40 research outputs found
SARS-CoV N蛋白与人冠状病毒HCoV-OC43和HCoV-229E的交叉反应表位及特异表位的确定
为确定SARS-CoV N蛋白的特异抗原表位,对3种人冠状病毒SARS-CoV、HCoV-OC43和HCoV-229E N蛋白之间的交叉免疫反应进行了系统研究。构建了分别表达SARS-CoV、HCoV-OC43和HCoV-229E N蛋白的重组痘苗病毒,并制备了相应的小鼠免疫血清。用间接免疫荧光方法,检测了3种N蛋白的表达及其与3种冠状病毒免疫动物血清和SARS病人恢复期血清之间的反应。与此同时,用Western blot方法分析了原核表达的39个不同区段的SARS-CoV N蛋白与3种冠状病毒动物免疫血清和SARS病人恢复期血清之间的交叉反应性。免疫荧光检测结果表明,SARS-CoV、HCoV-OC43和HCoV-229E3种病毒的N蛋白在重组痘苗病毒感染的HeLa细胞中均可以特异表达;3种N蛋白之间存在明显交叉免疫反应。Western blot结果显示,SARS-CoV N蛋白的表位主要位于30~60aa、170~184aa、301~320aa和360~422aa;与HCoV-OC43的交叉反应表位主要位于30~60aa、90~120aa、204~214aa和320~360aa;与HCoV-229E的交叉反应表位主要位于30~60aa、150~160aa和301~360aa。含SARS-CoV N蛋白特异表位的重组肽N155b(60~214aa)和N185(30~214aa)只与SARS病人恢复期血清和灭活SARS-CoV免疫小鼠的血清反应,而不与灭活HCoV-OC43和HCoV-229E免疫的山羊血清产生交叉反应。上述结果为使用SARS-CoV N蛋白抗原进行特异诊断试剂的研究,提供了重要的实验依据
Photoelectrochemical Study on the Complex of PASP and Tungstate as Inhibitors of Cupronickel B10′s Corrosion
应用光电化学的方法研究了两种环境友好型缓蚀剂聚冬天氨酸(PASP)和钨酸钠(Na2WO4)的单一配方及其复配对白铜B10在硼砂-硼酸缓冲溶液中的缓蚀作用.研究表明,在光电流循环伏安测试中,单一的PASP与Na2WO4均能够使B10表面Cu2O膜引起的p型光电流响应增大,这说明缓蚀剂增大了Cu2O膜的厚度,使B10的腐蚀速率减小.单一的PASP与Na2WO4的最佳添加浓度分别为3和5mg·L-1,单一的Na2WO4比单一的PASP使p型光电流响应增大趋势更大.若以总浓度为5mg·L-1时对两者进行复配,当PASP与Na2WO4的质量浓度比为1∶1和1∶3时,两者复配比单一使用时的p型电流光响应都更大,B10的腐蚀更小,即缓蚀剂的效果更好.交流阻抗测试结果与光电化学测试相一致.Photoelectrochemical and AC impedance measurements were conducted to study the effects of environment-friendly inhibitors poly-aspartate(PASP), Na2WO4 and their complex on the corrosion of cupronickel B10 in a borax-buffer solution. The photoelectrochemical measurement results indicated that PASP or Na2WO4 increased the p-type photocurrent which came from the Cu2O layer on the B10 surface. It showed that the inhibitors increased the thickness of the Cu2O layer and decreased the corrosion speed. The optimal concentrations of PASP and Na2WO4 was 3 and 5 mg·L-1, respectively. Na2WO4 increased photocurrent more than mono PASP did. Combined use of PASP and Na2WO4 in a total concentration of 5 mg·L-1, when the mass ratio(PASP: Na2WO4) was 1∶1 or 1∶3, increased the photocurrent more than their individual use did. The bigger the photocurrent was, the better the inhibition efficiency was. When the mass ratio (PASP: Na2WO4) was 3∶1, the combined use increased photocurrent less than their individual use did, the inhibition effect decreased. AC impedance measurement results were well agreed to the photo-electrochemical results.国家自然科学基金(20406009);; 上海市教委重点项目(06ZZ67);; 上海市重大科技攻关计划(062312045); 厦门大学固体表面物理化学国家重点实验室开放课题(200512);; 上海市重点学科(P1304)资助项
Inhibition Action and Adsorption Behavior of Environment-Friendly Inhibitor Poly-Aspartate on Copper
采用电化学阻抗和极化曲线法研究了绿色缓蚀剂聚天冬氨酸(PASP)对铜在200mg·L-1的NaCl溶液中的缓蚀性能和吸附行为.结果表明,在20℃时,PASP使用的最佳浓度为15mg·L-1,缓蚀率可达到78.3%,PASP的吸附明显降低了Cl-的侵蚀,属于阳极型缓蚀剂.随着温度的升高,PASP的缓蚀性能下降.在50℃时,PASP的缓蚀率下降至40.4%.PASP的吸附行为服从Langmuir吸附等温式,是自发的、放热的过程,属于化学吸附.The inhibition action and adsorption behavior of an environment-friendly inhibitor poly-aspartate (PASP) on copper in aqueous NaCl (0.02%) solution were investigated by means of electrochemical techniques. The results indicated that the best inhibition efficiency of PASP was 78.3% with the concentration of 15 mg·L-1 at 20 ℃. The adsorption of PASP prevented Cu from being corroded and PASP was an anodic inhibitor. The inhibition efficiency of PASP decreased with the increase in solution temperature, it decreased to 40.4% at 50 ℃. The adsorption behavior of PASP followed Langmuir isotherm, it was spontaneous and exothermic, and belonged to chemical adsorption.国家自然科学基金(20406009);; 上海市教委重点项目(06ZZ67);; 上海市科委科技攻关计划(062312045);; 厦门大学固体表面物理化学国家重点实验室开放课题(200512);; 上海市重点学科(P1304)资助项
Photoelectrochemical study of inhibition mechanism of PASP on copper
用光电化学方法研究了绿色水处理药剂聚天冬氨酸对铜的缓蚀作用,铜在硼酸-硼砂缓冲溶液(pH=9.2)中,表面的Cu2O膜显p-型光响应,添加适量缓蚀剂聚天冬氨酸(PASP)后,PASP吸附在铜电极表面成膜促使Cu2O膜增厚,体现在电位在负向扫描过程中Cu2O膜的p-型光电流增大。p-型光电流越大,缓蚀性能越好。当PASP浓度为3mg·L-1时,Cu2O膜的p-型光电流最大,缓蚀性能最好。Cl-的存在会阻止PASP在铜电极表面的吸附,使Cu2O膜暴露而受侵蚀,导致了PASP的缓蚀性能变差。The inhibition mechanism of polyaspartic(PASP)on copper electrode in a borax buffer solution was studied by the photocurrent response method.The copper electrode in a borax buffer solution showed p-type photocurrent response which came from Cu2O layer on its surface.The photocurrent response during cathodic polarization became bigger when inhibitor PASP which could be adsorbed on the Cu electrode and make Cu2O layer thicker was added.The bigger the photocurrent response,the better the inhibition effect.When adding PASP with a concentration of 3 mg·L-1,the photocurrent response was the biggest and inhibition of copper corrosion was the best.Cl- could prevent PASP from being absorbed and make Cu2O layer unprotected,resulting in worse inhibition.国家自然科学基金项目(20406009);; 上海市曙光计划项目(04SG55);; 上海市教委重点项目(06ZZ67);; 上海市科委科技攻关计划项目(062312045);; 厦门大学固体表面物理化学国家重点实验室开放课题项目(200512);; 上海市重点学科项目(P1304)~
Inhibition Action of the Self-Assembled Monolayers of 3-Amino-1,2,4-triazole on Brass
3-氨基-1,2,4-三氮唑(ATA)是一种环境友好型金属处理剂,以其在黄铜表面制备了自组装单分子膜(SAMs),用电化学方法研究ATASAMs对黄铜的缓蚀作用及其吸附行为.结果表明,ATA分子易在黄铜表面形成稳定的ATASAMs,SAMs抑制了黄铜的阳极氧化过程,改变了电极表面的双电层结构,固/液界面双电层电容明显降低,有良好的缓蚀效果.研究结果还表明,ATA的吸附行为符合Langmuir吸附等温式,吸附机理是典型的化学吸附.The anticorrosion and inhibiting mechanism for the self-assembled monolayers (SAMs) of 3-amino-1,2, 4-triazole (ATA) on the surface of brass had been investigated by electrochemical method, as well as its adsorption behavior. The results indicated that ATA was liable to interact with brass forming SAMs on the surface of brass. The SAMs changed the structure of the electric-double layer. The SAMs restrained the process of anodic oxidation and had well anticorrosion effect. It was in good agreement with the results by EIS and polarization curve methods. The results from electrochemical measurements indicated that the corrosion resistance for brass electrode was improved by the ATA SAMs. Adsorption of the ATA SAMs was found to follow the Langmuir′s adsorption isotherm, and the adsorption mechanism was typical chemisorption.国家自然科学基金(20406009、50371053);; 上海市曙光计划(04SG55);; 上海市教委重点项目(06ZZ67);; 上海市科技攻关计划(062312045);; 厦门大学固体表面物理化学国家重点实验室开放课题(200512);; 上海市重点学科建设项目(P1304)资
Photoelectrochemical Study of Influence Factors on Corrosion Resistance of Cupronickel B30 in Simulated Water
用动电位伏安法和光电化学方法对模拟水中白铜B30耐蚀性影响因素进行了研究.白铜B30表面膜显示p-型光响应,光响应来自电极表面的Cu2O层,在模拟水溶液中表面膜的半导体性质会发生转变,由p-型转为n-型;在不同Cl-,SO24?浓度的模拟水溶液中,电位正向扫描时呈现阳极光电流,电位负向扫描时随着Cl-,SO24?离子浓度的增加,光响应由p-型向n-型转变,阳极光电流峰面积与阴极光电流峰面积之比增大,耐蚀性能降低;随着温度的升高,白铜B30的耐蚀性能降低;在pH=7~9之间,其耐蚀性能随着pH的升高而提高,当pH>9时,其耐蚀性能随着pH的升高呈降低趋势.Influence factors on semiconduction properties of oxide films on a cupronickel electrode in the simulated water was studied by cyclic voltammetry and photocurrent response method. The cupronickel electrode showed p-type photoresponse, which came from Cu2O layer on its surface. The photoresponse changed to n-type in the simulated water. The transition from p-type to n-type might be related to the doping of Cl- and SO 42? anions into Cu2O film. It did not show n-type photoresponse when the cupronickel elec- trode was immersed in the simulated water containing some sulfide. It was shown that the degree of corro- sion increased with the concentration of these anions and temperature. In addition, as the pH increased be- tween 7 and 9, the corrosion resistance of B30 was enhanced, while it lowered as the pH was beyond 9.国家自然科学基金(Nos.20406009,50371053);; 上海市曙光计划(No.04SG55);; 上海市教委重点项目(No.06ZZ67);; 上海市科技攻关计划(No.062312045);; 厦门大学固体表面物理化学国家重点实验室开放课题(No.200512);; 上海市重点学科(P1304)建设资助项目
Catalytic Effect of Cl~- on Electrodeposition of Binary Zinc Alloys With Iron group Metals
在氯化物电解液中以定电量 (10C cm- 2 ) ,恒温 4 0℃电沉积Zn Fe族元素二元合金 .沉积产物用原子吸收光谱分析 .根据分析结果 ,作出相应的电流效率、百分含量及部分极化曲线 .镀层形貌采用扫描电镜 (SEM)观察 ,发现 :Zn Fe族元素合金的共沉积为异常共沉积 .Cl- 对铁族元素有催化作用 .随着Cl- 浓度的增加 ,降低了铁族元素的过电位 ,促进了铁族元素金属的沉积 .Zinc iron group metal alloys were deposited under coulostatic (10C.cm -2 ) at 40 ℃ chloride baths. The deposited alloys were quantitatively analyzed by Atomic Absorption Spectrometry. The current efficiency, percent content and partial polarization curves were obtained by the results. The morphology of the deposits was observed by means of Scanning Electron Microscopy(SEM). We observe that the electrodeposition of zinc iron group metal alloys is one of the best known examples of anomalous codeposition. We found the catalytic effect of Cl - on the electrodeposition behavior of iron group metal. Overpotential of iron group metal droped abruptly at high Cl - concentration, while transition current density of Zn increased gradually.作者联系地址:上海大学理学院化学系!上海宝山,200436,上海大学理学院化学系!上海宝山,200436,上海大学理学院化学系!上海宝山,200436,上海大学理学院化学系!上海宝山,200436,上海大学理学院化学系!上海宝山,200436Author's Address: Shanghai Univ., Shanghai Bao shan, 200436,Chin
星系中心大质量黑洞及潮汐瓦解恒星事件
黑洞潮汐瓦解恒星事件(Tidal Disruption Events,TDE)是星系中心黑洞瓦解进入其潮汐瓦解半径内的恒星并吸积恒星碎片物质而产生的一种剧烈辐射耀发现象.TDE的能谱和光变特征中蕴含了中心黑洞和被瓦解的恒星的信息,为我们证实和普查宁静星系中的黑洞,研究其参数、吸积过程和喷流产生、以及核区星际介质等提供了可能.TDE还可能提供中等质量黑洞和双黑洞存在的证据.TDE的观测和理论已成为一个新开辟的天体物理研究领域,但目前的进展受制于探测到事件太少(尤其是在X射线波段),且观测数据普遍质量不高.TDE的发生率很低,要探测大样本的事例需要监测足够大的空间体积.爱因斯坦探针卫星(Einstein Probe,EP)覆盖了0.5–4 keV的软X射线波段(接近TDE耀发时的辐射峰值能段),具有大视场以及高灵敏度,非常利于对TDE的探测.预期爱因斯坦探针卫星每年可以发现约几十至上百例TDE,其中有约10例或更多具有相对论性喷流特征.这将使我们可以获得较为完备、具有统计意义的TDE的样本,为进一步研究黑洞的存在和统计性质、增长和演化、发现中等质量黑洞和大质量双黑洞等提供了新的途径.中国科学院空间科学战略性先导科技专项(编号:XDA15052100);;北京大学“985工程”建设项目“星团环境对双黑洞形成演化过程的干扰及其对引力波探测的影响”资
Inhibition action and adsorption behavior of environment-friendly inhibitor poly-aspartate on copper
The inhibition action and adsorption behavior of an environment-friendly inhibitor poly-aspartate (PASP) on copper in aqueous NaCl (0.02%) solution were investigated by means of electrochemical techniques. The results indicated that the best inhibition efficiency of PASP was 78.3% with the concentration of 15 mg center dot L-1 at 20 degrees C. The adsorption of PASP prevented Cu from being corroded and PASP was an anodic inhibitor. The inhibition efficiency of PASP decreased with the increase in solution temperature, it decreased to 40.4% at 50 degrees C. The adsorption behavior of PASP followed Langmuir isotherm, it was spontaneous and exothermic, and belonged to chemical adsorption
Photoelectrochemical study of influence factors on corrosion resistance of cupronickel B30 in simulated water
Influence factors on semiconduction properties of oxide films on a cupronickel electrode in the simulated water was studied by cyclic voltammetry and photocurrent response method. The cupronickel electrode showed p-type photoresponse, which came from CU2O layer on its surface. The photoresponse changed to n-type in the simulated water. The transition from p-type to n-type might be related to the doping of Cl- and SO42- anions into CU2O film. It did not show n-type photoresponse when the cupronickel electrode was immersed in the simulated water containing some sulfide. It was shown that the degree of corrosion increased with the concentration of these anions and temperature. In addition, as the pH increased between 7 and 9, the corrosion resistance of B30 was enhanced, while it lowered as the pH was beyond 9
