Center for Space Microelectronics Technology. 1993 Technical Report

The 1993 Technical Report of the Jet Propulsion Laboratory Center for Space Microelectronics Technology summarizes the technical accomplishments, publications, presentations, and patents of the Center during the past year. The report lists 170 publications, 193 presentations, and 84 New Technology Reports and patents. The 1993 Technical Report of the Jet Propulsion Laboratory Center for Space Microelectronics Technology summarizes the technical accomplishments, publications, presentations, and patents of the Center during the past year. The report lists 170 publications, 193 presentations, and 84 New Technology Reports and patents

Computation lithography: Virtual reality and virtual virtuality

Computation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility. Examples under consideration include design-for- manufacturability and inverse lithography. © 2009 Optical Society of America.postprin

Investigating block mask lithography variation using finite-difference time-domain simulation

Simulation work has long been realized as a method for analyzing semiconductor processing expediently and cost-effectively. As technology advancements strive to meet increasingly stringent parameter constraints, difficult issues arise. In this paper, challenges in block mask lithography will be discussed with the aid of using simulation packages developed by Panoramic Technology®. Halo formation utilizes a 20-30° tilt-angle implantation [1]. The block mask defines the geometries of the resist opening to allow implantation of atoms to extend into the channel region. Due to designed resolution scaling and tolerance in conjunction with substrate topography, there can be undesired influence on the electrical device characteristics due to block variations. Although the block mask pattern definition is relatively simple, additional investigation is required to understand the sensitivities that drive the implant resist CD variation. In this study, block mask measurements processed using 248 nm and 193 nm illumination sources were used to calibrate the simulation work. Addition of optical proximity correction (OPC) and wafer topography geometry parameters have been shown to improve modeling capabilities. The modeling work was also able to show the benefits of a developable bottom anti-reflection coating (dBARC) process over a single layer resist (SLR) process in the resist intensity profiles as gate pitch is decreased. The goal of this work was to develop an accurate simulation model that characterizes the lithographic performance needed to support the transition into future technology nodes

Limits on Fundamental Limits to Computation

An indispensable part of our lives, computing has also become essential to industries and governments. Steady improvements in computer hardware have been supported by periodic doubling of transistor densities in integrated circuits over the last fifty years. Such Moore scaling now requires increasingly heroic efforts, stimulating research in alternative hardware and stirring controversy. To help evaluate emerging technologies and enrich our understanding of integrated-circuit scaling, we review fundamental limits to computation: in manufacturing, energy, physical space, design and verification effort, and algorithms. To outline what is achievable in principle and in practice, we recall how some limits were circumvented, compare loose and tight limits. We also point out that engineering difficulties encountered by emerging technologies may indicate yet-unknown limits.Comment: 15 pages, 4 figures, 1 tabl

Center for Space Microelectronics Technology

The 1990 technical report of the Jet Propulsion Laboratory Center for Space Microelectronics Technology summarizes the technical accomplishments, publications, presentations, and patents of the center during 1990. The report lists 130 publications, 226 presentations, and 87 new technology reports and patents

Center for space microelectronics technology

The 1992 Technical Report of the Jet Propulsion Laboratory Center for Space Microelectronics Technology summarizes the technical accomplishments, publications, presentations, and patents of the center during the past year. The report lists 187 publications, 253 presentations, and 111 new technology reports and patents in the areas of solid-state devices, photonics, advanced computing, and custom microcircuits

Center for Space Microelectronics Technology 1988-1989 technical report

The 1988 to 1989 Technical Report of the JPL Center for Space Microelectronics Technology summarizes the technical accomplishments, publications, presentations, and patents of the center. Listed are 321 publications, 282 presentations, and 140 new technology reports and patents