋‹ค๋ฅธ ์›์†Œ์˜ ์„ฑ์žฅ์—๋„ ๋„์›€์ด ๋  ๊ฒƒ์ด๋‹ค.Due to the potentialities of GaN and related alloys for the optoelectronic devies emitting in the green-ultra-violet range important efforts have been made to improve the crystal quality. The use of a three dimensional (3D) mode at the first stage of GaN growth has been reported a major role in the reduction of defect density [1,2]. One solution to improve the crystal quality of GaN is GaN nano-island formation on substrate. It is well known that GaN nano-island reduces dislocation density in GaN epitaxial layer. As proposed by Gibart and co-workers, in situ SiNx masking or Si/N treatment of sapphire substrate with silane and ammonia reduces the density of nucleation sites prior to GaN epitaxial layer growth, and hence increases the average grain size leading to films with TD densities below 10-10 cm-2. Several research groups reported exposure of the sapphire substrate, prior to the deposition of a GaN nucleation layer, under silane and ammonia flows. [3,4,5] Another method to similarly reduce the TD density is by intentionally delaying the coalescence of individual GaN islands by starting the growth of the epilayer proper at a reduced V/III ratio. So, we proposed GaN nano-island formation technique in buffer layer, which prevents propagation of dislocation at very early stage of the growth. We formed GaN nano-islands in buffer layer intentionally by thermal etching, then grew GaN epitaxial layer on nano-islands. The crystal quality and morphologies of the GaN were examined using x-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM) and high resolution transmission electron microscopy (HR-TEM). We confirmed that crystal quality and physical properties of GaN layer was improved. Despite the fact that the mechanism for crystal quality improvement is not well understood, we believe this method could prove useful to the MOCVD growth in variety of ways. However, further studies are necessary to confirm the exact reason of crystal quality improvement.Abstract.โ€ฆโ€ฆโ€ฆโ€ฆโ€ฆ I Contents....................... III List of figures............................................................ VI Chapter 1 Introduction 1 1.1 Introduction 1 1.2 Growth techniques of GaN 7 1.2.1 General methods 7 1.2.2 GaN nano-island in buffer layer by Si/N treatment 8 1.3 GaN epitaxial layer using nano-island in buffer layer 9 Chapter 2 Experiments and analysis 14 2.1 Growth equipment 14 2.1.1 MOCVD system 14 2.2 Analysis tools 16 2.2.1 Scanning electron microscopy (SEM) 16 2.2.2 Transmission electron microscopy (TEM) 16 2.2.3 X-ray diffractometry (XRD) 16 2.2.4 Atomic force microscopy (AFM) 17 2.3 Experimental details 17 2.3.1 Sample preparation 17 2.3.2 Growth procedure 17 Chapter 3 Results and disccusion 20 3.1 Nano-island in buffer layer (NB) GaN 20 3.1.1 Growth of NB GaN 20 3.1.2 GaN nano-islands 21 3.2 Characteristics of NB GaN 26 3.2.1 Physical properties of NB GaN 26 3.2.2 Dislocations of NB GaN 27 Chapter 4 Conclusions 33 References 34 Abstract 36Maste

    ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์„ ์ค‘์‹ฌ์œผ๋กœ

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    ํ•™์œ„๋…ผ๋ฌธ (์„์‚ฌ)-- ์„œ์šธ๋Œ€ํ•™๊ต ๋Œ€ํ•™์› : ์‚ฌ๋ฒ”๋Œ€ํ•™ ๊ตญ์–ด๊ต์œก๊ณผ(ํ•œ๊ตญ์–ด๊ต์œก์ „๊ณต), 2019. 2. ๋ฏผ๋ณ‘๊ณค.The purpose of this study is to analyze how Chinese advanced learners use problem solving strategies in their Korean writing process. As writing requires a sophisticated thinking ability, it is a quite difficult function even for a native speaker. Moreover, Korean language learners have to deal with language problems and the problems about Korean communicative community. Therefore, for Korean language learners writing is more difficult. However, if we consider the writing process as a problem-solving process which is proposed by Linda Flower, there is a better way to write and writers will be able to expand the list of their writing strategies. First, I reviewed the related research in chapter II in order to establish a framework for analyzing the way in which Chinese advanced learners use problem solving strategies in their Korean writing process. The concept of the problem is defined by summarizing the concept of problem in the previous research. Then, I classify the types of problems according to the stages of Korean writing process. This means, the difficulties Chinese advanced learners encounterd when they are performing Korean writing tasks. According to the types of problems that are summarized in Chapter โ…ข, I found that excellent Chinese learners and poor Chinese learners use different problem solving strategies in the writing process. Especially at the stage of the content creation stage, it exists validity of evidence problem and credibility of evidence problem for Chinese advanced learners. About credibility of evidence problem, excellent Chinese learners use evaluating the form of information strategie and evaluating authors expertise whereas poor Chinese learners use cite information of internet cafe strategie and cite stories heard strategie. About validity of evidence problem, excellent Chinese learners use evaluating content on the internet strategie whereas poor Chinese learners use writing content on the webpage strategie and use self-experienced material strategie. Based on the results of the mentioned analysis above, I suggested the educational content of Chinese advanced learners problem solving strategy. I designed the lesson for five times, analyzing the tasks, creating the contents, organizing the contents, expressing and reviewing them according to the stages of the Korean writing process. The implications of this study are summarized as follows. First, as I have used the computer screen recording software, I collected and analyzed data of the whole Korean writing process which is produced by advanced Chinese learners. In addition, the analysis of problem solving strategies using by excellent learners and poor learners shows how differently they use problem solving strategies. So that It is possible to learn more effectively if an poor learner is taught with the educational contents based on the problem solving strategy used by excellent learner.๋ณธ ์—ฐ๊ตฌ๋Š” ์ค‘๊ตญ์ธ ๊ณ ๊ธ‰ ํ•™์Šต์ž๊ฐ€ ํ•œ๊ตญ์–ด ๋…ผ์„ค๋ฌธ ๊ธ€์“ฐ๊ธฐ ๊ณผ์ •์—์„œ ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์„ ์‚ฌ์šฉํ•˜๋Š” ์–‘์ƒ์„ ๋ถ„์„ํ•˜์—ฌ ๊ต์œก ๋ฐฉ์•ˆ์„ ์ œ์‹œํ•˜๋Š” ๋ฐ์— ๋ชฉ์ ์„ ๋‘๊ณ  ์žˆ๋‹ค. ์“ฐ๊ธฐ๋Š” ๊ณ ๋„์˜ ์‚ฌ๊ณ  ๋Šฅ๋ ฅ์„ ์š”๊ตฌํ•˜๋ฏ€๋กœ ๋ชจ์–ด ํ™”์ž์กฐ์ฐจ ์–ด๋ ค์›Œํ•˜๋Š” ๊ธฐ๋Šฅ์ด๋‹ค. ๋”๊ตฌ๋‚˜ ํ•œ๊ตญ์–ด ํ•™์Šต์ž์—๊ฒŒ๋Š” ์–ธ์–ด ๋ฌธ์ œ์™€ ํ•œ๊ตญ์ธ ๋‹ดํ™”๊ณต๋™์ฒด์˜ ๊ด€์Šต์— ๊ด€ํ•œ ๋ฌธ์ œ๊ฐ€ ์žˆ์–ด์„œ ํ•œ๊ตญ์–ด ๊ธ€์“ฐ๊ธฐ๋ฅผ ๋”์šฑ๋” ์–ด๋ ต๊ฒŒ ๋Š๋‚„ ์ˆ˜๋ฐ–์— ์—†๋‹ค. ๊ทธ๋Ÿฌ๋‚˜ ๊ธ€์“ฐ๊ธฐ ๊ณผ์ •์„ ๋ฌธ์ œ ํ•ด๊ฒฐ ๊ณผ์ •์œผ๋กœ ๋ณธ๋‹ค๋ฉด, ํ•„์ž๊ฐ€ ์ž์‹ ์˜ ๊ธ€์“ฐ๊ธฐ ์ „๋žต์˜ ๋ชฉ๋ก์„ ํ™•์žฅ์‹œํ‚ค๋ฉด ๊ธ€์„ ์“ธ ๋•Œ ๋‹น๋ฉดํ•˜๋Š” ์–ด๋ ค์›€์„ ํ•ด๊ฒฐํ•˜๋Š” ๋ฐ ๋„์›€์ด ๋  ๊ฒƒ์ด๋‹ค. ๋”ฐ๋ผ์„œ ๋ณธ๊ณ ๋Š” ํ•œ๊ตญ์–ด ๊ธ€์“ฐ๊ธฐ ๊ณผ์ •์—์„œ ๋Šฅ์ˆ™ํ•œ ํ•™์Šต์ž์™€ ๋ฏธ์ˆ™ํ•œ ํ•™์Šต์ž๊ฐ€ ๊ฐ๊ฐ ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์„ ์‚ฌ์šฉํ•˜๋Š” ์–‘์ƒ์„ ๋น„๊ตโ‹…๋ถ„์„ํ•˜๊ณ  ๋” ํšจ์œจ์ ์ธ ์ „๋žต์„ ์ถ”์ถœํ•˜์—ฌ ๊ต์œก ๋‚ด์šฉ์œผ๋กœ ์ œ์‹œํ•˜๊ณ ์ž ํ•œ๋‹ค. ์šฐ์„  ์ค‘๊ตญ์ธ ๊ณ ๊ธ‰ ํ•™์Šต์ž๊ฐ€ ํ•œ๊ตญ์–ด ๊ธ€์“ฐ๊ธฐ ๊ณผ์ •์—์„œ ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์„ ์‚ฌ์šฉํ•˜๋Š” ์–‘์ƒ์„ ๋ถ„์„ํ•˜๊ธฐ ์œ„ํ•œ ํ‹€์„ ๋งˆ๋ จํ•˜๊ธฐ ์œ„ํ•˜์—ฌ โ…ก์žฅ์—์„œ ๊ด€๋ จ๋œ ์„ ํ–‰ ์—ฐ๊ตฌ๋ฅผ ๊ณ ์ฐฐํ•˜์˜€๋‹ค. ์„ ํ–‰ ์—ฐ๊ตฌ์—์„œ ๋‚˜ํƒ€๋‚œ ๊ธ€์“ฐ๊ธฐ ๋ฌธ์ œ์˜ ๊ฐœ๋…์„ ์ •๋ฆฌํ•œ ํ›„์— ๋ฌธ์ œ์˜ ๊ฐœ๋…์„ ๋‹ค์‹œ ์ •์˜ํ•˜์˜€๋‹ค. ์ด์–ด์„œ ์ค‘๊ตญ์ธ ๊ณ ๊ธ‰ ํ•™์Šต์ž๊ฐ€ ํ•œ๊ตญ์–ด ๊ธ€์“ฐ๊ธฐ ๊ณผ์ œ๋ฅผ ์ˆ˜ํ–‰ํ•˜๋Š” ๊ณผ์ •์—์„œ ๋ถ€๋”ชํžˆ๋Š” ์–ด๋ ค์›€์— ๊ด€ํ•˜์—ฌ ๊ธ€์“ฐ๊ธฐ ๊ณผ์ •์˜ ๋‹จ๊ณ„์— ๋”ฐ๋ผ ๋ฌธ์ œ์˜ ์œ ํ˜•์„ ๋ถ„๋ฅ˜ํ•˜์˜€๋‹ค. โ…ข์žฅ์—์„œ๋Š” ์ •๋ฆฌํ•œ ๋ฌธ์ œ์˜ ์œ ํ˜•์— ๋”ฐ๋ผ ๋Šฅ์ˆ™ํ•œ ์ค‘๊ตญ์ธ ๊ณ ๊ธ‰ ํ•™์Šต์ž์™€ ๋ฏธ์ˆ™ํ•œ ์ค‘๊ตญ์ธ ๊ณ ๊ธ‰ ํ•™์Šต์ž๊ฐ€ ํ•œ๊ตญ์–ด ๋…ผ์„ค๋ฌธ ๊ธ€์“ฐ๊ธฐ ๊ณผ์ •์—์„œ ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์„ ์‚ฌ์šฉํ•˜๋Š” ์–‘์ƒ์„ ๋น„๊ตโ‹…๋ถ„์„ํ•˜์˜€๋‹ค. ๋‚˜์•„๊ฐ€ ์ค‘๊ตญ์ธ ๊ณ ๊ธ‰ ํ•™์Šต์ž๊ฐ€ ํ•œ๊ตญ์–ด ๋…ผ์„ค๋ฌธ ๊ธ€์“ฐ๊ธฐ ๊ณผ์ œ๋ฅผ ์ˆ˜ํ–‰ํ•˜๋Š” ๊ณผ์ •์—์„œ ๋ถ€๋”ชํžˆ๋Š” ์–ด๋ ค์›€์„ ํ•ด๊ฒฐํ•˜๊ธฐ ์œ„ํ•˜์—ฌ ์‚ฌ์šฉํ•˜๋Š” ์ „๋žต์„ ๊ธ€์“ฐ๊ธฐ ๋‹จ๊ณ„์— ๋”ฐ๋ผ ๊ท€๋‚ฉ์ ์œผ๋กœ ๋„์ถœํ•˜์˜€๋‹ค. ๊ฐ ๋‹จ๊ณ„๋งˆ๋‹ค ๋Šฅ์ˆ™ํ•œ ํ•™์Šต์ž์™€ ๋ฏธ์ˆ™ํ•œ ํ•™์Šต์ž๊ฐ€ ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์„ ์‚ฌ์šฉํ•˜๋Š” ๋ฐ์— ์ฐจ์ด๊ฐ€ ๋งŽ์ด ๋‚ฌ๋‹ค. ํŠนํžˆ ๋‚ด์šฉ ์ƒ์„ฑํ•˜๊ธฐ ๋‹จ๊ณ„์—์„œ ๋Šฅ์ˆ™ํ•œ ํ•™์Šต์ž๋Š” ์ •๋ณด์˜ ํ˜•ํƒœ ํ‰๊ฐ€ํ•˜๊ธฐ ์ „๋žต, ์›นํŽ˜์ด์ง€ ๊ธ€์“ด์ด์˜ ์ „๋ฌธ์„ฑ ํ‰๊ฐ€ํ•˜๊ธฐ ์ „๋žต ๊ทธ๋ฆฌ๊ณ  ์›นํŽ˜์ด์ง€ ๋‚ด์šฉ ํ‰๊ฐ€ํ•˜๊ธฐ ์ „๋žต์„ ์‚ฌ์šฉํ•˜๋Š” ๊ฒƒ์— ๋น„ํ•˜์—ฌ ๋ฏธ์ˆ™ํ•œ ํ•™์Šต์ž๋Š” ๋œ ํšจ์œจ์ ์ธ ์ธํ„ฐ๋„ท ์นดํŽ˜์˜ ์ •๋ณด ์ธ์šฉํ•˜๊ธฐ ์ „๋žต, ์†Œ๋ฌธ์œผ๋กœ ๋“ค์—ˆ๋˜ ์ด์•ผ๊ธฐ ์ธ์šฉํ•˜๊ธฐ ์ „๋žต, ์›นํŽ˜์ด์ง€ ๋‚ด์šฉ ๋ง‰ ์“ฐ๊ธฐ ์ „๋žต ๊ทธ๋ฆฌ๊ณ  ์ž๊ธฐ ๊ฒฝํ—˜ ์†Œ์žฌ๋กœ ํ™œ์šฉํ•˜๊ธฐ ์ „๋žต์„ ์‚ฌ์šฉํ•œ๋‹ค. ๋˜ํ•œ ๋ณธ๊ณ ๋Š” โ…ข์žฅ 3์ ˆ์—์„œ ๋ฏธ์ˆ™ํ•œ ํ•™์Šต์ž๊ฐ€ ํšจ์œจ์ด ๋‚ฎ์€ ์ „๋žต์„ ์‚ฌ์šฉํ•˜๋Š” ์›์ธ์„ ์ถ”์ถœํ•˜์˜€๋‹ค. ์ฃผ์š” ์›์ธ์œผ๋กœ๋Š” ์ค‘๊ตญ์–ด ๊ธ€์“ฐ๊ธฐ ๋ฐฉ์‹์˜ ์˜ํ–ฅ ์›์ธ, ๋ฌธํ™”์  ์˜ํ–ฅ ์›์ธ, ๊ต์œก์˜ ๋ถ€์žฌ ์›์ธ์ด ์žˆ์—ˆ๋‹ค. โ…ฃ์žฅ์—์„œ ์•ž์— ์–ธ๊ธ‰ํ•œ ๋ถ„์„ ๊ฒฐ๊ณผ๋ฅผ ๊ธฐ์ดˆ๋กœ ํ•˜์—ฌ ์ค‘๊ตญ์ธ ๊ณ ๊ธ‰ ํ•™์Šต์ž๋ฅผ ์œ„ํ•œ ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์˜ ๊ต์œก ๋ฐฉ์•ˆ์„ ์ œ์‹œํ•˜์˜€๋‹ค. ํ•œ๊ตญ์–ด ๊ธ€์“ฐ๊ธฐ ๊ณผ์ •์˜ ๋‹จ๊ณ„์— ๋”ฐ๋ผ ๊ณผ์ œ ๋ถ„์„ํ•˜๊ธฐ, ๋‚ด์šฉ ์ƒ์„ฑํ•˜๊ธฐ, ๋‚ด์šฉ ์กฐ์งํ•˜๊ธฐ, ํ‘œํ˜„ํ•˜๊ธฐ ๊ทธ๋ฆฌ๊ณ  ๊ฒ€ํ† ํ•˜๊ธฐ์™€ ๊ฐ™์ด ๋‹ค์„ฏ ์ฐจ๋ก€์— ๊ฑธ์ณ์„œ ์ˆ˜์—…์„ ์„ค๊ณ„ํ•˜์˜€๋‹ค. ๋ณธ๊ณ ๊ฐ€ ์ง€๋‹ˆ๋Š” ์˜์˜๋Š” ๋‹ค์Œ๊ณผ ๊ฐ™๋‹ค. ์šฐ์„ , ํ•™์Šต์ž์˜ ๊ธ€์“ฐ๊ธฐ ๊ฒฐ๊ณผ๋ฌผ ๋ฟ๋งŒ์„ ๋ถ„์„ํ•œ ๊ฒƒ์ด ์•„๋‹ˆ๋ผ ์ปดํ“จํ„ฐ ์Šคํฌ๋ฆฐ ๋…นํ™” ์†Œํ”„ํŠธ์›จ์–ด๋ฅผ ํ™œ์šฉํ•˜์—ฌ ์ค‘๊ตญ์ธ ๊ณ ๊ธ‰ ํ•™์Šต์ž์˜ ํ•œ๊ตญ์–ด ๊ธ€์“ฐ๊ธฐ์˜ ์ „(ๅ…จ) ๊ณผ์ •์— ๊ด€ํ•œ ์ž๋ฃŒ๋ฅผ ์ˆ˜์ง‘ํ•˜๊ณ  ๋ถ„์„ํ•˜์—ฌ ํ•™์Šต์ž์˜ ๊ธ€์“ฐ๊ธฐ ๊ณผ์ • ์ค‘์˜ ๋ฌธ์ œ๋ฅผ ํ•ด๊ฒฐํ•˜๋Š” ์ „๋žต์„ ๊ท€๋‚ฉ์ ์œผ๋กœ ์ถ”์ถœํ•˜์˜€๋‹ค. ๋˜ํ•œ, ๋ฏธ์ˆ™ํ•œ ํ•™์Šต์ž๊ฐ€ ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์„ ์‚ฌ์šฉํ•˜๋Š” ์–‘์ƒ๊ณผ ๋Šฅ์ˆ™ํ•œ ํ•™์Šต์ž๊ฐ€ ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์„ ์‚ฌ์šฉํ•˜๋Š” ์–‘์ƒ์„ ์„œ๋กœ ๋น„๊ตํ•˜๋ฉด์„œ ๋ถ„์„ํ•˜์˜€๋‹ค. ๋Šฅ์ˆ™ํ•œ ํ•™์Šต์ž๊ฐ€ ์‚ฌ์šฉํ•˜๋Š” ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์„ ๋ฐ”ํƒ•์œผ๋กœ ๊ต์œก ๋‚ด์šฉ์„ ์„ค๊ณ„ํ•˜์—ฌ ๋ฏธ์ˆ™ํ•œ ํ•™์Šต์ž์—๊ฒŒ ๊ฐ€๋ฅด์น˜๋ฉด ๋ฏธ์ˆ™ํ•œ ํ•™์Šต์ž๋Š” ๋ณด๋‹ค ํšจ๊ณผ์ ์œผ๋กœ ์Šต๋“ํ•  ์ˆ˜ ์žˆ์„ ๊ฒƒ์ด๋‹ค.โ… . ์„œ๋ก  1 1. ์—ฐ๊ตฌ์˜ ํ•„์š”์„ฑ ๋ฐ ๋ชฉ์  1 2. ์„ ํ–‰ ์—ฐ๊ตฌ 3 1) ํ•œ๊ตญ์–ด๊ต์œก์—์„œ์˜ ์“ฐ๊ธฐ ์—ฐ๊ตฌ 3 2) ์“ฐ๊ธฐ ๊ณผ์ •์— ๊ด€ํ•œ ์—ฐ๊ตฌ 5 3. ์—ฐ๊ตฌ ๋ฐฉ๋ฒ• 8 1) ์“ฐ๊ธฐ ๊ณผ์ •์˜ ์‚ฌ๋ก€์ ์ธ ์ ‘๊ทผ 8 2) ํ‘œ์ง‘ ๋ฐฉ๋ฒ• ๋ฐ ์—ฐ๊ตฌ ์ฐธ์—ฌ์ž ์ •๋ณด 8 3) ์ž๋ฃŒ ์ˆ˜์ง‘ ๋ฐฉ๋ฒ• 11 โ…ก. ์ด๋ก ์  ๋ฐฐ๊ฒฝ 15 1. ์“ฐ๊ธฐ ์ด๋ก  ํŒจ๋Ÿฌ๋‹ค์ž„์˜ ๋ณ€์ฒœ 15 1) ํ˜•์‹์ฃผ์˜ ์“ฐ๊ธฐ ์ด๋ก  15 2) ์ธ์ง€์ฃผ์˜ ์“ฐ๊ธฐ ์ด๋ก  16 3) ์‚ฌํšŒ๊ตฌ์„ฑ์ฃผ์˜ ์“ฐ๊ธฐ ์ด๋ก  19 2. ์ œ2 ์–ธ์–ด ๊ธ€์“ฐ๊ธฐ ๊ต์ˆ˜ ํ•™์Šต ์ด๋ก  21 3. ๋ฌธ์ œ ํ•ด๊ฒฐ ๊ธ€์“ฐ๊ธฐ์—์„œ์˜ ๋ฌธ์ œ์™€ ์ „๋žต 28 1) ๋ฌธ์ œ ํ•ด๊ฒฐ ๊ธ€์“ฐ๊ธฐ์—์„œ ๋ฌธ์ œ์˜ ๊ฐœ๋… ๋ฐ ์œ ํ˜• 28 2) ๋ฌธ์ œ ํ•ด๊ฒฐ ๊ธ€์“ฐ๊ธฐ์—์„œ ์ „๋žต์˜ ๊ฐœ๋… ๋ฐ ์œ ํ˜• 43 โ…ข. ์ค‘๊ตญ์ธ ๊ณ ๊ธ‰ ํ•™์Šต์ž์˜ ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต ๋ถ„์„ 60 1. ์‚ฌ๋ก€ ์—ฐ๊ตฌ ์„ค๊ณ„ 60 1) ๊ณผ์ œ ์ƒํ™ฉ ์„ค์ • 60 2) ๊ณผ์ œ ์„ ์ • ๊ธฐ์ค€ 61 3) ์ž๋ฃŒ ๋ถ„์„ ๋ฐฉ๋ฒ• 62 2. ์“ฐ๊ธฐ ๊ณผ์ œ๋ฅผ ์ˆ˜ํ–‰ํ•˜๋Š” ๊ณผ์ •์—์„œ ๋ถ€๋”ชํžˆ๋Š” ์–ด๋ ค์›€ 65 1) ๊ณผ์ œ ๋ถ„์„ํ•˜๊ธฐ ๋‹จ๊ณ„ 65 2) ๋‚ด์šฉ ์ƒ์„ฑํ•˜๊ธฐ ๋‹จ๊ณ„ 69 3) ๋‚ด์šฉ ์กฐ์งํ•˜๊ธฐ ๋‹จ๊ณ„ 80 4) ํ‘œํ˜„ํ•˜๊ธฐ ๋‹จ๊ณ„ 88 5) ๊ฒ€ํ† ํ•˜๊ธฐ ๋‹จ๊ณ„ 101 3. ํšจ์œจ์ด ๋‚ฎ์€ ์ „๋žต์„ ์‚ฌ์šฉํ•˜๋Š” ์›์ธ 106 1) ์ค‘๊ตญ์–ด ๊ธ€์“ฐ๊ธฐ ๋ฐฉ์‹์˜ ์˜ํ–ฅ 106 2) ๋ฌธํ™”์  ์˜ํ–ฅ 110 3) ๊ต์œก์˜ ๋ถ€์žฌ 112 4) ๊ธฐํƒ€ ์›์ธ 113 โ…ฃ. ์ค‘๊ตญ์ธ ๊ณ ๊ธ‰ ํ•™์Šต์ž๋ฅผ ์œ„ํ•œ ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต ๊ต์œก์˜ ์‹ค์ œ 115 1. ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์˜ ๊ต์œก ๋ชฉํ‘œ 115 2. ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์˜ ๊ต์œก ๋‚ด์šฉ 119 1) ๊ณผ์ œ ๋ถ„์„ํ•˜๊ธฐ ๋‹จ๊ณ„ 119 2) ๋‚ด์šฉ ์ƒ์„ฑํ•˜๊ธฐ ๋‹จ๊ณ„ 120 3) ๋‚ด์šฉ ์กฐ์งํ•˜๊ธฐ ๋‹จ๊ณ„ 121 4) ํ‘œํ˜„ํ•˜๊ธฐ ๋‹จ๊ณ„ 123 5) ๊ฒ€ํ† ํ•˜๊ธฐ ๋‹จ๊ณ„ 125 3. ๋ฌธ์ œ ํ•ด๊ฒฐ ์ „๋žต์˜ ๊ต์œก ๋ฐฉ๋ฒ• 126 1) ๊ต์ˆ˜ ํ•™์Šต ๋ฐฉ๋ฒ• 126 2) ์ˆ˜์—… ์„ค๊ณ„ 129 โ…ค. ๊ฒฐ๋ก  140 1. ์š”์•ฝ 140 2. ์ œ์–ธ 143 ์ฐธ๊ณ ๋ฌธํ—Œ 145 ๋ถ€๋ก 155 Abstract 161Maste

    Strategic Management Research in Korea: Past 20 Years and Future Directions

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