Cross-layer system reliability assessment framework for hardware faults

System reliability estimation during early design phases facilitates informed decisions for the integration of effective protection mechanisms against different classes of hardware faults. When not all system abstraction layers (technology, circuit, microarchitecture, software) are factored in such an estimation model, the delivered reliability reports must be excessively pessimistic and thus lead to unacceptably expensive, over-designed systems. We propose a scalable, cross-layer methodology and supporting suite of tools for accurate but fast estimations of computing systems reliability. The backbone of the methodology is a component-based Bayesian model, which effectively calculates system reliability based on the masking probabilities of individual hardware and software components considering their complex interactions. Our detailed experimental evaluation for different technologies, microarchitectures, and benchmarks demonstrates that the proposed model delivers very accurate reliability estimations (FIT rates) compared to statistically significant but slow fault injection campaigns at the microarchitecture level.Peer ReviewedPostprint (author's final draft

E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System

Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, recently the traditional EBL system is extended into MCC system. %to further improve the throughput. In this paper, we present E-BLOW, a tool to solve the overlapping aware stencil planning (OSP) problems in MCC system. E-BLOW is integrated with several novel speedup techniques, i.e., successive relaxation, dynamic programming and KD-Tree based clustering, to achieve a good performance in terms of runtime and solution quality. Experimental results show that, compared with previous works, E-BLOW demonstrates better performance for both conventional EBL system and MCC system

3D Multi-Subband Ensemble Monte Carlo Simulator of FinFETs and nanowire transistors

In this paper we present the development of a 3D Multi Subband Ensemble Monte Carlo (3DMSB-EMC) tool targeting the simulation of nanoscaled FinFETs and nanowire transistors. In order to deliver computational efficiency, we have developed a self-consistent framework that couples a MSB- EMC transport engine for a 1D electron gas with a 3DPoisson- 2DSchro ̈dinger solver. Here we use a FinFET with a physical channel length of 15nm as an example to demonstrate the appli- cability and highlight the benefits of the simulation framework. A comparison of the 3DMSB-EMC with Non-Equilibrium Green’s Functions (NEGFs) in the ballistic limit is used to verify and validate our approach

Gate-level timing analysis and waveform evaluation

Static timing analysis (STA) is an integral part of modern VLSI chip design. Table lookup based methods are widely used in current industry due to its fast runtime and mature algorithms. Conventional STA algorithms based on table-lookup methods are developed under many assumptions in timing analysis; however, most of those assumptions, such as that input signals and output signals can be accurately modeled as ramp waveforms, are no longer satisfactory to meet the increasing demand of accuracy for new technologies. In this dissertation, we discuss several crucial issues that conventional STA has not taken into consideration, and propose new methods to handle these issues and show that new methods produce accurate results. In logic circuits, gates may have multiple inputs and signals can arrive at these inputs at different times and with different waveforms. Different arrival times and waveforms of signals can cause very different responses. However, multiple-input transition effects are totally overlooked by current STA tools. Using a conventional single-input transition model when multiple-input transition happens can cause significant estimation errors in timing analysis. Previous works on this issue focus on developing a complicated gate model to simulate the behavior of logic gates. These methods have high computational cost and have to make significant changes to the prevailing STA tools, and are thus not feasible in practice. This dissertation proposes a simplified gate model, uses transistor connection structures to capture the behavior of multiple-input transitions and requires no change to the current STA tools. Another issue with table lookup based methods is that the load of each gate in technology libraries is modeled as a single lumped capacitor. But in the real circuit, the Abstract 2 gate connects to its subsequent gates via metal wires. As the feature size of integrated circuit scales down, the interconnection cannot be seen as a simple capacitor since the resistive shielding effect will largely affect the equivalent capacitance seen from the gate. As the interconnection has numerous structures, tabulating the timing data for various interconnection structures is not feasible. In this dissertation, by using the concept of equivalent admittance, we reduce an arbitrary interconnection structure into an equivalent π-model RC circuit. Many previous works have mapped the π-model to an effective capacitor, which makes the table lookup based methods useful again. However, a capacitor cannot be equivalent to a π-model circuit, and will thus result in significant inaccuracy in waveform evaluation. In order to obtain an accurate waveform at gate output, a piecewise waveform evaluation method is proposed in this dissertation. Each part of the piecewise waveform is evaluated according to the gate characteristic and load structures. Another contribution of this dissertation research is a proposed equivalent waveform search method. The signal waveforms can be very complicated in the real circuits because of noises, race hazards, etc. The conventional STA only uses one attribute (i.e., transition time) to describe the waveform shape which can cause significant estimation errors. Our approach is to develop heuristic search functions to find equivalent ramps to approximate input waveforms. Here the transition time of a final ramp can be completely different from that of the original waveform, but we can get higher accuracy on output arrival time and transition time. All of the methods mentioned in this dissertation require no changes to the prevailing STA tools, and have been verified across different process technologies

Limits on Fundamental Limits to Computation

An indispensable part of our lives, computing has also become essential to industries and governments. Steady improvements in computer hardware have been supported by periodic doubling of transistor densities in integrated circuits over the last fifty years. Such Moore scaling now requires increasingly heroic efforts, stimulating research in alternative hardware and stirring controversy. To help evaluate emerging technologies and enrich our understanding of integrated-circuit scaling, we review fundamental limits to computation: in manufacturing, energy, physical space, design and verification effort, and algorithms. To outline what is achievable in principle and in practice, we recall how some limits were circumvented, compare loose and tight limits. We also point out that engineering difficulties encountered by emerging technologies may indicate yet-unknown limits.Comment: 15 pages, 4 figures, 1 tabl

Nano-Scaled Fet Device For Cmos Technology

In this work the 3-D structure of the Accumulation mode (ACM) and Enhance mode (ECM) FinFET was developed by the Taurus-Device Editor. The design of both ACM and ECM FinFET was optimized for high-performance IC applications to meet ITRS specification for Ioff current, for 9nm gate length. The design of ACM and ECM FinFET is optimized, analyzed and compared against each other with respect to Darin Induced Barrier Lower (DIBL), Sub-threshold Swing(SS), operation and performance characteristics with varying electrical and physical parameters Silicon thickness (Tsi), Source/Drain doping gradient (σsd), electrical channel length (Leff ), lacer spacer width (Lsp) and Source/Drain Contact Resistance (rsd). Finally, both designs were optimized for 9nm gate length for on current (Ion) to meet ITRS specifications for Ioff. The simulation solves and includes Poisson, drift-diffusion transport equation and 3D-Schrodinger equation self-consistently