Study of Soi Annular Mosfet

Annular transistors are enclosed geometry transistors which reduce device leakage by eliminating diffusion edges. Due to the asymmetry of these devices with respect to inner and outer terminals; this study evaluates the behavior of the annular transistor with respect to both the inner and outer drain terminals. Along with this, the effects of geometry of the device on the leakage current and kink effects, related to the NMOS SOS devices at various temperatures are evaluated. Performance of NMOS annular transistor across four different transistor lengths (L= 1.3um, 1.4um 1.5um and 1.6um) are studied along with comparison to a NMOS rectilinear transistors (L=1.4um) at room temperature (RT) and 275C. The experimental results demonstrated a decrease in threshold voltage between the annular transistor with an inner drain compared to the rectilinear transistor by 20% at RT and 33% at 275C. Threshold voltage for an annular transistor with an inner drain is greater than the same transistor with an outer drain by 2% at RT and 3% at 275C. The Ion/Ioff ratio for annular devices with an inner drain compared to a rectangular device shows an improvement of 99% at both RT and 275C. The Ion/Ioff ratio for the same annular transistor with an inner drain verses an outer drain is greater by 75% at RT and 51% at 275C. The kink voltage for an annular transistor with an inner drain is greater than rectangular transistor by 2% at RT while 5% lower at 275C. Kink voltage for annular transistor with an outer drain is greater than the same transistor with an inner drain by 2% at RT and 1% at 275C. Early voltage (VA) for an annular transistor with an inner drain is greater than rectangular transistor by 22% at RT and 21% at 275C. VA for an annular transistor with an inner drain is greater than the same transistor with an outer drain by 22% at RT and 15% at 275C. Output resistance (rds) per unit width of an annular transistor with an inner drain is greater than rectilinear transistor by 77% at RT and 79% at 275C. rds for annular transistor with an inner drain is greater than that with an outer drain of the same device by 4% at RT and is lower by 25% at 275C. In conclusion when it is of the utmost importance to control leakage and device self gain annular transistors provide a significant improvement over the classical rectangular transistor. Some enhanced performance is observed when the inner contact is selected as the drain. It should also be noted that measurement accuracy precludes the taking of any conclusion where changes of less than 2% are observed.School of Electrical & Computer Engineerin

Ultra-low Voltage Digital Circuits and Extreme Temperature Electronics Design

Certain applications require digital electronics to operate under extreme conditions e.g., large swings in ambient temperature, very low supply voltage, high radiation. Such applications include sensor networks, wearable electronics, unmanned aerial vehicles, spacecraft, and energyharvesting systems. This dissertation splits into two projects that study digital electronics supplied by ultra-low voltages and build an electronic system for extreme temperatures. The first project introduces techniques that improve circuit reliability at deep subthreshold voltages as well as determine the minimum required supply voltage. These techniques address digital electronic design at several levels: the physical process, gate design, and system architecture. This dissertation analyzes a silicon-on-insulator process, Schmitt-trigger gate design, and asynchronous logic at supply voltages lower than 100 millivolts. The second project describes construction of a sensor digital controller for the lunar environment. Parts of the digital controller are an asynchronous 8031 microprocessor that is compatible with synchronous logic, memory with error detection and correction, and a robust network interface. The digitial sensor ASIC is fabricated on a silicon-germanium process and built with cells optimized for extreme temperatures

A study of Radiation-Tolerant Voltage-Controlled Oscillators designs in 65 nm bulk and 28 nm FDSOI CMOS technologies

Phase-locked loop (PLL) systems are widely employed in integrated circuits for space analog devices and communications systems that operate in radiation environments, where significant perturbations, especially in terms of phase noise, can be generated due to radiation particles. Among all the blocks that form a PLL system, previous research suggests the voltage-controlled oscillator (VCO) is one of the most critical components in terms of radiation tolerance and electric performance. Ring oscillators (ROs) and LC-tank VCOs have been commonly employed in high-performance PLLs. Nevertheless, both structures have drawbacks including a limited tuning range, high sensitivity to phase noise, limited radiation tolerance, and large design areas. In order to fulfill these high-performance requirements, a current-model logic (CML) based RO-VCO is presented as a possible solution capable of reducing the limitations of the commonly used structures and exploiting their advantages. The proposed hybrid VCO model includes passive components in its design which are the key parameters that define oscillation frequency of this structure. This tunable oscillator has been designed and tested in 65nm Bulk and 28 nm Fully depleted silicon-on-insulator (FDSOI) CMOS technologies The 65nm testchip was designed to compare the behavior of the proposed CML VCO with a current-starved RO and a radiation hardened by design (RHBD) LC-tank VCO in terms of tuning range, phase noise, Single event effect (SEE) sensitivity and design area. Simulations were carried out by applying a double exponential current pulse into different sensitive nodes of the three VCOs. In addition, SEE tests were conducted using pulsed laser experiments. Simulation and test results show that a CML VCO can effectively overcome the limitations presented by a RO-VCO and LC-tank VCO, achieving a wide range of tuning, and low sensitivity to noise and SEEs without the need for a large cross-section. Further studies of the proposed CML VCO were done on 28nm FDSOI in order to reduce the leakage current and increase the switching speed. the same current-starved VCO and CML VCO were implemented on this testchip, and simulations were performed by injecting a double exponential current pulse energy into the previously defined sensitive nodes. The results show SEE sensitivity improvement without narrowing the tuning range or affecting the phase noise response

Predicting power scalability in a reconfigurable platform

This thesis focuses on the evolution of digital hardware systems. A reconfigurable platform is proposed and analysed based on thin-body, fully-depleted silicon-on-insulator Schottky-barrier transistors with metal gates and silicide source/drain (TBFDSBSOI). These offer the potential for simplified processing that will allow them to reach ultimate nanoscale gate dimensions. Technology CAD was used to show that the threshold voltage in TBFDSBSOI devices will be controllable by gate potentials that scale down with the channel dimensions while remaining within appropriate gate reliability limits. SPICE simulations determined that the magnitude of the threshold shift predicted by TCAD software would be sufficient to control the logic configuration of a simple, regular array of these TBFDSBSOI transistors as well as to constrain its overall subthreshold power growth. Using these devices, a reconfigurable platform is proposed based on a regular 6-input, 6-output NOR LUT block in which the logic and configuration functions of the array are mapped onto separate gates of the double-gate device. A new analytic model of the relationship between power (P), area (A) and performance (T) has been developed based on a simple VLSI complexity metric of the form ATσ = constant. As σ defines the performance “return” gained as a result of an increase in area, it also represents a bound on the architectural options available in power-scalable digital systems. This analytic model was used to determine that simple computing functions mapped to the reconfigurable platform will exhibit continuous power-area-performance scaling behavior. A number of simple arithmetic circuits were mapped to the array and their delay and subthreshold leakage analysed over a representative range of supply and threshold voltages, thus determining a worse-case range for the device/circuit-level parameters of the model. Finally, an architectural simulation was built in VHDL-AMS. The frequency scaling described by σ, combined with the device/circuit-level parameters predicts the overall power and performance scaling of parallel architectures mapped to the array

Development and characterization of high performance transistors on glass

Currently, the electrical drivers behind active-matrix flat-panel displays are polysilicon or amorphous silicon based thin-film transistors (TFTs). The ability to integrate transistors onto the glass substrate offers certain design and performance advantages over package-level integration with bulk silicon ICs; this is commonly referred to as system-on-glass (SOG) or system-on-panel (SOP). System on glass may also lower the manufacturing costs of the entire product. Cell phones, personal digital assistants, and entertainment systems are examples of applications that would benefit from system on glass integration. This project is a joint effort between the Microelectronic Engineering Department at RIT and Corning Incorporated. Thin- film transistors have been fabricated on a new substrate material which consists of a high-quality silicon layer on Corning’s Eagle 2000 flat-panel display glass. The substrate material has the potential of yielding transistors with higher performance than commercialized polysilicon and amorphous silicon thin film transistor technologies. The primary focus of this investigation was to solve the engineering challenges of dopant activation, deposited dielectric quality and interface charge associated with a low-temperature (LT) process. A process that is compatible with the thermal constraints of the glass has been designed and demonstrated through the fabrication of MOS transistor. While the device characteristics demonstrate the on-state and off-state behavior of standard bulk-silicon devices, there are unique features which required an extensive study to understand and explain the governing physics. Device simulation was used to develop a comprehensive model of operation for the devices

CMOS MESFET Cascode Amplifiers for RFIC Applications

abstract: There is an ever-increasing demand for higher bandwidth and data rate ensuing from exploding number of radio frequency integrated systems and devices. As stated in the Shannon-Hartley theorem, the maximum achievable data rate of a communication channel is linearly proportional to the system bandwidth. This is the main driving force behind pushing wireless systems towards millimeter-wave frequency range, where larger bandwidth is available at a higher carrier frequency. Observing the Moor’s law, highly scaled complementary metal–oxide–semiconductor (CMOS) technologies provide fast transistors with a high unity power gain frequency which enables operating at millimeter-wave frequency range. CMOS is the compelling choice for digital and signal processing modules which concurrently offers high computation speed, low power consumption, and mass integration at a high manufacturing yield. One of the main shortcomings of the sub-micron CMOS technologies is the low breakdown voltage of the transistors that limits the dynamic range of the radio frequency (RF) power blocks, especially with the power amplifiers. Low voltage swing restricts the achievable output power which translates into low signal to noise ratio and degraded linearity. Extensive research has been done on proposing new design and IC fabrication techniques with the goal of generating higher output power in CMOS technology. The prominent drawbacks of these solutions are an increased die area, higher cost per design, and lower overall efficiency due to lossy passive components. In this dissertation, CMOS compatible metal–semiconductor field-effect transistor (MESFETs) are utilized to put forward a new solution to enhance the power amplifier’s breakdown voltage, gain and maximum output power. Requiring no change to the conventional CMOS process flow, this low cost approach allows direct incorporation of high voltage power MESFETs into silicon. High voltage MESFETs were employed in a cascode structure to push the amplifier’s cutoff frequency and unity power gain frequency to the 5G and K-band frequency range. This dissertation begins with CMOS compatible MESFET modeling and fabrication steps, and culminates in the discussion of amplifier design and optimization methodology, parasitic de-embedding steps, simulation and measurement results, and high resistivity RF substrate characterization.Dissertation/ThesisDoctoral Dissertation Electrical Engineering 201

Design, Characterization and Analysis of Component Level Electrostatic Discharge (ESD) Protection Solutions

Electrostatic Discharges (ESD) is a significant hazard to electronic components and systems. Based on a specific process technology, a given circuit application requires a customized ESD consideration that meets all the requirements such as the core circuit\u27s operating condition, maximum accepted leakage current, breakdown conditions for the process and overall device sizes. In every several years, there will be a new process technology becomes mature, and most of those new technology requires custom design of effective ESD protection solution. And usually the design window will shrinks due to the evolving of the technology becomes smaller and smaller. The ESD related failure is a major IC reliability concern and results in a loss of millions dollars each year in the semiconductor industry. To emulate the real word stress condition, several ESD stress models and test methods have been developed. The basic ESD models are Human Body model (HBM), Machine Mode (MM), and Charge Device Model (CDM). For the system-level ESD robustness, it is defined by different standards and specifications than component-level ESD requirements. International Electrotechnical Commission (IEC) 61000-4-2 has been used for the product and the Human Metal Model (HMM) has been used for the system at the wafer level. Increasingly stringent design specifications are forcing original equipment manufacturers (OEMs) to minimize the number of off-chip components. This is the case in emerging multifunction mobile, industrial, automotive and healthcare applications. It requires a high level of ESD robustness and the integrated circuit (IC) level, while finding ways to streamline the ESD characterization during early development cycle. To enable predicting the ESD performance of IC\u27s pins that are directly exposed to a system-level stress condition, a new the human metal model (HMM) test model has been introduced. In this work, a new testing methodology for product-level HMM characterization is introduced. This testing framework allows for consistently identifying ESD-induced failures in a product, substantially simplifying the testing process, and significantly reducing the product evaluation time during development cycle. It helps eliminates the potential inaccuracy provided by the conventional characterization methodology. For verification purposes, this method has been applied to detect the failures of two different products. Addition to the exploration of new characterization methodology that provides better accuracy, we also have looked into the protection devices itself. ICs for emerging high performance precision data acquisition and transceivers in industrial, automotive and wireless infrastructure applications require effective and ESD protection solutions. These circuits, with relatively high operating voltages at the Input/Output (I/O) pins, are increasingly being designed in low voltage Complementary Metal-Oxide-Semiconductor (CMOS) technologies to meet the requirements of low cost and large scale integration. A new dual-polarity SCR optimized for high bidirectional blocking voltages, high trigger current and low capacitance is realized in a sub 3-V, 180-nm CMOS process. This ESD device is designed for a specific application where the operating voltage at the I/O is larger than that of the core circuit. For instance, protecting high voltage swing I/Os in CMOS data acquisition system (DAS) applications. In this reference application, an array of thin film resistors voltage divider is directly connected to the interface pin, reducing the maximum voltage that is obtained at the core device input down to ± 1-5 V. Its ESD characteristics, including the trigger voltage and failure current, are compared against those of a typical CMOS-based SCR. Then, we have looked into the ESD protection designs into more advanced technology, the 28-nm CMOS. An ESD protection design builds on the multiple discharge-paths ESD cell concept and focuses the attention on the detailed design, optimization and realization of the in-situ ESD protection cell for IO pins with variable operation voltages. By introducing different device configurations fabricated in a 28-nm CMOS process, a greater flexibility in the design options and design trade-offs can be obtained in the proposed topology, thus achieving a higher integration and smaller cell size definition for multi-voltage compatibility interface ESD protection applications. This device is optimized for low capacitance and synthesized with the circuit IO components for in-situ ESD protection in communication interface applications developed in a 28-nm, high-k, and metal-gate CMOS technology. ESD devices have been used in different types of applications and also at different environment conditions, such as high temperature. At the last section of this research work, we have performed an investigation of several different ESD devices\u27 performance under various temperature conditions. And it has been shown that the variations of the device structure can results different ESD performance, and some devices can be used at the high temperature and some cannot. And this investigation also brings up a potential threat to the current ESD protection devices that they might be very vulnerable to the latch-up issue at the higher temperature range

Design of Variation-Tolerant Circuits for Nanometer CMOS Technology: Circuits and Architecture Co-Design

Aggressive scaling of CMOS technology in sub-90nm nodes has created huge challenges. Variations due to fundamental physical limits, such as random dopants fluctuation (RDF) and line edge roughness (LER) are increasing significantly with technology scaling. In addition, manufacturing tolerances in process technology are not scaling at the same pace as transistor's channel length due to process control limitations (e.g., sub-wavelength lithography). Therefore, within-die process variations worsen with successive technology generations. These variations have a strong impact on the maximum clock frequency and leakage power for any digital circuit, and can also result in functional yield losses in variation-sensitive digital circuits (such as SRAM). Moreover, in nanometer technologies, digital circuits show an increased sensitivity to process variations due to low-voltage operation requirements, which are aggravated by the strong demand for lower power consumption and cost while achieving higher performance and density. It is therefore not surprising that the International Technology Roadmap for Semiconductors (ITRS) lists variability as one of the most challenging obstacles for IC design in nanometer regime. To facilitate variation-tolerant design, we study the impact of random variations on the delay variability of a logic gate and derive simple and scalable statistical models to evaluate delay variations in the presence of within-die variations. This work provides new design insight and highlights the importance of accounting for the effect of input slew on delay variations, especially at lower supply voltages. The derived models are simple, scalable, bias dependent and only require the knowledge of easily measurable parameters. This makes them useful in early design exploration, circuit/architecture optimization as well as technology prediction (especially in low-power and low-voltage operation). The derived models are verified using Monte Carlo SPICE simulations using industrial 90nm technology. Random variations in nanometer technologies are considered one of the largest design considerations. This is especially true for SRAM, due to the large variations in bitcell characteristics. Typically, SRAM bitcells have the smallest device sizes on a chip. Therefore, they show the largest sensitivity to different sources of variations. With the drastic increase in memory densities, lower supply voltages and higher variations, statistical simulation methodologies become imperative to estimate memory yield and optimize performance and power. In this research, we present a methodology for statistical simulation of SRAM read access yield, which is tightly related to SRAM performance and power consumption. The proposed flow accounts for the impact of bitcell read current variation, sense amplifier offset distribution, timing window variation and leakage variation on functional yield. The methodology overcomes the pessimism existing in conventional worst-case design techniques that are used in SRAM design. The proposed statistical yield estimation methodology allows early yield prediction in the design cycle, which can be used to trade off performance and power requirements for SRAM. The methodology is verified using measured silicon yield data from a 1Mb memory fabricated in an industrial 45nm technology. Embedded SRAM dominates modern SoCs and there is a strong demand for SRAM with lower power consumption while achieving high performance and high density. However, in the presence of large process variations, SRAMs are expected to consume larger power to ensure correct read operation and meet yield targets. We propose a new architecture that significantly reduces array switching power for SRAM. The proposed architecture combines built-in self-test (BIST) and digitally controlled delay elements to reduce the wordline pulse width for memories while ensuring correct read operation; hence, reducing switching power. A new statistical simulation flow was developed to evaluate the power savings for the proposed architecture. Monte Carlo simulations using a 1Mb SRAM macro from an industrial 45nm technology was used to examine the power reduction achieved by the system. The proposed architecture can reduce the array switching power significantly and shows large power saving - especially as the chip level memory density increases. For a 48Mb memory density, a 27% reduction in array switching power can be achieved for a read access yield target of 95%. In addition, the proposed system can provide larger power saving as process variations increase, which makes it a very attractive solution for 45nm and below technologies. In addition to its impact on bitcell read current, the increase of local variations in nanometer technologies strongly affect SRAM cell stability. In this research, we propose a novel single supply voltage read assist technique to improve SRAM static noise margin (SNM). The proposed technique allows precharging different parts of the bitlines to VDD and GND and uses charge sharing to precisely control the bitline voltage, which improves the bitcell stability. In addition to improving SNM, the proposed technique also reduces memory access time. Moreover, it only requires one supply voltage, hence, eliminates the need of large area voltage shifters. The proposed technique has been implemented in the design of a 512kb memory fabricated in 45nm technology. Results show improvements in SNM and read operation window which confirms the effectiveness and robustness of this technique