$^{222}$Rn contamination mechanisms on acrylic surfaces

Abstract

In this work, the $^{222}$Rn contamination mechanisms on acrylic surfaces have been investigated. $^{222}$Rn can represent a significant background source for low-background experiments, and acrylic is a suitable material for detector design thanks to its purity and transparency. Four acrylic samples have been exposed to a $^{222}$Rn rich environment for different time periods, being contaminated by $^{222}$Rn and its progenies. Subsequently, the time evolution of radiocontaminants activity on the samples has been evaluated with $\alpha$ and $\gamma$ measurements, highlighting the role of different decay modes in the contamination process. A detailed analysis of the alpha spectra allowed to quantify the implantation depth of the contaminants. Moreover, a study of both $\alpha$ and $\gamma$ measurements pointed out the $^{222}$Rn diffusion inside the samples