Characterization and Dielectric Properties of LaMnO3 Thin Films by Spin Coating Method

Abstract

This paper presents LaMnO3 nanostructured thin films were deposited on silicon substrate by using Single Wafer Spin Processor. LaMnO3 powder was firstly prepared by pyrolysis method. The structural, morphology and thermal properties of LMO powder was examined by XRD, SEM and TG-DTA. The films obtained from spin coating technique have been annealed at 500 ºC and 600 ºC for 1 h. Morphology, and structural properties of fabricated LaMnO3 thin films were investigated by SEM and XRD analysis. The objective of this research is to explore the structure, dielectric properties and processing of thin films that contain nanoscale embedded hard particles