oaioai:dspace.xmu.edu.cn:2288/14585

Pure HAP Film Prepared by Direct Electrodepositing on Metallic Surface and Its Mechanism

Abstract

通讯联系人: Tel: ( 86_592) 2181829, E_mail: cjlin@ xmu. edu. cn[中文文摘]控制电沉积溶液中钙/ 磷离子的浓度, 在钛合金表面直接沉积羟基磷灰石( HAP) 陶瓷涂层. XRD、SEM 实验证实, 制备的HAP 晶粒完整, 粒度均匀. 热力学计算表明HAP 比TCP 更易于生成. 文中讨论了羟基磷灰石( HAP) 涂层电沉积的机理, 指出电沉积是一个二步过程, HAP 的形成是从溶液中离子到固体的直接过程, 没有前驱体的生成.[英文文摘]In cont rolling concent rat ion of Ca2+ and PO43- in elect rodeposition solution, the HAP film on Ti alloy has been deposited directly. Using XRD and SEM w e have learned that prepared HAP is intact in crystal and equal in dimension. T hermodynamic calculation indicated that the HAP is easer formation of than that T CP of . With the XRD, SEM analyses and thermodynamic calculation, the elect rodeposition mechanism has been discussed. It w as proved that electrodepositon is a two_stag e process and formation of HAP is a direct process f rom solut ion ions to HAP crystal w ithout precursor.国家自然科学基金 (2 98730 39,5 95 2 5 10 2 )资

Similar works

Full text

thumbnail-image

Xiamen University Institutional Repository

Provided original full text link
oaioai:dspace.xmu.edu.cn:2288/14585Last time updated on 6/16/2016

This paper was published in Xiamen University Institutional Repository.

Having an issue?

Is data on this page outdated, violates copyrights or anything else? Report the problem now and we will take corresponding actions after reviewing your request.