The effect of the patterning process on the nonlinearity of the microwave
surface resistance RSβ of YBCO thin films is investigated. With the use of a
sapphire dielectric resonator and a stripline resonator, the microwave RSβ of
YBCO thin films was measured before and after the patterning process, as a
function of temperature and the rf peak magnetic field in the film. The
microwave loss was also modeled, assuming a Jrf2β dependence of
ZSβ(Jrfβ) on current density Jrfβ. Experimental and modeled results
show that the patterning has no observable effect on the microwave residual
RSβ or on the power dependence of RSβ.Comment: Submitted to IEEE Trans. MT