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Characterization of structures fabricated by selective wet etching of silicon

By Ondřej Metelka

Abstract

The task of master’s thesis was to perform optimalization process for preparing metal etching mask by electron beam litography and subsequent selective wet ething of silicon with crystalographic orientation (100). Further characterization of etched surface and fabricated structures was performed. In particular, attention was given to the morphology demonstrated by scanning electron microscopy and study changes of the optical properties of gold plasmonic antennas due to their undercut

Topics: KOH; hydroxid draselný; leptací maska; FTIR; EBL; skenovací elektronový mikroskop; etching mask; anizotropní mokré leptání; Silicon; electron beam litography; potassium hydroxide; surface plasmon polariton; anisotropic wet etching; plazmonový povrchový polariton; effective refractive index; Křemík; scanning electron microscope; efektivní index lomu; SEM; elektronová litografie
Publisher: Vysoké učení technické v Brně. Fakulta strojního inženýrství
Year: 2014
OAI identifier: oai:invenio.nusl.cz:231496
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