We present measurements of 1/f resistance noise in three different films of
amorphous silicon (a-Si) in the presense of a transverse electric current. Two
of these films have n-i-n sandwich structure - in one of them all three layers
were hydrogenated; in the other one only the n-layers were hydrogenated, while
the intrinsic layer was deuterated. The third film had p-i-p structure with all
three layers hydrogenated. The experimental spectra were found to be in a very
good quantitative agreement with theoretical predictions, which were based on
the mechanism involving long-range fluctuations of the Coulomb potential
created by charged defects (see cond-mat/0210680).Comment: 7 pages, 3 figures, to appear in J. Non-Cryst. Solid