journal article

Ultraviolet poling of pure fused silica by high-intensity femtosecond radiation

Abstract

We demonstrate UV poling of a pure fused silica sample by applying to it an electric field of 200 kV/cm and irradiating it with high-intensity (similar to40 GW/cm(2)) femtosecond (220 fs) laser pulses at 264 nm. (C) 2005 American Institute of Physics. (DOI:10.1063/1.1868075

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Irish Universities

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Last time updated on 30/12/2017

This paper was published in Irish Universities.

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