ジドウブンコウ ヘンコウ カイセキソウチ ノ シサク

An automatic spectroscopic ellipsometer of a rotating analyzer type is described, which is able to determine the optical constants of the samples in the spectral range of 370 nm to 800 nm. The elliPsometer is fully controlled by the micro computer and the spectroscopic measurements are accomplished automatically following the program. As the preliminary experiments,we carried out the measurements of the optical constants of the thick evaporated Au films in the spectral range of 450 nm to 750 nm. The experimental results almost agreed with those of Schulz and Bashara et al in the literature, except for the samples that were seriously affected by the residual gas in the evaporation. We also carried out the measurements of SiO_2 and MgF_2 films on Si wafer at the two wavelengths of 546 nm and 633 nm. The thickness of those films could be determined consistently in each wavelength

マイクロコンピューター ヲ モチイタ コウデンソッコウガタ ヘンコウカイセキソウチ ノ シサク

An automatic measurement system of the photometric ellipsometer combined with microcomputer is described, which has been designed for the measurements of the Optical constants of the evaporated films and the bulk surfaces. The ellipsometer is of the rotating-analyser type ; it is capable of determining the ellipsometric parameters, in typical cases to δψ=0.1° and δΔ=0.1°. It takes about 1.5 minutes to accomplish the measuremet. We developed new measurement method which does not need the accurate alignment of the optical components before measurement. By carring out the measurements at two 90 degree different azimuths of the polariser, we can determine p, s directions of the optical system and the ellipsometric parameters at a time. It is also applied to the new alignment procedure which is more simpler and accurate than usual methods. The versatility of this new measurement method has been confirmed experimentally