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Low-temperature anodic oxidation of silicon using a wave resonance plasma source
Authors
,
,
+7Â more
N Hatzopoulos
DF Lai
WI Milne
J Robertson
S Uchikoga
M Weiler
RA Yankov
Publication date
16 September 1999
Publisher
'The Materials Research Society of Japan'
Abstract
Abstract is not available.
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CUED - Cambridge University Engineering Department
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Last time updated on 15/07/2020