Reducing Library Characterization Time for Cell-aware Test while Maintaining Test Quality

Cell-aware test (CAT) explicitly targets faults caused by defects inside library cells to improve test quality, compared with conventional automatic test pattern generation (ATPG) approaches, which target faults only at the boundaries of library cells. The CAT methodology consists of two stages. Stage 1, based on dedicated analog simulation, library characterization per cell identifies which cell-level test pattern detects which cell-internal defect; this detection information is encoded in a defect detection matrix (DDM). In Stage 2, with the DDMs as inputs, cell-aware ATPG generates chip-level test patterns per circuit design that is build up of interconnected instances of library cells. This paper focuses on Stage 1, library characterization, as both test quality and cost are determined by the set of cell-internal defects identified and simulated in the CAT tool flow. With the aim to achieve the best test quality, we first propose an approach to identify a comprehensive set, referred to as full set, of potential open- and short-defect locations based on cell layout. However, the full set of defects can be large even for a single cell, making the time cost of the defect simulation in Stage 1 unaffordable. Subsequently, to reduce the simulation time, we collapse the full set to a compact set of defects which serves as input of the defect simulation. The full set is stored for the diagnosis and failure analysis. With inspecting the simulation results, we propose a method to verify the test quality based on the compact set of defects and, if necessary, to compensate the test quality to the same level as that based on the full set of defects. For 351 combinational library cells in Cadence’s GPDK045 45nm library, we simulate only 5.4% defects from the full set to achieve the same test quality based on the full set of defects. In total, the simulation time, via linear extrapolation per cell, would be reduced by 96.4% compared with the time based on the full set of defects

Evaluating Architectural, Redundancy, and Implementation Strategies for Radiation Hardening of FinFET Integrated Circuits

In this article, authors explore radiation hardening techniques through the design of a test chip implemented in 16-nm FinFET technology, along with architectural and redundancy design space exploration of its modules. Nine variants of matrix multiplication were taped out and irradiated with neutrons. The results obtained from the neutron campaign revealed that the radiation-hardened variants present superior resiliency when either local or global triple modular redundancy (TMR) schemes are employed. Furthermore, simulation-based fault injection was utilized to validate the measurements and to explore the effects of different implementation strategies on failure rates. We further show that the interplay between these different implementation strategies is not trivial to capture and that synthesis optimizations can effectively break assumptions about the effectiveness of redundancy schemes

Layout-level Circuit Sizing and Design-for-manufacturability Methods for Embedded RF Passive Circuits

The emergence of multi-band communications standards, and the fast pace of the consumer electronics markets for wireless/cellular applications emphasize the need for fast design closure. In addition, there is a need for electronic product designers to collaborate with manufacturers, gain essential knowledge regarding the manufacturing facilities and the processes, and apply this knowledge during the design process. In this dissertation, efficient layout-level circuit sizing techniques, and methodologies for design-for-manufacturability have been investigated. For cost-effective fabrication of RF modules on emerging technologies, there is a clear need for design cycle time reduction of passive and active RF modules. This is important since new technologies lack extensive design libraries and layout-level electromagnetic (EM) optimization of RF circuits become the major bottleneck for reduced design time. In addition, the design of multi-band RF circuits requires precise control of design specifications that are partially satisfied due to manufacturing variations, resulting in yield loss. In this work, a broadband modeling and a layout-level sizing technique for embedded inductors/capacitors in multilayer substrate has been presented. The methodology employs artificial neural networks to develop a neuro-model for the embedded passives. Secondly, a layout-level sizing technique for RF passive circuits with quasi-lumped embedded inductors and capacitors has been demonstrated. The sizing technique is based on the circuit augmentation technique and a linear optimization framework. In addition, this dissertation presents a layout-level, multi-domain DFM methodology and yield optimization technique for RF circuits for SOP-based wireless applications. The proposed statistical analysis framework is based on layout segmentation, lumped element modeling, sensitivity analysis, and extraction of probability density functions using convolution methods. The statistical analysis takes into account the effect of thermo-mechanical stress and process variations that are incurred in batch fabrication. Yield enhancement and optimization methods based on joint probability functions and constraint-based convex programming has also been presented. The results in this work have been demonstrated to show good correlation with measurement data.Ph.D.Committee Chair: Swaminathan, Madhavan; Committee Member: Fathianathan, Mervyn; Committee Member: Lim, Sung Kyu; Committee Member: Peterson, Andrew; Committee Member: Tentzeris, Mano

AI/ML Algorithms and Applications in VLSI Design and Technology

An evident challenge ahead for the integrated circuit (IC) industry in the nanometer regime is the investigation and development of methods that can reduce the design complexity ensuing from growing process variations and curtail the turnaround time of chip manufacturing. Conventional methodologies employed for such tasks are largely manual; thus, time-consuming and resource-intensive. In contrast, the unique learning strategies of artificial intelligence (AI) provide numerous exciting automated approaches for handling complex and data-intensive tasks in very-large-scale integration (VLSI) design and testing. Employing AI and machine learning (ML) algorithms in VLSI design and manufacturing reduces the time and effort for understanding and processing the data within and across different abstraction levels via automated learning algorithms. It, in turn, improves the IC yield and reduces the manufacturing turnaround time. This paper thoroughly reviews the AI/ML automated approaches introduced in the past towards VLSI design and manufacturing. Moreover, we discuss the scope of AI/ML applications in the future at various abstraction levels to revolutionize the field of VLSI design, aiming for high-speed, highly intelligent, and efficient implementations

Exploitation dynamique des données de production pour améliorer les méthodes DFM dans l'industrie Microélectronique

La conception pour la fabrication ou DFM (Design for Manufacturing) est une méthode maintenant classique pour assurer lors de la conception des produits simultanément la faisabilité, la qualité et le rendement de la production. Dans l'industrie microélectronique, le Design Rule Manual (DRM) a bien fonctionné jusqu'à la technologie 250nm avec la prise en compte des variations systématiques dans les règles et/ou des modèles basés sur l'analyse des causes profondes, mais au-delà de cette technologie, des limites ont été atteintes en raison de l'incapacité à sasir les corrélations entre variations spatiales. D'autre part, l'évolution rapide des produits et des technologies contraint à une mise à jour dynamique des DRM en fonction des améliorations trouvées dans les fabs. Dans ce contexte les contributions de thèse sont (i) une définition interdisciplinaire des AMDEC et analyse de risques pour contribuer aux défis du DFM dynamique, (ii) un modèle MAM (mapping and alignment model) de localisation spatiale pour les données de tests, (iii) un référentiel de données basé sur une ontologie ROMMII (referential ontology Meta model for information integration) pour effectuer le mapping entre des données hétérogènes issues de sources variées et (iv) un modèle SPM (spatial positioning model) qui vise à intégrer les facteurs spatiaux dans les méthodes DFM de la microélectronique, pour effectuer une analyse précise et la modélisation des variations spatiales basées sur l'exploitation dynamique des données de fabrication avec des volumétries importantes.The DFM (design for manufacturing) methods are used during technology alignment and adoption processes in the semiconductor industry (SI) for manufacturability and yield assessments. These methods have worked well till 250nm technology for the transformation of systematic variations into rules and/or models based on the single-source data analyses, but beyond this technology they have turned into ineffective R&D efforts. The reason for this is our inability to capture newly emerging spatial variations. It has led an exponential increase in technology lead times and costs that must be addressed; hence, objectively in this thesis we are focused on identifying and removing causes associated with the DFM ineffectiveness. The fabless, foundry and traditional integrated device manufacturer (IDM) business models are first analyzed to see coherence against a recent shift in business objectives from time-to-market (T2M) and time-to-volume towards (T2V) towards ramp-up rate. The increasing technology lead times and costs are identified as a big challenge in achieving quick ramp-up rates; hence, an extended IDM (e-IDM) business model is proposed to support quick ramp-up rates which is based on improving the DFM ineffectiveness followed by its smooth integration. We have found (i) single-source analyses and (ii) inability to exploit huge manufacturing data volumes as core limiting factors (failure modes) towards DFM ineffectiveness during technology alignment and adoption efforts within an IDM. The causes for single-source root cause analysis are identified as the (i) varying metrology reference frames and (ii) test structures orientations that require wafer rotation prior to the measurements, resulting in varying metrology coordinates (die/site level mismatches). A generic coordinates mapping and alignment model (MAM) is proposed to remove these die/site level mismatches, however to accurately capture the emerging spatial variations, we have proposed a spatial positioning model (SPM) to perform multi-source parametric correlation based on the shortest distance between respective test structures used to measure the parameters. The (i) unstructured model evolution, (ii) ontology issues and (iii) missing links among production databases are found as causes towards our inability to exploit huge manufacturing data volumes. The ROMMII (referential ontology Meta model for information integration) framework is then proposed to remove these issues and enable the dynamic and efficient multi-source root cause analyses. An interdisciplinary failure mode effect analysis (i-FMEA) methodology is also proposed to find cyclic failure modes and causes across the business functions which require generic solutions rather than operational fixes for improvement. The proposed e-IDM, MAM, SPM, and ROMMII framework results in accurate analysis and modeling of emerging spatial variations based on dynamic exploitation of the huge manufacturing data volumes.SAVOIE-SCD - Bib.électronique (730659901) / SudocGRENOBLE1/INP-Bib.électronique (384210012) / SudocGRENOBLE2/3-Bib.électronique (384219901) / SudocSudocFranceF