Characterization of structures fabricated by selective wet etching of silicon

Abstract

The task of master’s thesis was to perform optimalization process for preparing metal etching mask by electron beam litography and subsequent selective wet ething of silicon with crystalographic orientation (100). Further characterization of etched surface and fabricated structures was performed. In particular, attention was given to the morphology demonstrated by scanning electron microscopy and study changes of the optical properties of gold plasmonic antennas due to their undercut

Similar works

Full text

thumbnail-image

National Repository of Grey Literature

redirect
Last time updated on 10/08/2016

This paper was published in National Repository of Grey Literature.

Having an issue?

Is data on this page outdated, violates copyrights or anything else? Report the problem now and we will take corresponding actions after reviewing your request.