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SiO微盘腔的湿法腐蚀工艺研究
Authors
应磊莹
张保平
+5 more
杨文
江水森
蔡志平
郭长磊
龙浩
Publication date
1 January 2017
Publisher
Abstract
SiO回音壁模式(whispering gallery mode,WGM)的光学谐振腔具有品质因子Q值高、模式体积小、制作简单等优点,在腔量子电动力学、生物传感器、滤波器、非线性光学等领域具有非常好的应用前景.采用热氧化生长SiO、光刻图形化、磁控溅射生长Cr掩膜、HF缓冲液湿法腐蚀SiO、KOH溶液湿法腐蚀Si并去除Cr掩膜等工艺,得到了周期化、尺寸不同的SiO微盘腔,其直径分别为20,40和60μm.利用原子力显微镜表征微盘腔表面的粗糙度,均方根表面粗糙度仅为0.469nm.在未经任何表面处理或者激光处理的情况下,利用连续波长可调激光器,通过光纤锥与微盘腔耦合,透射谱测量得到微盘腔的自由光谱范围(free spectrum range,FSR)为λFSR=9.6nm,Q值约为1×10.中航工业产学研项目(CXY2011XD24);中国博士后科学基金(2015M582041)
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Last time updated on 10/06/2020