Direct phonon spin-lattice relaxation of an electron qubit bound by a donor
impurity or quantum dot in SiGe heterostructures is investigated. The aim is to
evaluate the importance of decoherence from this mechanism in several important
solid-state quantum computer designs operating at low temperatures. We
calculate the relaxation rate 1/T1 as a function of [100] uniaxial strain,
temperature, magnetic field, and silicon/germanium content for Si:P bound
electrons. The quantum dot potential is much smoother, leading to smaller
splittings of the valley degeneracies. We have estimated these splittings in
order to obtain upper bounds for the relaxation rate. In general, we find that
the relaxation rate is strongly decreased by uniaxial compressive strain in a
SiGe-Si-SiGe quantum well, making this strain an important positive design
feature. Ge in high concentrations (particularly over 85%) increases the rate,
making Si-rich materials preferable. We conclude that SiGe bound electron
qubits must meet certain conditions to minimize decoherence but that
spin-phonon relaxation does not rule out the solid-state implementation of
error-tolerant quantum computing.Comment: 8 figures. To appear in PRB-July 2002. Revisions include: some
references added/corrected, several typos fixed, a few things clarified.
Nothing dramati