Analyse et modélisation des phénomènes de mismatch des transistors MOSFET avancées

For correct operation, certain analog and digital circuits, such as current mirrors or SRAM, require pairs of MOS transistors that are electrically identical. Real devices, however, suffer from random local variations in the electrical parameters, a problem referred to as mismatch. The aim of this thesis is to understand the physical causes of mismatch, to quantify this phenomenon, and to propose solutions that enable to reduce its effects. In this context, four major areas are treated. The first one focuses on the optimization of mismatch measurement methodologies. A new technique for the measurement of Vt and β mismatch and an ID mismatch model are proposed, analyzed and applied to experimental data for 28 nm Bulk and FD SOI technologies. The second area focuses on the characterization of different configurations of MOS transistors in order to propose design architectures that are optimized for certain applications. Specifically, the possibility of replacing LDEMOS with transistors in cascode configuration is analyzed. The third area focuses on the analysis and modeling of mismatch phenomena in advanced Bulk and SOI transistors. Three aspects are analyzed: 1) the impact of the introduction of germanium in P channel of 28nm BULK transistors; 2) the elimination of the metal gate contribution to Vt mismatch by using 20nm Gate-last Bulk technology; 3) a descriptive study of the principal contributions to Vt, β and ID mismatch in 28 and 14 nm FD SOI technologies. The last area treats the mismatch trends with transistor aging. NBTI stress tests were applied to PMOS 28nm FD SOI transistors. Models of the Vt and β mismatch trends as a function of the induced interface traps and fixed charges at the Si/SiO2 interface and in the oxide were developed and discussed.Afin de réaliser correctement leur fonction, certains blocs analogiques ou numériques comme les miroirs de courant ou les SRAM, nécessitent des paires de transistors MOS électriquement identiques. Cependant, les dispositifs sur silicium, même appariés, subissent des variations locales aléatoires ce qui fait varier leurs performances électriques. Ce phénomène est connu sous le nom désappariement. L'objectif de cette thèse est de comprendre les causes physiques de ce désappariement, de le quantifier et de proposer des solutions pour le réduire. Dans ce contexte, quatre thèmes principaux sont développés. Le premier thème se focalise sur l'optimisation des méthodologies de mesures des phénomènes de désappariement. Une nouvelle méthode de mesure du désappariement de Vt et de β ainsi qu'un nouveau modèle de désappariement de ID sont proposés, analysés et appliqués à des données mesurées sur des technologies 28nm Bulk et FD SOI. Le second thème se concentre sur la caractérisation des différentes configurations de transistor MOS afin de proposer l'architecture optimale en fonction des applications visées. Ainsi, la possibilité de remplacer le LDEMOS par une configuration cascode est analysée en détail. Le troisième thème se focalise sur l'analyse et la modélisation des phénomènes de désappariement des transistors MOS avancés. Trois aspects sont analysés : 1) l'introduction du Ge dans le canal P des technologies 28nm BULK, 2) la suppression de la contribution de la grille sur le désappariement de Vt en utilisant la technologie 20 nm métal-Gate-Last 3) un descriptif des principaux contributeurs au désappariement de Vt, β et ID dans les technologies 28 et 14nm FD SOI. Le dernier thème traite du comportement du désappariement des transistors MOS après vieillissement. Un vieillissement NBTI a été appliqué sur des PMOS de la technologie 28nm FD SOI. Des modèles de comportement de Vt et de β en fonction du nombre de charges fixes ou d'états d'interfaces induits à l'interface Si/SiO2 ou dans l'oxyde sont proposés et analysés

Intrinsic variability of nanoscale CMOS technology for logic and memory.

The continuous downscaling of CMOS technology, the main engine of development of the semiconductor Industry, is limited by factors that become important for nanoscale device size, which undermine proper device operation completely offset gains from scaling. One of the main problems is device variability: nominally identical devices are different at the microscopic level due to fabrication tolerance and the intrinsic granularity of matter. For this reason, structures, devices and materials for the next technology nodes will be chosen for their robustness to process variability, in agreement with the ITRS (International Technology Roadmap for Semiconductors). Examining the dispersion of various physical and geometrical parameters and the effect these have on device performance becomes necessary. In this thesis, I focus on the study of the dispersion of the threshold voltage due to intrinsic variability in nanoscale CMOS technology for logic and for memory. In order to describe this, it is convenient to have an analytical model that allows, with the assistance of a small number of simulations, to calculate the standard deviation of the threshold voltage due to the various contributions

Ultra Low Noise CMOS Image Sensors

CMOS Image Sensors (CIS) overtook the charge coupled devices (CCDs) in low noise performance. Photoelectron counting capability is the next step for CIS for ultimate low light performance and new imaging paradigms. This work presents a review of CMOS image sensors based on pinned photo diodes (PPDs). The latter includes the historical background, the PPD physics and the readout chain circuits used for low-noise performance. The physical mechanisms behind the random fluctuations affecting the signal at different levels of conventional CIS readout chains are reviewed and clarified. This thesis dedicates a particular focus to the readout circuit noise given that it precludes photoelectron counting in conventional CIS. A detailed analytical calculation of the temporal read noise (TRN) in conventional CIS readout chain is presented. The latter suggests different noise reduction techniques at process and circuit design level. Among the noise reduction techniques suggested by the analytical noise calculation, the increase of the oxide capacitance by using a thin oxide in-pixel amplifying transistor, for low 1/f noise, is suggested for the first time. A test chip designed in a 180 nm CIS process and embedding optimized readout chains exploiting the new pixels together with state-of-the-art 4T pixels optimized at process level for low 1/f noise. A mean input-referred noise of 0.4 e-rms has been measured. Compared with the state-of-the-art pixels, also present onto the test chip, the mean RMS noise is divided by more than 2. Based on these encouraging result, a full VGA (640H×480V) imager has been integrated in a standard CIS process. The presented imager relies on a 4T pixel of 6.5 µm pitch with a properly sized and biased thin oxide PMOS source follower. A full characterization of the proposed image sensor, at room temperature, is presented. The sensor chip features an input-referred noise histogram from 0.25 e-rms to a few e-rms peaking at 0.48 e-rms. This sub-0.5 electron noise performance is obtained with a full well capacity of 6400 e- and a frame rate that can go up to 80 fps. The VGA imager also features a fixed pattern noise as low as 0.77%, a lag of 0.1% and a dark current of 5.6 e-/s. Correlated multiple sampling (CMS) is a noise reduction technique commonly used in low noise CIS. This work presents an original design for CMS based on a passive switched-capacitor network, with a minimum number of capacitors. The proposed circuit requires no additional active circuitry, has no impact on the output dynamic range and does not need multiple analog-to-digital conversions. It was verified with transient noise simulations and shows a noise reduction in perfect agreement with ideal CMS. For a future perspective, the impact of the technology downscale on CIS sensitivity from an electronic read noise aspect is investigated. Active imaging in the Terahertz (THz) band is an emerging technology. Source modulation combined with a selective filtering can be used to reduce the noise in CMOS THz imagers. This work presents the first integration of a 1 kpixel CMOS THz imager integrating, in each pixel, a metal antenna with a MOS rectifier, low noise amplification and highly selective filtering, based on a switch-capacitor N-path filter combined with a broad band Gm-C filter. The latter has been tested successfully. An input-referred noise of 0.2 µV RMS corresponding to a total noise equivalent THz power of 0.6 nW at 270 GHz and 0.8 nW at 600 GHz