Awatsuji, Yasuhiro

Awazu, Hideyuki

Kintaka, Kenji

Nishii, Junji

Nishio, Kenzo

Ura, Shogo

English

A simple interference exposure method using a phase-shifting mask was discussed on the basis of Fourier synthesis for fabricating blazed gratings. A phase-shifting mask was designed with 244 nm exposure-light wavelength to launch multiple diffraction beams so that resultant interference pattern fit to required optical intensity profile. Fine surface-relief pattern on Si02 mask for 3μm-period sawtooth optical-intensity profile was fabricated by electron-beam direct-writing lithography with 30 nm scanning step and relief height of 65 nm. Sawtooth-like intensity profile was demonstrated with theoretically predicted interference visibility. A UV photoresist was exposed through the fabricated phase-shifting mask and developed to form a blazed grating

Osaka University Knowledge Archive

Interference Exposure Fabrication of Blazed Grating by Phase-shifting Mask

https://ir.library.osaka-u.ac.jp/repo/ouka/all/76882/eme_20_02_079.pdf

Interference Exposure Fabrication of Blazed Grating by Phase-shifting Mask

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Osaka University Knowledge Archive