STUDY ON THE PROCESS of COPPER ELECTRODEPOSITION ON PLATINUM (111)

采用0.001MOl/lCuSO4＋0.5MOl/lH2SO4溶液体系，在PT单晶球电极作循环伏安曲线，得到Cu存在欠电位沉积和本体沉积两个阶段，利用电化学扫描隧道显微镜观察到在欠电位下Cu在PT（111）面上为单层平面生长，本体沉积为三维岛状生长，并随过电位升高，Cu的成核数目增加.用反射电子显微镜法也观察到高过电位时在PT（111）面上的岛状铜.证实了Cu在PT（111）面上的STrAnSkI—krASTAnOV生长机理C-V curves of copper electrodeposition on Pt(111) showed that there were two stages of underpotential and bulk deposition For copper electrodeposition process.Single layer growth at underpotential deposition and three dimensional nucleation growth at bulk deposition had been in situ observed by electrochemical scanning tunneling microscopy (ECSTM) at diFFerent potentials and times.The reFlection electron microscopy (REM) images also revealed three dimensional growth of Cu deposition at high overpotential.All of these results demonstrated Stranski-Krastanov growth mechanism of copper on Pt(111).国家自然科学基金!59471060;厦门大学固体表面物理化学国家重点实验室、中国科学院原子核分析研究室资

Study of Electrocrystallized n(n≥40) multilayers in Boric Acid Solution

于钝铜片及玻碳上采用双电解池恒电位结晶制取了［Ｃｏ（０．５ｎｍ～２．２ｎｍ）／Ｐｔ（２．０ｎｍ）］ｎ（ｎ≥４０）金属多层膜．低角度Ｘ射线衍射表明多层膜有良好的周期性调制结构，其Ｂｒａｇｇ峰的半幅值随着钴层电结晶电位的负移和铂层电结晶电位正移而减小．中角度Ｘ射线衍射表明界面上存在ＣｏＰｔ３金属化合物．多层膜的磁滞回线表明该多层膜的易磁化轴平行于膜面，表现出平面磁各向异性．以低过电位镀Ｃｏ（厚度约０．５ｎｍ）的多层膜的垂直方向磁滞回线形状较好，有望表现出垂直磁各向异性．Co(0.5 nm～2.2 nm)/Pt(2.0 nm)] n(n>40) multilayers were prepared by electrocrystallization on copper and glass carbon with a dual cell technique under potential control.The periodical modulated structure of the multilayers was demonstrated by the low angle X ray diffraction. Potential shift negative to the deposition potential of the Co layer and positive to the deposition potential of the Pt layer decreased the value of the full width at half maximum(FWHM) of first Bragg Peak.CoPt 3 alloy was found as the interface of the multilayers by the middle angle X ray diffraction.The hysteresis loops show that the easy magnetization of these multilayers lay in plane,and the multilayers tend to exhibit planar anisotropy.The shapes of the hysteresis loops in perpendicular direction perform well when the Co layers were deposited at a low overpotential, with thickness about 0.5nm.The multilayers probably show perpendicular uniaxial anisotropy.作者联系地址：上海大学化学系Author's Address: Dept.of Chemistry,Shanghai University,Shanghai 20180