CORE
🇺🇦Â
 make metadata, not war
Services
Services overview
Explore all CORE services
Access to raw data
API
Dataset
FastSync
Content discovery
Recommender
Discovery
OAI identifiers
OAI Resolver
Managing content
Dashboard
Bespoke contracts
Consultancy services
Support us
Support us
Membership
Sponsorship
Community governance
Advisory Board
Board of supporters
Research network
About
About us
Our mission
Team
Blog
FAQs
Contact us
Controlling the Atomic Layer Deposition of Titanium Dioxide on Silicon: Dependence on Surface Termination
Authors
Abeln G. C.
Avouris P.
+57Â more
Boland J. J.
Dagata J. A.
Don Dick
Frank M. M.
Ghosh M. K.
Ghosh M. K.
Greg Mordi
Groner M. D.
Gu W.
Halls M. D.
Hausmann D. M.
Henkelman G.
Henkelman G.
Herrera-Gomez A.
Hersam M. C.
Heyman A.
Higashi G. S.
Himpsel F. J.
Ho M. T.
Horcas I.
Hu Z.
Hu Z.
James H. G. Owen
Jeloaica L.
Jiyoung Kim
John N. Randall
Josh B. Ballard
Kresse G.
Kresse G.
Kyeongjae Cho
Lelis-Sousa R.
Li K.
Lim G. T.
Lyding J. W.
Methaapanon R.
Mitsui T.
Nam T.
Okada Y.
Oliver Seitz
Perdew J. P.
Pirkle A.
Rao G. R.
Ritala M.
Robert M. Wallace
Roberto C. Longo
Rose M.
Sivasubramani P.
So S.-J.
Stephen McDonnell
Vitchev R. G.
Wallace R. M.
Watanabe S.
Widjaja Y.
Widjaja Y.
Xie X. N.
Xu Y.
Yves J. Chabal
Publication date
Publisher
'American Chemical Society (ACS)'
Doi
Cite
Abstract
Abstract is not available.
Similar works
Full text
Available Versions
Crossref
See this paper in CORE
Go to the repository landing page
Download from data provider
info:doi/10.1021%2Fjp4060022
Last time updated on 03/11/2020