Thin superconducting films of magnesium diboride (MgB2) with Tc \approx 24K
were prepared on various oxide substrates by pulsed laser deposition (PLD)
followed by an in-situ anneal. A systematic study of the influence of various
in-situ annealing parameters shows an optimum temperature of about 600C in a
background of 0.7 atm. of Ar/4%H2 for layers consisting of a mixture of
magnesium and boron. Contrary to ex-situ approaches (e.g. reacting boron films
with magnesium vapor at 900C), these films are processed below the
decomposition temperature of MgB2. This may prove enabling in the formation of
multilayers, junctions, and epitaxial films in future work. Issues related to
the improvement of these films and to the possible in-situ growth of MgB2 at
elevated temperature are discussed.Comment: 5 pages, 4 figure