大関 誠也

竹内 真一

阿部 峻靖

黒澤 実

Toin University of Yokohama Academic Repository

165「桐蔭論叢」第 32 号 2015 年 10 月Control of Deposition Area for Hydrothermally Synthesized Lead Zirconate Titanate Film by Masking with Au SputteringSeiya OZEKI1, Toshinobu ABE1, Minoru KURIBAYASHI KUROSAWA2, and Shinichi TAKEUCHI11 桐蔭横浜大学大学院工学研究科2 東京工業大学大学院総合理工学研究科（2015 年 3 月 20 日　受理）We have previously used a hydrothermal synthesis method to fabricate various devices, including a cavitation sensor1), hydrophone,2, 3) ultrasound probe,4) and ultrasound micromo-tor,5) from a lead zirconate titanate (PZT) film on a Ti substrate. The hydrothermal synthesis method is used to precipitate crystals at high temperatures and pressures. Recently, hydro-thermal synthesis of piezoelectric materials, such as PZT, potassium niobate, and potas-sium sodium niobate, has been reported.6, 7) Additionally, hydrothermally synthesized PZT polycrystalline films have various advantages: the film can be deposited on small or complex shaped Ti substrates; it adheres well to the sur-face of the Ti substrate; and poling and anneal-ing are not required.8, 9) However, it is difficult to deposit the PZT film on a specific portion of the surface of the Ti substrate. This is a significant limitation in manufacturing piezoelectric devic-es with hydrothermally synthesized PZT poly-crystalline films and it is important to develop a technique for controlling the film deposition.  In previous studies, the deposition area of the hydrothermally synthesized PZT polycrys-talline film has been controlled by masking methods using a PTFE plate or PTFE film. However, these masking methods were not suf-ficient.10, 11) In hydrothermal synthesis, the PZT polycrystalline film is deposited by the chemical reaction between metal ions in solution and the surface of the Ti substrate. Therefore, we ex-pected that it would be possible to control the deposition area of the film by inhibiting the film synthesis through coating the surface of the Ti substrate with an Au film.12) The hydrothermal 〈医用工学部研究論文〉1. Graduate School of Engineering, Toin University of Yokohama, 1614 Kurogane-cho, Aoba-ku, Yokohama, Kanagawa 225-8502, Japan2 Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8502, JapanE-mail: b23c007e@toin.ust.ac.jpWe have previously fabricated various devices with lead zirconate titanate (PZT) film on Ti substrate by using a hydrothermal synthesis method. However, in hydrothermal synthesis, it is difficult to control the deposition area for PZT polycrystalline film. In this study, we propose a masking method with Au sputtering for controlling the deposition area for hydrothermally synthesized PZT polycrystalline film.Seiya OZEKI, Toshinobu ABE, Minoru KURIBAYASHI KUROSAWA, and Shinichi TAKEUCHI166synthesis of the PZT polycrystalline film is car-ried out at high temperature and high pressure in a strongly alkaline solution. Au is stable even under these harsh conditions. In addition, it is necessary to control the deposition area arbi-trarily.In this work, the PZT polycrystalline film was deposited on the Ti substrate by using ded-icated apparatus for hydrothermal synthesis. The relationship among the deposition time, temperature, and pressure is important for the hydrothermal synthesis of the PZT polycrys-talline films. Table I shows the source materials and Table II shows the setup of the apparatus. The hydrothermal synthesis proceeds according to the reaction in Eq (1). Pb2+ + (1−x)Zr4+ + xTi4+ + 6OH– →   Pb(Zr1−x, Tix)O3 + 3H2O, (1)Pb2+ and Zr4+ ions are supplied from the starting material solution, and Ti4+ ions are sup-plied from TiO2 particles in the starting materi-al solution and eluted from the Ti substrate.13) Hydrothermal synthesis usually consists of the crystal growth process and nucleation pro-cess.14–16) However, only the nucleation process was performed to confirm whether nucleation could be inhibited by the Au masking tech-nique. First, we sputtered Au on the front and back surfaces of the Ti substrate. The thickness, width, and length of the Ti substrate were 0.05 × 20 × 25 mm, respectively. The thicknesses of the sputtered Au films were 0.1, 0.5, and 1.0 Table I. Source materials for the hydrothermal synthesis of PZT polycrystalline films.Material Concentration [mol/L] QuantityZrOCl2・8H2O 0.25 60 mLPb(NO3)2 0.5 100 mLKOH 4 200 mLTiO2 Powder 1 gTable II. Hydrothermal synthesis conditions for polycrystalline PZT films.NCTemperature [°C] 160 Pressure [MPa] 0.5Stirring speed [rpm] 160Deposition time [h] 24Fig. 1. SEM image of the surface of the PZT polycrystalline film deposited on the Ti substrate by hydrothermal synthesis.  Fig. 2. Deposition on the Ti substrate of the Au film with thickness of (a) 0.1 μm, (b) 0.5 μm, and (c) 1.0 μm.Control of Deposition Area for Hydrothermally Synthesized Lead Zirconate Titanate Film by Masking with Au Sputtering167μm. Subsequently, we attempted to deposit the hydrothermal PZT on the Au film on the Ti substrate. Figure 1 shows a scanning electron microscope (SEM) image of a hydrothermally synthesized PZT polycrystalline film for com-parison. Figures 2 (a)–(c) show the thickness (0.1, 0.5, and 1.0 μm) of the sputtered Au after hy-drothermal synthesis. We confirmed a whitish dullness on the Au after PZT deposition. Fig-ures 3–5 show SEM images of the sputtered Au surfaces after PZT deposition. Crystalline ma-terial was observed on the Au surface in Fig. 3, and small crystals were also confirmed on the Au surface in Figs. 4 and 5. However, the sur-face in Fig. 5 showed small sparsely distributed crystals, and the crystals were peeled away from the Ti substrate together with the sputtered Au by using carbon tape. Figure 6 shows an SEM image of the Ti substrate area after the peel of the sputtered Au film and the sputtered Au area, which was still sparsely deposited PZT crystals.The SEM images indicate that the nucle-ation of hydrothermal PZT was inhibited by Fig. 3. SEM image of the surface of the PZT polycrystalline film after deposition of an Au film with a thickness of 0.1 μm on the Ti substrate.Fig. 4. SEM image of the surface of the PZT polycrystalline film after deposition of an Au film with a thickness of 0.5 μm on the Ti substrate.Fig. 5. SEM image of the surface of the PZT polycrystalline film after deposition of an Au film with a thickness of 1.0 μm on the Ti substrate.Fig. 6. SEM image of the boundary between the Ti substrate and peeling of Au with PZT crystals.Seiya OZEKI, Toshinobu ABE, Minoru KURIBAYASHI KUROSAWA, and Shinichi TAKEUCHI168masking with a sputtered Au film. However, some PZT crystals still formed on the Au mask, suggesting that this technique requires modifi-cation. We expect that this masking technique will eventually be applied to various devices, such as ultrasound sensors, hydrophones, and ultrasound micromotors with sophisticated structures.AcknowledgmentsThe authors express their deep appreciation to Dr. Yoshinori Hayakawa of Toin University of Yokohama, whose insightful comments were invaluable during the course of this study. References1) M. Shiiba, N. Kawashima, T. Uchida, T. Kikuchi, M. Kurosawa, and S. Takeuchi, Jpn. J. Appl. Phys. 50, 07HE02 (2011). 2) M. Shiiba, N. Okada, T. Uchida, T. 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Control of Deposition Area for Hydrothermally Synthesized Lead Zirconate Titanate Film by Masking with Au Sputtering

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Control of Deposition Area for Hydrothermally Synthesized Lead Zirconate Titanate Film by Masking with Au Sputtering

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